Dammel; Ralph

Patent Applications and Registrations

Patent applications and USPTO patent grants for Dammel; Ralph.The latest application filed is for "aromatic imide compound and method for producing same".

Company Profile

0.13.3

Dammel; Ralph - Shizuoka JP
Dammel; Ralph - Flemington NJ
Dammel; Ralph - Coventry RI
Dammel; Ralph - Klein-Winternheim DE
Dammel; Ralph - Klein-Winterheim DE
Dammel; Ralph - Mainz-Bretzenheim DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Aromatic imide compound and method for producing same Grant 9,505,721 - Hirahara , et al. November 29, 2	2016-11-29
Aromatic Imide Compound And Method For Producing Same App 20150299132 - HIRAHARA; Eri ; et al.	2015-10-22
Antireflective coating compositions Grant 8,329,387 - Yao , et al. December 11, 2	2012-12-11
Antireflective Coating Compositions App 20100009297 - Yao; Huirong ; et al.	2010-01-14
Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives Grant 7,169,531 - Hohle , et al. January 30, 2	2007-01-30
Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives App 20050170279 - Hohle, Christoph ; et al.	2005-08-04
Negative photoresist compositions comprising a photosensitive compound, an alkoxymethylated melamine and novolak resin Grant 5,541,036 - Igawa , et al. July 30, 1	1996-07-30
Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith Grant 5,401,608 - Pawlowski , et al. March 28, 1	1995-03-28
Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture Grant 5,346,806 - Pawlowski , et al. September 13, 1	1994-09-13
Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition Grant 5,342,727 - Vicari , et al. August 30, 1	1994-08-30
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.-carbonyl-.alpha.-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound Grant 5,340,682 - Pawlowski , et al. * August 23, 1	1994-08-23
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.,.alpha.-bis(sulfonyl) diazo methane as an acid forming compound Grant 5,338,641 - Pawlowski , et al. August 16, 1	1994-08-16
Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation Grant 5,326,826 - Roeschert , et al. July 5, 1	1994-07-05
Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material Grant 5,302,488 - Roeschert , et al. April 12, 1	1994-04-12
Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture Grant 5,286,602 - Pawlowski , et al. February 15, 1	1994-02-15
Positive radiation-sensitive mixture and radiation-sensitive recording material produced therefrom Grant 4,946,759 - Doessel , et al. August 7, 1	1990-08-07

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