loadpatents
name:-0.034770011901855
name:-0.01911187171936
name:-0.00075507164001465
Davis; Matthew F. Patent Filings

Davis; Matthew F.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Davis; Matthew F..The latest application filed is for "apparatus for efficient removal of halogen residues from etched substrates".

Company Profile
0.17.26
  • Davis; Matthew F. - Felton CA
  • DAVIS; Matthew F. - Brookedale CA
  • Davis; Matthew F. - Brookdale CA
  • Davis; Matthew F - Brookdale CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Apparatus For Efficient Removal Of Halogen Residues From Etched Substrates
App 20130040080 - Bhang; Kenneth J. ;   et al.
2013-02-14
Apparatus for efficient removal of halogen residues from etched substrates
Grant 8,293,016 - Bahng , et al. October 23, 2
2012-10-23
Method and apparatus for in-situ metrology of a workpiece disposed in a vacuum processing chamber
Grant 8,274,645 - Davis , et al. September 25, 2
2012-09-25
Within-sequence metrology based process tuning for adaptive self-aligned double patterning
Grant 8,232,212 - Davis , et al. July 31, 2
2012-07-31
Method and apparatus for calibrating mass flow controllers
Grant 8,089,046 - Davis , et al. January 3, 2
2012-01-03
Determining Endpoint In A Substrate Process
App 20110253671 - LIAN; Lei ;   et al.
2011-10-20
Determining Endpoint In A Substrate Process
App 20110019201 - LIAN; Lei ;   et al.
2011-01-27
Method And Apparatus For In-situ Metrology Of A Workpiece Disposed In A Vacuum Processing Chamber
App 20110013175 - Davis; Matthew F. ;   et al.
2011-01-20
Method for controlling a process for fabricating integrated devices
Grant 7,815,812 - Davis , et al. October 19, 2
2010-10-19
Determining endpoint in a substrate process
Grant 7,808,651 - Lian , et al. October 5, 2
2010-10-05
Endpoint Detection For A Reactor Chamber Using A Remote Plasma Chamber
App 20100224322 - SUI; ZHIFENG ;   et al.
2010-09-09
Apparatus For Efficient Removal Of Halogen Residues From Etched Substrates
App 20100133255 - Bahng; Kenneth J. ;   et al.
2010-06-03
Determining Endpoint In A Substrate Process
App 20100133232 - LIAN; Lei ;   et al.
2010-06-03
Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring
Grant 7,695,987 - Davis , et al. April 13, 2
2010-04-13
Method And Apparatus For Calibrating Mass Flow Controllers
App 20100071438 - Davis; Matthew F. ;   et al.
2010-03-25
Self-diagnostic Semiconductor Equipment
App 20100076729 - DAVIS; MATTHEW F. ;   et al.
2010-03-25
Interferometric endpoint determination in a substrate etching process
Grant 7,652,774 - Lian , et al. January 26, 2
2010-01-26
Within-sequence Metrology Based Process Tuning For Adaptive Self-aligned Double Patterning
App 20100009470 - Davis; Matthew F. ;   et al.
2010-01-14
Method and apparatus for performing limited area spectral analysis
Grant 7,602,484 - Davis , et al. October 13, 2
2009-10-13
Method for automatic determination of substrates states in plasma processing chambers
Grant 7,393,459 - Davis , et al. July 1, 2
2008-07-01
Interferometric endpoint determination in a substrate etching process
App 20080151237 - Lian; Lei ;   et al.
2008-06-26
Method And Apparatus For Performing Limited Area Spectral Analysis
App 20080074658 - Davis; Matthew F. ;   et al.
2008-03-27
Method and apparatus for performing limited area spectral analysis
Grant 7,330,244 - Davis , et al. February 12, 2
2008-02-12
Interferometric endpoint determination in a substrate etching process
Grant 7,306,696 - Lian , et al. December 11, 2
2007-12-11
Method And Apparatus For Performing Limited Area Spectral Analysis
App 20070153263 - Davis; Matthew F. ;   et al.
2007-07-05
Method For Automatic Determination Of Semiconductor Plasma Chamber Matching And Source Of Fault By Comprehensive Plasma Monitoring
App 20070095789 - Davis; Matthew F. ;   et al.
2007-05-03
Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring
Grant 7,169,625 - Davis , et al. January 30, 2
2007-01-30
Method For Controlling A Process For Fabricating Integrated Devices
App 20070017896 - Davis; Matthew F. ;   et al.
2007-01-25
Method and apparatus for performing limited area spectral analysis
Grant 7,158,221 - Davis , et al. January 2, 2
2007-01-02
Method for automatic determination of substrates states in plasma processing chambers
App 20060028646 - Davis; Matthew F. ;   et al.
2006-02-09
Method and apparatus for performing limited area spectral analysis
App 20050134834 - Davis, Matthew F. ;   et al.
2005-06-23
Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring
App 20050019961 - Davis, Matthew F. ;   et al.
2005-01-27
Method for controlling a process for fabricating integrated devices
App 20040200574 - Davis, Matthew F. ;   et al.
2004-10-14
Interferometric endpoint determination in a substrate etching process
App 20040087152 - Lian, Lei ;   et al.
2004-05-06
Variable efficiency faraday shield
Grant 6,685,799 - Davis , et al. February 3, 2
2004-02-03
Method for controlling the extent of notch or undercut in an etched profile using optical reflectometry
App 20040018647 - Jones, Steven J. ;   et al.
2004-01-29
Nozzle for introduction of reactive species in remote plasma cleaning applications
App 20020179247 - Davis, Matthew F. ;   et al.
2002-12-05
Remote plasma cleaning of pumpstack components of a reactor chamber
App 20020144706 - Davis, Matthew F. ;   et al.
2002-10-10
Variable efficiency faraday shield
App 20020129903 - Davis, Matthew F. ;   et al.
2002-09-19
Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system
Grant 6,410,889 - Davis , et al. June 25, 2
2002-06-25
Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system
App 20020008099 - Davis, Matthew F. ;   et al.
2002-01-24
Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system
Grant 6,323,463 - Davis , et al. November 27, 2
2001-11-27

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