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Patent applications and USPTO patent grants for Davis Jr.; Claude L..The latest application filed is for "extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements".
Patent | Date |
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Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements Grant RE41,220 - Davis Jr. , et al. April 13, 2 | 2010-04-13 |
Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements Grant 6,931,097 - Davis, Jr. , et al. August 16, 2 | 2005-08-16 |
Method to avoid striae in EUV lithography mirrors Grant 6,776,006 - Best , et al. August 17, 2 | 2004-08-17 |
Extreme ultraviolet soft x-ray projection lithographic method and mask devices Grant 6,576,380 - Davis, Jr. , et al. June 10, 2 | 2003-06-10 |
Extreme ultraviolet soft x-ray projection lithographic method and mask devices Grant 6,465,272 - Davis, Jr. , et al. October 15, 2 | 2002-10-15 |
Low cost light weight mirror blank Grant 6,176,588 - Davis, Jr. , et al. January 23, 2 | 2001-01-23 |
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