Collison; Wenli

Patent Applications and Registrations

Patent applications and USPTO patent grants for Collison; Wenli.The latest application filed is for "system and method for controlling plasma with an adjustable coupling to ground circuit".

Company Profile

0.11.5

Collison; Wenli - Fremont CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
System and method for controlling plasma with an adjustable coupling to ground circuit Grant 9,190,302 - Ni , et al. November 17, 2	2015-11-17
System and Method for Controlling Plasma With an Adjustable Coupling to Ground Circuit App 20130306240 - Ni; Tuqiang ; et al.	2013-11-21
System and method for controlling plasma with an adjustable coupling to ground circuit Grant 8,518,211 - Ni , et al. August 27, 2	2013-08-27
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same Grant 8,114,246 - Ni , et al. February 14, 2	2012-02-14
Vacuum Plasma Processor Having A Chamber With Electrodes And A Coil For Plasma Excitation And Method Of Operating Same App 20070044915 - Ni; Tuqiang ; et al.	2007-03-01
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same Grant 7,105,102 - Ni , et al. September 12, 2	2006-09-12
Methods for detecting the endpoint of a photoresist stripping process Grant 7,077,971 - Ni , et al. July 18, 2	2006-07-18
System and method for controlling plasma with an adjustable coupling to ground circuit App 20060112878 - Ni; Tuqiang ; et al.	2006-06-01
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same App 20040154747 - Ni, Tuqiang ; et al.	2004-08-12
System and method for controlling plasma with an adjustable coupling to ground circuit App 20040118344 - Ni, Tuqiang ; et al.	2004-06-24
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same Grant 6,716,303 - Ni , et al. April 6, 2	2004-04-06
Method for improving uniformity and reducing etch rate variation of etching polysilicon Grant 6,514,378 - Ni , et al. February 4, 2	2003-02-04
Elevated stationary uniformity ring design Grant 6,257,168 - Ni , et al. July 10, 2	2001-07-10
Plasma processor with coil having variable rf coupling Grant 6,229,264 - Ni , et al. May 8, 2	2001-05-08
Processing chamber with optical window cleaned using process gas Grant 6,052,176 - Ni , et al. April 18, 2	2000-04-18

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