Corliss; Daniel A.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Corliss; Daniel A..The latest application filed is for "semiconductor microcooler".
Company Profile
14.20.20
- Corliss; Daniel A. - Waterford NY
- Corliss; Daniel A. - Hopewell Junction NY
- Corliss; Daniel A - Hopewell Junction NY
- Corliss; Daniel A. - Leominster MA
Patent Activity
| Patent | Date |
|---|---|
| Semiconductor microcooler Grant 11,056,418 - Canaperi , et al. July 6, 2 | 2021-07-06 |
| Semiconductor microcooler Grant 11,049,789 - Canaperi , et al. June 29, 2 | 2021-06-29 |
| Semiconductor Microcooler App 20200161216 - Canaperi; Donald F. ; et al. | 2020-05-21 |
| Baseline overlay control with residual noise reduction Grant 10,642,161 - Corliss , et al. | 2020-05-05 |
| Semiconductor Microcooler App 20200118904 - Canaperi; Donald F. ; et al. | 2020-04-16 |
| Baseline Overlay Control With Residual Noise Reduction App 20200117100 - Corliss; Daniel A. ; et al. | 2020-04-16 |
| Semiconductor Microcooler App 20200051886 - Canaperi; Donald F. ; et al. | 2020-02-13 |
| Semiconductor Microcooler App 20200051896 - Canaperi; Donald F. ; et al. | 2020-02-13 |
| Semiconductor microcooler Grant 10,553,516 - Canaperi , et al. Fe | 2020-02-04 |
| Semiconductor microcooler Grant 10,553,522 - Canaperi , et al. Fe | 2020-02-04 |
| Copper microcooler structure and fabrication Grant 10,490,480 - Lie , et al. Nov | 2019-11-26 |
| Copper microcooler structure and fabrication Grant 10,490,481 - Lie , et al. Nov | 2019-11-26 |
| Determination of lithography effective dose uniformity Grant 10,281,826 - Corliss , et al. | 2019-05-07 |
| Determination of lithography effective dose uniformity Grant 10,274,836 - Corliss , et al. | 2019-04-30 |
| Determination Of Lithography Effective Dose Uniformity App 20180373165 - CORLISS; DANIEL A. ; et al. | 2018-12-27 |
| Determination Of Lithography Effective Dose Uniformity App 20180373164 - CORLISS; DANIEL A. ; et al. | 2018-12-27 |
| Amplification method for photoresist exposure in semiconductor chip manufacturing Grant 9,709,898 - Wise , et al. July 18, 2 | 2017-07-18 |
| Dual pulse driven extreme ultraviolet (EUV) radiation source method Grant 9,451,684 - Corliss , et al. September 20, 2 | 2016-09-20 |
| Dual Pulse Driven Extreme Ultraviolet (euv) Radiation Source App 20160205757 - Corliss; Daniel A. ; et al. | 2016-07-14 |
| Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gas Grant 9,301,381 - Corliss , et al. March 29, 2 | 2016-03-29 |
| Dual Pulse Driven Extreme Ultraviolet (euv) Radiation Source Utilizing A Droplet Comprising A Metal Core With Dual Concentric Shells Of Buffer Gas App 20160081174 - Corliss; Daniel A. ; et al. | 2016-03-17 |
| Amplification method for photoresist exposure in semiconductor chip manufacturing Grant 9,104,113 - Wise , et al. August 11, 2 | 2015-08-11 |
| Amplification Method For Photoresist Exposure In Semiconductor Chip Manufacturing App 20150042972 - Wise; Richard S. ; et al. | 2015-02-12 |
| Amplification Method For Photoresist Exposure In Semiconductor Chip Manufacturing App 20140193755 - Wise; Richard S. ; et al. | 2014-07-10 |
| Semiconductor intra-field dose correction Grant 8,350,235 - Lee , et al. January 8, 2 | 2013-01-08 |
| Semiconductor Intra-field Dose Correction App 20110017926 - Lee; Hyung-Rae ; et al. | 2011-01-27 |
| Immersion lithography contamination gettering layer Grant 7,807,335 - Corliss , et al. October 5, 2 | 2010-10-05 |
| Focus Blur Measurement And Control Method App 20090011346 - Ausschnitt; Christopher P. ; et al. | 2009-01-08 |
| Focus blur measurement and control method Grant 7,439,001 - Ausschnitt , et al. October 21, 2 | 2008-10-21 |
| Method To Reduce Mechanical Wear Of Immersion Lithography Apparatus App 20080138631 - Patel; Kaushal S. ; et al. | 2008-06-12 |
| Evaporation control using coating Grant 7,351,348 - Corliss , et al. April 1, 2 | 2008-04-01 |
| Evaporation Control Using Coating App 20080009142 - Corliss; Daniel A. ; et al. | 2008-01-10 |
| Method and apparatus for immersion lithography Grant 7,230,681 - Holmes , et al. June 12, 2 | 2007-06-12 |
| Focus blur measurement and control method App 20070041003 - Ausschnitt; Christopher P. ; et al. | 2007-02-22 |
| Evaporation Control Using Coating App 20070034605 - Corliss; Daniel A. ; et al. | 2007-02-15 |
| Immersion lithography contamination gettering layer App 20060275706 - Corliss; Daniel A. ; et al. | 2006-12-07 |
| Method And Apparatus For Immersion Lithography App 20060103830 - Holmes; Steven J. ; et al. | 2006-05-18 |
| Planar reticle design/fabrication method for rapid inspection and cleaning Grant 6,919,146 - Corliss , et al. July 19, 2 | 2005-07-19 |
| Planar reticle design/fabrication method for rapid inspection and cleaning App 20030235764 - Corliss, Daniel A. ; et al. | 2003-12-25 |
| Semiconductor wafer processing with across-wafer critical dimension monitoring using optical endpoint detection Grant 5,427,878 - Corliss June 27, 1 | 1995-06-27 |
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