loadpatents
name:-0.0043389797210693
name:-0.0092270374298096
name:-0.00043892860412598
Conti; Richard Anthony Patent Filings

Conti; Richard Anthony

Patent Applications and Registrations

Patent applications and USPTO patent grants for Conti; Richard Anthony.The latest application filed is for "methods of forming integrated circuit devices having ion-cured electrically insulating layers therein".

Company Profile
0.7.2
  • Conti; Richard Anthony - Katonah NY
  • Conti; Richard Anthony - Mount Kisco NY
  • Conti; Richard Anthony - Kisco NY
  • Conti; Richard Anthony - Mt. Kisco NY
  • Conti; Richard Anthony - Westchester County NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods of forming integrated circuit devices having ion-cured electrically insulating layers therein
Grant 7,838,390 - Kim , et al. November 23, 2
2010-11-23
Methods of Forming Integrated Circuit Devices Having Ion-Cured Electrically Insulating Layers Therein
App 20090098706 - Kim; Jun-jung ;   et al.
2009-04-16
Method For Removing Material From A Semiconductor
App 20080233709 - Conti; Richard Anthony ;   et al.
2008-09-25
Controlled dopant diffusion and metal contamination in thin polycide gate conductor of MOSFET device
Grant 6,114,736 - Balasubramanyam , et al. September 5, 2
2000-09-05
Device formed by selective deposition of refractory metal of less than 300 Angstroms of thickness
Grant 6,049,131 - Brodsky , et al. April 11, 2
2000-04-11
Method of controlling dopant diffusion and metal contamination in thin polycide gate conductor of mosfet device
Grant 5,923,999 - Balasubramanyam , et al. July 13, 1
1999-07-13
Method for selective deposition of refractory metal and device formed thereby
Grant 5,807,788 - Brodsky , et al. September 15, 1
1998-09-15
Apparatus for chemical vapor deposition of aluminum oxide
Grant 5,728,222 - Barbee , et al. March 17, 1
1998-03-17
Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control
Grant 5,665,608 - Chapple-Sokol , et al. September 9, 1
1997-09-09

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