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name:-0.0088331699371338
name:-0.0053009986877441
name:-0.00058388710021973
Dei; Satoshi Patent Filings

Dei; Satoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Dei; Satoshi.The latest application filed is for "inorganic film-forming composition for multilayer resist processes, and pattern-forming method".

Company Profile
0.4.7
  • Dei; Satoshi - Tokyo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Inorganic film-forming composition for multilayer resist processes, and pattern-forming method
Grant 10,090,163 - Nakagawa , et al. October 2, 2
2018-10-02
Method for forming pattern, and polysiloxane composition
Grant 9,434,609 - Dei , et al. September 6, 2
2016-09-06
Polysiloxane composition and pattern-forming method
Grant 9,329,478 - Anno , et al. May 3, 2
2016-05-03
Inorganic Film-forming Composition For Multilayer Resist Processes, And Pattern-forming Method
App 20150364332 - Nakagawa; Hisashi ;   et al.
2015-12-17
Composition For Silicon-containing Film Formation, Pattern-forming Method, And Polysiloxane Compound
App 20150355546 - SEKO; Tomoaki ;   et al.
2015-12-10
Insulation pattern-forming method and insulation pattern-forming material
Grant 9,126,231 - Dei , et al. September 8, 2
2015-09-08
Method For Forming Pattern, And Polysiloxane Composition
App 20150048046 - DEI; Satoshi ;   et al.
2015-02-19
Polysiloxane Composition And Pattern-forming Method
App 20130130179 - ANNO; Yusuke ;   et al.
2013-05-23
Insulation Pattern-forming Method And Insulation Pattern-forming Material
App 20130084394 - Dei; Satoshi ;   et al.
2013-04-04
Inverted Pattern Forming Method And Resin Composition
App 20100178620 - DEI; Satoshi ;   et al.
2010-07-15
Negative-tone Radiation-sensitive Composition, Cured Pattern Forming Method, And Cured Pattern
App 20100167024 - Natsume; Norihiro ;   et al.
2010-07-01

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