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Patent applications and USPTO patent grants for de Leeuwe; Marc.The latest application filed is for "removal of cmp and post-cmp residue from semiconductors using supercritical carbon dioxide process".
Patent | Date |
---|---|
Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process Grant 7,064,070 - Mullee , et al. June 20, 2 | 2006-06-20 |
Removal of CMP residue from semiconductors using supercritical carbon dioxide process Grant 6,277,753 - Mullee , et al. August 21, 2 | 2001-08-21 |
Liquid chemical dispensing apparatus Grant 4,646,784 - de Leeuwe March 3, 1 | 1987-03-03 |
Chemical container Grant D284,035 - de Leeuwe , et al. May 27, 1 | 1986-05-27 |
Non-glass chemical container Grant 4,484,351 - de Leeuwe , et al. November 20, 1 | 1984-11-20 |
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