Davis; Blake W.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Davis; Blake W..The latest application filed is for "composite membrane with multi-layered active layer".

Company Profile

1.15.15

Davis; Blake W. - Hollister CA
Davis; Blake W. - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composite membrane with multi-layered active layer Grant 10,384,172 - Alrasheed , et al. A	2019-08-20
Composite Membrane With Multi-layered Active Layer App 20170144113 - Alrasheed; Radwan A. ; et al.	2017-05-25
Composite membrane with multi-layered active layer Grant 9,561,474 - Alrasheed , et al. February 7, 2	2017-02-07
Photo-patternable Dielectric Materials And Formulations And Methods Of Use App 20150189743 - Allen; Robert D. ; et al.	2015-07-02
Photo-patternable dielectric materials and formulations and methods of use Grant 9,012,587 - Allen , et al. April 21, 2	2015-04-21
Methods of forming nanoparticles using semiconductor manufacturing infrastructure Grant 8,986,596 - Cheng , et al. March 24, 2	2015-03-24
Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof Grant 8,946,371 - Brock , et al. February 3, 2	2015-02-03
Methods Of Forming Nanoparticles Using Semiconductor Manufacturing Infrastructure App 20140138863 - Cheng; Joy ; et al.	2014-05-22
Composite Membrane With Multi-layered Active Layer App 20130327714 - Alrasheed; Radwan A. ; et al.	2013-12-12
Photo-patternable Dielectric Materials And Formulations And Methods Of Use App 20130292163 - Allen; Robert David ; et al.	2013-11-07
Photo-patternable Dielectric Materials Curable To Porous Dielectric Materials, Formulations, Precursors And Methods Of Use Thereof App 20130189836 - Brock; Phillip J. ; et al.	2013-07-25
Photo-patternable dielectric materials and formulations and methods of use Grant 8,431,670 - Allen , et al. April 30, 2	2013-04-30
Chemically amplified silsesquioxane resist compositions Grant 8,426,113 - Bozano , et al. April 23, 2	2013-04-23
Chemically Amplified Silsesquioxane Resist Compositions App 20120040289 - Bozano; Luisa Dominica ; et al.	2012-02-16
Photopatternable dielectric materials for BEOL applications and methods for use Grant 8,029,971 - Allen , et al. October 4, 2	2011-10-04
Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures Grant 7,944,055 - Allen , et al. May 17, 2	2011-05-17
Photo-patternable Dielectric Materials Curable To Porous Dielectric Materials, Formulations, Precursors And Methods Of Use Thereof App 20110083887 - Brock; Phillip Joe ; et al.	2011-04-14
Photopatternable dielectric materials for BEOL applications and methods for use Grant 7,919,225 - Allen , et al. April 5, 2	2011-04-05
Photo-patternable Dielectric Materials And Formulations And Methods Of Use App 20110048787 - Allen; Robert David ; et al.	2011-03-03
Method of use for photopatternable dielectric materials for BEOL applications Grant 7,867,689 - Allen , et al. January 11, 2	2011-01-11
Spin-on Antireflective Coating For Integration Of Patternable Dielectric Materials And Interconnect Structures App 20100207276 - Allen; Robert D. ; et al.	2010-08-19
Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures Grant 7,709,370 - Allen , et al. May 4, 2	2010-05-04
Photopatternable Dielectric Materials For Beol Applications And Methods For Use App 20090291389 - Allen; Robert D. ; et al.	2009-11-26
Photopatternable Dielectric Materials For Beol Applications And Methods For Use App 20090233226 - Allen; Robert D. ; et al.	2009-09-17
Spin-on Antireflective Coating For Integration Of Patternable Dielectric Materials And Interconnect Structures App 20090081418 - Allen; Robert D. ; et al.	2009-03-26
Method Of Use For Photopatternable Dielectric Materials For Beol Applications App 20080286467 - Allen; Robert D. ; et al.	2008-11-20

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