Cody; Nyles

Patent Applications and Registrations

Patent applications and USPTO patent grants for Cody; Nyles.The latest application filed is for "method for making enhanced semiconductor structures in single wafer processing chamber with desired uniformity control".

Company Profile

0.9.9

Cody; Nyles - Tempe AZ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for making enhanced semiconductor structures in single wafer processing chamber with desired uniformity control Grant 9,721,790 - Mears , et al. August 1, 2	2017-08-01
Methods for making a semiconductor device including atomic layer structures using N.sub.2O as an oxygen source Grant 9,558,939 - Stephenson , et al. January 31, 2	2017-01-31
Method For Making Enhanced Semiconductor Structures In Single Wafer Processing Chamber With Desired Uniformity Control App 20160358773 - Mears; Robert J. ; et al.	2016-12-08
Selective deposition of silicon-containing films Grant 7,816,236 - Bauer , et al. October 19, 2	2010-10-19
Methods of selectively depositing silicon-containing films Grant 7,772,097 - Tomasini , et al. August 10, 2	2010-08-10
Epitaxial growth of relaxed silicon germanium layers Grant 7,666,799 - Arena , et al. February 23, 2	2010-02-23
Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition Grant 7,648,690 - Bauer , et al. January 19, 2	2010-01-19
Epitaxial Growth Of Relaxed Silicon Germanium Layers App 20090189185 - ARENA; Chantal ; et al.	2009-07-30
Methods Of Selectively Depositing Silicon-containing Films App 20090117717 - Tomasini; Pierre ; et al.	2009-05-07
Epitaxial growth of relaxed silicon germanium layers Grant 7,514,372 - Arena , et al. April 7, 2	2009-04-07
Methods Of Making Substitutionally Carbon-doped Crystalline Si-containing Materials By Chemical Vapor Deposition App 20090026496 - Bauer; Matthias ; et al.	2009-01-29
Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition Grant 7,438,760 - Bauer , et al. October 21, 2	2008-10-21
Method to planarize and reduce defect density of silicon germanium Grant 7,427,556 - Tomasini , et al. September 23, 2	2008-09-23
Methods And Systems For Selectively Depositing Si-containing Films Using Chloropolysilanes App 20080026149 - Tomasini; Pierre ; et al.	2008-01-31
Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition App 20060240630 - Bauer; Matthias ; et al.	2006-10-26
Selective deposition of silicon-containing films App 20060234504 - Bauer; Matthias ; et al.	2006-10-19
Epitaxial growth of relaxed silicon germanium layers App 20050051795 - Arena, Chantal ; et al.	2005-03-10
Method to planarize and reduce defect density of silicon germanium App 20040259333 - Tomasini, Pierre ; et al.	2004-12-23

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