Citla; Bhargav

Patent Applications and Registrations

Patent applications and USPTO patent grants for Citla; Bhargav.The latest application filed is for "pulsed dc source for high power impulse magnetron sputtering physical vapor deposition of dielectric films and methods of application".

Company Profile

4.5.7

Citla; Bhargav - Fremont CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods for depositing dielectric material Grant 11,114,306 - Citla , et al. September 7, 2	2021-09-07
High density, low stress amorphous carbon film, and process and equipment for its deposition Grant 10,858,727 - Liu , et al. December 8, 2	2020-12-08
Method to improve film quality for PVD carbon with reactive gas and bias power Grant 10,570,506 - Citla , et al. Feb	2020-02-25
Pulsed Dc Source For High Power Impulse Magnetron Sputtering Physical Vapor Deposition Of Dielectric Films And Methods Of Application App 20190127842 - BABAYAN; Viachslav ; et al.	2019-05-02
Sync Controller For High Impulse Magnetron Sputtering App 20190088457 - BABAYAN; Viachslav ; et al.	2019-03-21
Method To Improve Film Quality For Pvd Carbon With Reactive Gas And Bias Power App 20180209037 - CITLA; Bhargav ; et al.	2018-07-26
Selective Etch Using Material Modification And Rf Pulsing App 20180082861 - Citla; Bhargav ; et al.	2018-03-22
High Density, Low Stress Amorphous Carbon Film, And Process And Equipment For Its Deposition App 20180051368 - Liu; Jingjing ; et al.	2018-02-22
Selective etch using material modification and RF pulsing Grant 9,865,484 - Citla , et al. January 9, 2	2018-01-09
Selective Etch Using Material Modification And Rf Pulsing App 20180005850 - Citla; Bhargav ; et al.	2018-01-04
Gate electrode material residual removal process Grant 9,640,385 - Citla , et al. May 2, 2	2017-05-02
Gate Electrode Material Residual Removal Process App 20160240385 - Citla; Bhargav ; et al.	2016-08-18

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