Chung; No-young

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chung; No-young.The latest application filed is for "semiconductor device and layout design method".

Company Profile

5.9.10

Chung; No-young - Hwaseong-si KR
Chung; No Young - WhaSung N/A KR
Chung; No Young - WhaSung City KR
Chung, No Young - Icheon-city KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Extreme ultraviolet (EUV) mask for lithography and associated methods Grant 11,054,736 - Choi , et al. July 6, 2	2021-07-06
Methods of manufacturing semiconductor devices, method sof performing extreme ultraviolet ray exposure, and methods of performing optical proximity correction Grant 10,962,874 - Misaka , et al. March 30, 2	2021-03-30
Semiconductor Device And Layout Design Method App 20210066283 - KIM; Jeong-Lim ; et al.	2021-03-04
Optical proximity correction method and method of manufacturing mask by using the same Grant 10,908,498 - Kim , et al. February 2, 2	2021-02-02
Optical proximity correction method and method of fabricating lithography mask by using the same Grant 10,852,644 - Jung , et al. December 1, 2	2020-12-01
Optical Proximity Correction Method And Method Of Fabricating Lithography Mask By Using The Same App 20200124979 - JUNG; Byung-je ; et al.	2020-04-23
Semiconductor Devices App 20200119181 - JEON; Young-Doo ; et al.	2020-04-16
Methods Of Manufacturing Semiconductor Devices, Method Sof Performing Extreme Ultraviolet Ray Exposure, And Methods Of Performin App 20200064728 - Misaka; Akio ; et al.	2020-02-27
Extreme Ultraviolet (euv) Mask For Lithography And Associated Methods App 20190163048 - CHOI; Woon-hyuk ; et al.	2019-05-30
Method of forming pattern of semiconductor device from which various types of pattern defects are removed Grant 10,242,921 - Park , et al.	2019-03-26
Optical Proximity Correction Method And Method Of Manufacturing Mask By Using The Same App 20190018325 - KIM; Ki-soo ; et al.	2019-01-17
Method Of Forming Pattern Of Semiconductor Device From Which Various Types Of Pattern Defects Are Removed App 20170148689 - PARK; SANG-WOOK ; et al.	2017-05-25
Optimized channel implant for a semiconductor device and method of forming the same Grant 8,786,026 - Jung , et al. July 22, 2	2014-07-22
Method for fabricating a semiconductor device using a modeling algorithm to model the proximity effect from the sub-layer Grant 8,555,209 - Chung October 8, 2	2013-10-08
Optimized Channel Implant For A Semiconductor Device And Method Of Forming The Same App 20120211843 - JUNG; MUKYENG ; et al.	2012-08-23
Method For Fabricating A Semiconductor Device Using A Modeling Algorithm To Model The Proximity Effect From The Sub-layer App 20120204135 - CHUNG; NO YOUNG	2012-08-09
Semiconductor exposure apparatus and method for exposing semiconductor using the same App 20050286037 - Chung, No Young	2005-12-29

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.