Dammel; Ralph R

Patent Applications and Registrations

Patent applications and USPTO patent grants for Dammel; Ralph R.The latest application filed is for "composition for coating over a photoresist pattern comprising a lactam".

Company Profile

0.36.41

Dammel; Ralph R - Somerville NJ
Dammel; Ralph R. - Flemington NJ
Dammel; Ralph R. - Bangkok TH
Dammel; Ralph R. - Somerville NJ
Dammel; Ralph R. - Coventry RI

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same Grant 8,663,906 - Dammel , et al. March 4, 2	2014-03-04
Silicon-based antireflective coating compositions Grant 8,524,441 - Zhang , et al. September 3, 2	2013-09-03
Composition for Coating over a Photoresist Pattern Comprising a Lactam App 20120219919 - Thiyagarajan; Muthiah ; et al.	2012-08-30
Edge Bead Remover For Coatings App 20120108067 - Neisser; Mark O. ; et al.	2012-05-03
Hardmask process for forming a reverse tone image using polysilazane Grant 8,084,186 - Abdallah , et al. December 27, 2	2011-12-27
Positive-Working Photoimageable Bottom Antireflective Coating App 20110086312 - Dammel; Ralph R. ; et al.	2011-04-14
Composition for coating over a photoresist pattern comprising a lactam Grant 7,923,200 - Thiyagarajan , et al. April 12, 2	2011-04-12
Photoactive compounds Grant 7,833,693 - Rahman , et al. November 16, 2	2010-11-16
Process of imaging a photoresist with multiple antireflective coatings Grant 7,816,071 - Abdallah , et al. October 19, 2	2010-10-19
Silicon-containing Composition For Fine Pattern Formation And Method For Fine Pattern Formation Using The Same App 20100255430 - Dammel; Ralph R. ; et al.	2010-10-07
Hardmask Process for Forming a Reverse Tone Image Using Polysilazane App 20100203299 - Abdallah; David ; et al.	2010-08-12
Composition for coating over a photoresist pattern Grant 7,745,077 - Thiyagarajan , et al. June 29, 2	2010-06-29
Silicon-based Antireflective Coating Compositions App 20100092895 - Zhang; Ruzhi ; et al.	2010-04-15
Hardmask Process for Forming a Reverse Tone Image App 20100040838 - Abdallah; David J. ; et al.	2010-02-18
Composition for Coating over a Photoresist Pattern App 20090317739 - Thiyagarajan; Muthiah ; et al.	2009-12-24
Spin-on Graded K Silicon Antireflective Coating App 20090274974 - Abdallah; David ; et al.	2009-11-05
Photoresist Image-Forming Process Using Double Patterning App 20090253080 - Dammel; Ralph R. ; et al.	2009-10-08
Process for Shrinking Dimensions Between Photoresist Pattern Comprising a Pattern Hardening Step App 20090253081 - Abdallah; David ; et al.	2009-10-08
Composition for coating over a photoresist pattern Grant 7,595,141 - Kudo , et al. September 29, 2	2009-09-29
Photoactive compounds Grant 7,547,501 - Dammel , et al. June 16, 2	2009-06-16
Photoresist composition for deep UV and process thereof Grant 7,537,879 - Houlihan , et al. May 26, 2	2009-05-26
Photoactive compounds Grant 7,521,170 - Rahman , et al. April 21, 2	2009-04-21
Photoactive Compounds App 20090087782 - Rahman; M. Dalil ; et al.	2009-04-02
Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof Grant 7,473,512 - Houlihan , et al. January 6, 2	2009-01-06
Composition for Coating over a Photoresist Pattern Comprising a Lactam App 20080248427 - Thiyagarajan; Muthiah ; et al.	2008-10-09
Antireflective coating compositions Grant 7,416,834 - Abdallah , et al. August 26, 2	2008-08-26
Polymers Useful in Photoresist Compositions and Compositions Thereof App 20080171270 - Padmanaban; Munirathna ; et al.	2008-07-17
Photoactive Compounds App 20080085463 - Dammel; Ralph R. ; et al.	2008-04-10
Photoresist composition for deep ultraviolet lithography Grant 7,351,521 - Dammel , et al. April 1, 2	2008-04-01
Antireflective coating compositions App 20080076059 - Abdallah; David J. ; et al.	2008-03-27
Photoresist composition for deep ultraviolet lithography App 20070172762 - Dammel; Ralph R. ; et al.	2007-07-26
Photoresist composition for deep ultraviolet lithography App 20070154841 - Dammel; Ralph R. ; et al.	2007-07-05
Photoresist composition for deep ultraviolet lithography Grant 7,211,366 - Dammel , et al. May 1, 2	2007-05-01
Photoactive compounds App 20070015084 - Rahman; M. Dalil ; et al.	2007-01-18
Process of imaging a photoresist with multiple antireflective coatings App 20060177772 - Abdallah; David J. ; et al.	2006-08-10
Process of imaging a photoresist with multiple antireflective coatings App 20060177774 - Abdallah; David J. ; et al.	2006-08-10
