| Patent | Date |
|---|
Contact over active gate structure
Grant 11,437,284 - Wang , et al. September 6, 2 | 2022-09-06 |
Lithography process window enhancement for photoresist patterning
Grant 11,429,026 - Dai , et al. August 30, 2 | 2022-08-30 |
Methods for depositing amorphous silicon layers or silicon oxycarbide layers via physical vapor deposition
Grant 11,313,034 - Zeng , et al. April 26, 2 | 2022-04-26 |
Film Structure For Electric Field Assisted Bake Process
App 20220091513 - BANGAR; Mangesh Ashok ; et al. | 2022-03-24 |
Spin-orbit Torque Mram Structure And Manufacture Thereof
App 20210351342 - YUI; Minrui ; et al. | 2021-11-11 |
Lithography Process Window Enhancement For Photoresist Patterning
App 20210294216 - Dai; Huixiong ; et al. | 2021-09-23 |
Photoresist Patterning Process
App 20210294215 - DAI; Huixiong ; et al. | 2021-09-23 |
Techniques to engineer nanoscale patterned features using ions
Grant 11,043,380 - Ruffell , et al. June 22, 2 | 2021-06-22 |
Techniques To Engineer Nanoscale Patterned Features Using Ions
App 20210166936 - Ruffell; Simon ; et al. | 2021-06-03 |
Performance improvement of EUV photoresist by ion implantation
Grant 10,990,014 - Ma , et al. April 27, 2 | 2021-04-27 |
Lithography Simulation And Optical Proximity Correction
App 20210088896 - DAI; Huixiong ; et al. | 2021-03-25 |
Method for forming a layer
Grant 10,957,590 - Wang , et al. March 23, 2 | 2021-03-23 |
Contact over active gate structure
Grant 10,930,556 - Wang , et al. February 23, 2 | 2021-02-23 |
Contact over active gate structure
Grant 10,930,555 - Wang , et al. February 23, 2 | 2021-02-23 |
Methods and apparatus for patterning substrates using asymmetric physical vapor deposition
Grant 10,927,450 - Mebarki , et al. February 23, 2 | 2021-02-23 |
Methods and apparatus for patterning substrates using asymmetric physical vapor deposition
Grant 10,927,451 - Mebarki , et al. February 23, 2 | 2021-02-23 |
Process Control Of Electric Field Guided Photoresist Baking Process
App 20210041785 - DAI; Huixiong ; et al. | 2021-02-11 |
Directional treatment for multi-dimensional device processing
Grant 10,825,665 - Godet , et al. November 3, 2 | 2020-11-03 |
Methods And Apparatus For Patterning Substrates Using Asymmetric Physical Vapor Deposition
App 20200255937 - MEBARKI; BENCHERKI ; et al. | 2020-08-13 |
Film Structure For Electric Field Guided Photoresist Patterning Process
App 20200233307 - DAI; Huixiong ; et al. | 2020-07-23 |
Methods And Apparatus For Patterning Substrates Using Asymmetric Physical Vapor Deposition
App 20200199741 - MEBARKI; BENCHERKI ; et al. | 2020-06-25 |
Method For Forming A Layer
App 20200161181 - WANG; Wenhui ; et al. | 2020-05-21 |
Self-aligned interconnects formed using subtractive techniques
Grant 10,643,895 - Mebarki , et al. | 2020-05-05 |
Performance Improvement Of Euv Photoresist By Ion Implantation
App 20200096870 - Ma; Tristan Y. ; et al. | 2020-03-26 |
Contact Over Active Gate Structure
App 20200075409 - Wang; Wenhui ; et al. | 2020-03-05 |
Contact Over Active Gate Structure
App 20200075408 - Wang; Wenhui ; et al. | 2020-03-05 |
Contact Over Active Gate Structure
App 20200075422 - Wang; Wenhui ; et al. | 2020-03-05 |
Performance improvement of EUV photoresist by ion implantation
Grant 10,545,408 - Ma , et al. Ja | 2020-01-28 |
Techniques for manipulating patterned features using ions
Grant 10,381,232 - Ruffell , et al. A | 2019-08-13 |
PVD Films For EUV Lithography
App 20190212656 - Dai; Huixiong ; et al. | 2019-07-11 |
Overlay error correction
Grant 10,234,772 - Bangar , et al. | 2019-03-19 |
Performance Improvement Of Euv Photoresist By Ion Implantation
App 20190056914 - Ma; Tristan Y. ; et al. | 2019-02-21 |
Techniques To Engineer Nanoscale Patterned Features Using Ions
App 20180330944 - Ruffell; Simon ; et al. | 2018-11-15 |
Techniques For Manipulating Patterned Features Using Ions
App 20180261463 - Ruffell; Simon ; et al. | 2018-09-13 |
Techniques to engineer nanoscale patterned features using ions
Grant 10,008,384 - Ruffell , et al. June 26, 2 | 2018-06-26 |
Techniques for manipulating patterned features using ions
Grant 9,984,889 - Ruffell , et al. May 29, 2 | 2018-05-29 |
Methods For Depositing Amorphous Silicon Layers Or Silicon Oxycarbide Layers Via Physical Vapor Deposition
App 20180142343 - ZENG; Weimin ; et al. | 2018-05-24 |
Surface Treatment For EUV Lithography
App 20180135183 - Zeng; Weimin ; et al. | 2018-05-17 |
Overlay Error Correction
App 20180101103 - BANGAR; Mangesh ; et al. | 2018-04-12 |
Overlay error correction
Grant 9,864,280 - Bangar , et al. January 9, 2 | 2018-01-09 |
