loadpatents
name:-0.022413015365601
name:-0.013254880905151
name:-0.00061798095703125
Darsillo; Michael S. Patent Filings

Darsillo; Michael S.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Darsillo; Michael S..The latest application filed is for "antimicrobial silica composites".

Company Profile
0.10.16
  • Darsillo; Michael S. - Landenberg PA
  • Darsillo; Michael S. - Clifton Park NY
  • Darsillo; Michael S. - Woodbury CT
  • Darsillo; Michael S. - Champaign IL
  • Darsillo; Michael S. - Wadsworth OH
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
High throughput chemical mechanical polishing composition for metal film planarization
Grant 8,304,344 - Boggs , et al. November 6, 2
2012-11-06
Method of passivating chemical mechanical polishing compositions for copper film planarization processes
Grant 8,236,695 - Liu , et al. August 7, 2
2012-08-07
Aerogel particles and methods of making same
Grant 8,142,843 - Bauer , et al. March 27, 2
2012-03-27
Antimicrobial Silica Composites
App 20110236444 - Darsillo; Michael S. ;   et al.
2011-09-29
Mouth Rinse Compositions Including Chemically Modified Silica Or Silicate Materials For Sustained Delivery To Tooth Surfaces
App 20100189663 - Gallis; Karl W. ;   et al.
2010-07-29
Stabilization Of Polymer-silica Dispersions For Chemical Mechanical Polishing Slurry Applications
App 20100087065 - Boggs; Karl E. ;   et al.
2010-04-08
Tubule-blocking Silica Materials For Dentifrices
App 20100047742 - Pitcock, JR.; William Henry ;   et al.
2010-02-25
Integrated Chemical Mechanical Polishing Composition And Process For Single Platen Processing
App 20090215269 - Boggs; Karl E. ;   et al.
2009-08-27
Filtration Media for the Removal of Basic Molecular Contaminants for Use in a Clean Environment
App 20090211453 - Nassivera; Terry W. ;   et al.
2009-08-27
Method Of Passivating Chemical Mechanical Polishing Compositions For Copper Film Planarization Processes
App 20090137122 - Liu; Jun ;   et al.
2009-05-28
Aerogel Particles and Methods Of Making Same
App 20080311398 - Bauer; Ulrich ;   et al.
2008-12-18
High Throughput Chemical Mechanical Polishing Composition For Metal Film Planarization
App 20080254628 - Boggs; Karl E. ;   et al.
2008-10-16
Recording medium with glossy coating containing alumina
Grant 7,431,993 - Darsillo , et al. October 7, 2
2008-10-07
Passivative Chemical Mechanical Polishing Composition For Copper Film Planarization
App 20070181852 - Liu; Jun ;   et al.
2007-08-09
Ink jet recording medium comprising amine-treated silica
Grant 6,964,992 - Morris , et al. November 15, 2
2005-11-15
Recording medium
App 20050170107 - Darsillo, Michael S. ;   et al.
2005-08-04
Recording medium
App 20050170108 - Darsillo, Michael S. ;   et al.
2005-08-04
Ink jet recording medium comprising amine-treated silica
App 20050123697 - Morris, Michael D. ;   et al.
2005-06-09
Recording medium
Grant 6,887,559 - Darsillo , et al. May 3, 2
2005-05-03
Ink jet recording medium comprising amine-treated silica
Grant 6,861,115 - Morris , et al. March 1, 2
2005-03-01
Ink jet recording medium comprising amine-treated silica
App 20030003277 - Morris, Michael D. ;   et al.
2003-01-02
Ink jet recording medium comprising amine-treated silica
App 20020182377 - Morris, Michael D. ;   et al.
2002-12-05
Recording medium
Grant 6,420,039 - Field , et al. July 16, 2
2002-07-16
Recording medium
App 20020004131 - Darsillo, Michael S. ;   et al.
2002-01-10
Recording medium
Grant 6,284,819 - Darsillo , et al. September 4, 2
2001-09-04
Structure precipitated silicates and silicas, production and use in ink jet printing
Grant 5,827,363 - Darsillo , et al. October 27, 1
1998-10-27

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