Photoresist composition for deep UV and process thereof App 20060110677 - Houlihan; Francis M. ; et al.	2006-05-25
Composition for coating over a photoresist pattern App 20060088788 - Kudo; Takanori ; et al.	2006-04-27
Photoresist composition Grant 7,033,728 - Dammel April 25, 2	2006-04-25
Negative-working photoimageable bottom antireflective coating App 20060063105 - Oberlander; Joseph E. ; et al.	2006-03-23
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds Grant 6,991,888 - Padmanaban , et al. January 31, 2	2006-01-31
Aqueous edge bead remover App 20050282093 - Dammel, Ralph R. ; et al.	2005-12-22
Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof App 20050202347 - Houlihan, Francis M. ; et al.	2005-09-15
Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof App 20050202351 - Houlihan, Francis M. ; et al.	2005-09-15
Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof App 20050202340 - Houlihan, Francis M. ; et al.	2005-09-15
Photoresist composition App 20050147915 - Dammel, Ralph R.	2005-07-07
Photoresist composition for imaging thick films Grant 6,852,465 - Dammel , et al. February 8, 2	2005-02-08
Positive-working photoimageable bottom antireflective coating Grant 6,844,131 - Oberlander , et al. January 18, 2	2005-01-18
Negative-acting aqueous photoresist composition Grant 6,800,415 - Lu , et al. October 5, 2	2004-10-05
Negative deep ultraviolet photoresist Grant 6,800,416 - Kudo , et al. October 5, 2	2004-10-05
Photoresist composition for imaging thick films App 20040185368 - Dammel, Ralph R. ; et al.	2004-09-23
Photoresist composition for deep ultraviolet lithography App 20040166433 - Dammel, Ralph R. ; et al.	2004-08-26
Photoresist composition for deep ultraviolet lithography App 20040166434 - Dammel, Ralph R. ; et al.	2004-08-26
Photoresist composition for deep ultraviolet lithography Grant 6,737,215 - Dammel , et al. May 18, 2	2004-05-18
Photoresist composition for deep UV radiation containing an additive Grant 6,723,488 - Kudo , et al. April 20, 2	2004-04-20
Polymer suitable for photoresist compositions Grant 6,686,429 - Dammel , et al. February 3, 2	2004-02-03
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds App 20030235775 - Padmanaban, Munirathna ; et al.	2003-12-25
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds App 20030235782 - Padmanaban, Munirathna ; et al.	2003-12-25
Negative-working photoimageable bottom antireflective coating App 20030215736 - Oberlander, Joseph E. ; et al.	2003-11-20
Positive-working photoimageable bottom antireflective coating App 20030129531 - Oberlander, Joseph E. ; et al.	2003-07-10
Negative deep ultraviolet photoresist App 20030129527 - Kudo, Takanori ; et al.	2003-07-10
Negative-acting chemically amplified photoresist composition Grant 6,576,394 - Xu , et al. June 10, 2	2003-06-10
Photoresist composition for deep UV radiation containing an additive App 20030087180 - Kudo, Takanori ; et al.	2003-05-08
Negative- acting aqueous photoresist composition App 20030077539 - Lu, Ping-Hung ; et al.	2003-04-24
Novel Polymer Suitable For Photoresist Compositions App 20030013831 - Dammel, Ralph R. ; et al.	2003-01-16
Photoresist composition for deep ultraviolet lithography App 20020187419 - Dammel, Ralph R. ; et al.	2002-12-12
Photoresist composition for deep UV radiation Grant 6,365,322 - Padmanaban , et al. April 2, 2	2002-04-02
Antireflective coating compositions for photoresist compositions and use thereof Grant 5,994,430 - Ding , et al. November 30, 1	1999-11-30
Process for obtaining a lift-off imaging profile Grant 5,922,503 - Spak , et al. July 13, 1	1999-07-13
Antireflective coating for photoresist compositions Grant 5,733,714 - McCulloch , et al. March 31, 1	1998-03-31
Method of using a Lewis base to control molecular weight of novolak resins Grant 5,688,893 - Rahman , et al. November 18, 1	1997-11-18
Antireflective coatings for photoresist compositions Grant 5,652,317 - McCulloch , et al. July 29, 1	1997-07-29
Aqueous antireflective coatings for photoresist compositions Grant 5,652,297 - McCulloch , et al. July 29, 1	1997-07-29
Using a Lewis base to control molecular weight of novolak resins Grant 5,614,349 - Rahman , et al. March 25, 1	1997-03-25
Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists Grant 5,476,750 - Rahman , et al. December 19, 1	1995-12-19