Self-aligned Interconnects Formed Using Subtractive Techniques
App 20170372960 - Mebarki; Bencherki ; et al. | 2017-12-28 |
Roll to roll wafer backside particle and contamination removal
Grant 9,815,091 - Ngai , et al. November 14, 2 | 2017-11-14 |
Techniques For Manipulating Patterned Features Using Ions
App 20170263460 - Ruffell; Simon ; et al. | 2017-09-14 |
Self-aligned interconnects formed using substractive techniques
Grant 9,761,489 - Mebarki , et al. September 12, 2 | 2017-09-12 |
Localized stress modulation for overlay and EPE
Grant 9,748,148 - Yieh , et al. August 29, 2 | 2017-08-29 |
Multi materials and selective removal enabled reverse tone process
Grant 9,728,406 - Dai , et al. August 8, 2 | 2017-08-08 |
Methods of selective layer deposition
Grant 9,716,012 - Thompson , et al. July 25, 2 | 2017-07-25 |
Overlay Error Correction
App 20170097576 - Bangar; Mangesh ; et al. | 2017-04-06 |
Techniques To Engineer Nanoscale Patterned Features Using Ions
App 20160379816 - Ruffell; Simon ; et al. | 2016-12-29 |
Resist Hardening And Development Processes For Semiconductor Device Manufacturing
App 20160329222 - Xie; Peng ; et al. | 2016-11-10 |
Optically tuned hardmask for multi-patterning applications
Grant 9,478,421 - Bencher , et al. October 25, 2 | 2016-10-25 |
Resist hardening and development processes for semiconductor device manufacturing
Grant 9,411,237 - Xie , et al. August 9, 2 | 2016-08-09 |
Lateral oxidation process flows
Grant 9,343,309 - Bangar , et al. May 17, 2 | 2016-05-17 |
Method for critical dimension reduction using conformal carbon films
Grant 9,337,051 - Mebarki , et al. May 10, 2 | 2016-05-10 |
Method For Critical Dimension Reduction Using Conformal Carbon Films
App 20160049305 - MEBARKI; Bencherki ; et al. | 2016-02-18 |
Optically Tuned Hardmask For Multi-patterning Applications
App 20160042951 - BENCHER; Christopher Dennis ; et al. | 2016-02-11 |
Multi Materials And Selective Removal Enabled Reserve Tone Process
App 20160042950 - DAI; Huixiong ; et al. | 2016-02-11 |
Localized Stress Modulation For Overlay And Epe
App 20160005662 - YIEH; Ellie Y. ; et al. | 2016-01-07 |
Roll To Roll Wafer Backside Particle And Contamination Removal
App 20150371879 - NGAI; Christopher S. ; et al. | 2015-12-24 |
Directional Treatment For Multi-dimensional Device Processing
App 20150325411 - GODET; Ludovic ; et al. | 2015-11-12 |
Optically tuned hardmask for multi-patterning applications
Grant 9,177,796 - Bencher , et al. November 3, 2 | 2015-11-03 |
Cyclic Spike Anneal Chemical Exposure For Low Thermal Budget Processing
App 20150275364 - Thompson; David ; et al. | 2015-10-01 |
Methods Of Selective Layer Deposition
App 20150162214 - Thompson; David ; et al. | 2015-06-11 |
Methods For Patterning A Hardmask Layer For An Ion Implantation Process
App 20150118832 - WOOD; Bingxi Sun ; et al. | 2015-04-30 |
Self-aligned interconnects formed using substractive techniques
App 20150056800 - Mebarki; Bencherki ; et al. | 2015-02-26 |
Optically Tuned Hardmask For Multi-patterning Applications
App 20140327117 - BENCHER; Christopher Dennis ; et al. | 2014-11-06 |
Resist Hardening And Development Processes For Semiconductor Device Manufacturing
App 20140263172 - Xie; Peng ; et al. | 2014-09-18 |
Line edge roughness reduction and double patterning
Grant 8,501,395 - Dai , et al. August 6, 2 | 2013-08-06 |
Frequency doubling using a photo-resist template mask
Grant 8,357,618 - Bencher , et al. January 22, 2 | 2013-01-22 |
Double exposure patterning with carbonaceous hardmask
Grant 8,293,460 - Chen , et al. October 23, 2 | 2012-10-23 |
Plasma Surface Treatment To Prevent Pattern Collapse In Immersion Lithography
App 20110111604 - Kim; Eui Kyoon ; et al. | 2011-05-12 |
Double patterning with a double layer cap on carbonaceous hardmask
Grant 7,901,869 - Bencher , et al. March 8, 2 | 2011-03-08 |
Methods And Appartus To Prevent Contamination Of A Photoresist Layer On A Substrate
App 20090317628 - Naik; Mehul ; et al. | 2009-12-24 |
Double Exposure Patterning With Carbonaceous Hardmask
App 20090311635 - CHEN; HUI W. ; et al. | 2009-12-17 |
Line edge roughness reduction and double patterning
App 20090142926 - Dai; Huixiong ; et al. | 2009-06-04 |
Frequency Doubling Using A Photo-resist Template Mask
App 20090111281 - Bencher; Christopher Dennis ; et al. | 2009-04-30 |
Plasma Surface Treatment To Prevent Pattern Collapse In Immersion Lithography
App 20090104541 - Kim; Eui Kyoon ; et al. | 2009-04-23 |
Double Patterning With A Double Layer Cap On Carbonaceous Hardmask
App 20080299494 - BENCHER; CHRISTOPHER D. ; et al. | 2008-12-04 |
| 