Patent | Date |
---|
Apparatus For Efficient Removal Of Halogen Residues From Etched Substrates App 20130040080 - Bhang; Kenneth J. ;   et al. | 2013-02-14 |
Apparatus for efficient removal of halogen residues from etched substrates Grant 8,293,016 - Bahng , et al. October 23, 2 | 2012-10-23 |
Method and apparatus for in-situ metrology of a workpiece disposed in a vacuum processing chamber Grant 8,274,645 - Davis , et al. September 25, 2 | 2012-09-25 |
Within-sequence metrology based process tuning for adaptive self-aligned double patterning Grant 8,232,212 - Davis , et al. July 31, 2 | 2012-07-31 |
Method and apparatus for calibrating mass flow controllers Grant 8,089,046 - Davis , et al. January 3, 2 | 2012-01-03 |
Determining Endpoint In A Substrate Process App 20110253671 - LIAN; Lei ;   et al. | 2011-10-20 |
Determining Endpoint In A Substrate Process App 20110019201 - LIAN; Lei ;   et al. | 2011-01-27 |
Method And Apparatus For In-situ Metrology Of A Workpiece Disposed In A Vacuum Processing Chamber App 20110013175 - Davis; Matthew F. ;   et al. | 2011-01-20 |
Method for controlling a process for fabricating integrated devices Grant 7,815,812 - Davis , et al. October 19, 2 | 2010-10-19 |
Determining endpoint in a substrate process Grant 7,808,651 - Lian , et al. October 5, 2 | 2010-10-05 |
Endpoint Detection For A Reactor Chamber Using A Remote Plasma Chamber App 20100224322 - SUI; ZHIFENG ;   et al. | 2010-09-09 |
Apparatus For Efficient Removal Of Halogen Residues From Etched Substrates App 20100133255 - Bahng; Kenneth J. ;   et al. | 2010-06-03 |
Determining Endpoint In A Substrate Process App 20100133232 - LIAN; Lei ;   et al. | 2010-06-03 |
Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring Grant 7,695,987 - Davis , et al. April 13, 2 | 2010-04-13 |
Method And Apparatus For Calibrating Mass Flow Controllers App 20100071438 - Davis; Matthew F. ;   et al. | 2010-03-25 |
Self-diagnostic Semiconductor Equipment App 20100076729 - DAVIS; MATTHEW F. ;   et al. | 2010-03-25 |
Interferometric endpoint determination in a substrate etching process Grant 7,652,774 - Lian , et al. January 26, 2 | 2010-01-26 |
Within-sequence Metrology Based Process Tuning For Adaptive Self-aligned Double Patterning App 20100009470 - Davis; Matthew F. ;   et al. | 2010-01-14 |
Method and apparatus for performing limited area spectral analysis Grant 7,602,484 - Davis , et al. October 13, 2 | 2009-10-13 |
Method for automatic determination of substrates states in plasma processing chambers Grant 7,393,459 - Davis , et al. July 1, 2 | 2008-07-01 |
Interferometric endpoint determination in a substrate etching process App 20080151237 - Lian; Lei ;   et al. | 2008-06-26 |
Method And Apparatus For Performing Limited Area Spectral Analysis App 20080074658 - Davis; Matthew F. ;   et al. | 2008-03-27 |
Method and apparatus for performing limited area spectral analysis Grant 7,330,244 - Davis , et al. February 12, 2 | 2008-02-12 |
Interferometric endpoint determination in a substrate etching process Grant 7,306,696 - Lian , et al. December 11, 2 | 2007-12-11 |
Method And Apparatus For Performing Limited Area Spectral Analysis App 20070153263 - Davis; Matthew F. ;   et al. | 2007-07-05 |
Method For Automatic Determination Of Semiconductor Plasma Chamber Matching And Source Of Fault By Comprehensive Plasma Monitoring App 20070095789 - Davis; Matthew F. ;   et al. | 2007-05-03 |
Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring Grant 7,169,625 - Davis , et al. January 30, 2 | 2007-01-30 |
Method For Controlling A Process For Fabricating Integrated Devices App 20070017896 - Davis; Matthew F. ;   et al. | 2007-01-25 |
Method and apparatus for performing limited area spectral analysis Grant 7,158,221 - Davis , et al. January 2, 2 | 2007-01-02 |
Method for automatic determination of substrates states in plasma processing chambers App 20060028646 - Davis; Matthew F. ;   et al. | 2006-02-09 |
Method and apparatus for performing limited area spectral analysis App 20050134834 - Davis, Matthew F. ;   et al. | 2005-06-23 |
Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring App 20050019961 - Davis, Matthew F. ;   et al. | 2005-01-27 |
Method for controlling a process for fabricating integrated devices App 20040200574 - Davis, Matthew F. ;   et al. | 2004-10-14 |
Interferometric endpoint determination in a substrate etching process App 20040087152 - Lian, Lei ;   et al. | 2004-05-06 |
Variable efficiency faraday shield Grant 6,685,799 - Davis , et al. February 3, 2 | 2004-02-03 |
Method for controlling the extent of notch or undercut in an etched profile using optical reflectometry App 20040018647 - Jones, Steven J. ;   et al. | 2004-01-29 |
Nozzle for introduction of reactive species in remote plasma cleaning applications App 20020179247 - Davis, Matthew F. ;   et al. | 2002-12-05 |
Remote plasma cleaning of pumpstack components of a reactor chamber App 20020144706 - Davis, Matthew F. ;   et al. | 2002-10-10 |
Variable efficiency faraday shield App 20020129903 - Davis, Matthew F. ;   et al. | 2002-09-19 |
Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system Grant 6,410,889 - Davis , et al. June 25, 2 | 2002-06-25 |
Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system App 20020008099 - Davis, Matthew F. ;   et al. | 2002-01-24 |
Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system Grant 6,323,463 - Davis , et al. November 27, 2 | 2001-11-27 |