| Patent | Date |
|---|
Semiconductor device and method of manufacture
Grant 11,437,280 - Lee , et al. September 6, 2 | 2022-09-06 |
Pre-Deposition Treatment for FET Technology and Devices Formed Thereby
App 20220262685 - Tsai; Cheng-Yen ; et al. | 2022-08-18 |
Gate Resistance Reduction Through Low-Resistivity Conductive Layer
App 20220238715 - Wu; Chung-Chiang ; et al. | 2022-07-28 |
Method of manufacturing a semiconductor device having a doped work-function layer
Grant 11,387,344 - Lee , et al. July 12, 2 | 2022-07-12 |
Fin field-effect transistor device having hybrid work function layer stack
Grant 11,380,793 - Lin , et al. July 5, 2 | 2022-07-05 |
Pre-deposition treatment for FET technology and devices formed thereby
Grant 11,322,411 - Tsai , et al. May 3, 2 | 2022-05-03 |
Gate resistance reduction through low-resistivity conductive layer
Grant 11,302,818 - Wu , et al. April 12, 2 | 2022-04-12 |
Pre-deposition treatment for FET technology and devices formed thereby
Grant 11,302,582 - Tsai , et al. April 12, 2 | 2022-04-12 |
Method of Tuning Threshold Voltages of Transistors
App 20210407995 - Chiu; Kuan-Chang ; et al. | 2021-12-30 |
Semiconductor Device And Method Of Manufacture
App 20210391219 - Lee; Chia-Ching ; et al. | 2021-12-16 |
Semiconductor Device and Method
App 20210358811 - Wu; Shao-Jyun ; et al. | 2021-11-18 |
Semiconductor Device With Profiled Work-function Metal Gate Electrode And Method Of Making
App 20210351085 - Lee; Da-Yuan ; et al. | 2021-11-11 |
Semiconductor Device And Method Of Manufacture
App 20210327761 - Wu; Chung-Chiang ; et al. | 2021-10-21 |
Semiconductor Devices and Methods of Manufacture
App 20210273070 - Lee; Chia-Ching ; et al. | 2021-09-02 |
Semiconductor device and method
Grant 11,081,396 - Wu , et al. August 3, 2 | 2021-08-03 |
Semiconductor device with profiled work-function metal gate electrode and method of making
Grant 11,075,124 - Lee , et al. July 27, 2 | 2021-07-27 |
Transistor metal gate and method of manufacture
Grant 11,056,395 - Wu , et al. July 6, 2 | 2021-07-06 |
Metal gate structure with multi-layer composition
Grant 10,998,414 - Chung , et al. May 4, 2 | 2021-05-04 |
Semiconductor Device and Method of Manufacture
App 20210098301 - Wu; Chung-Chiang ; et al. | 2021-04-01 |
Semiconductor Device and Method
App 20210082768 - Wu; Shao-Jyun ; et al. | 2021-03-18 |
Gate Resistance Reduction Through Low-Resistivity Conductive Layer
App 20210083118 - Wu; Chung-Chiang ; et al. | 2021-03-18 |
Semiconductor Device And Method Of Manufacture
App 20210057280 - Wu; Chung-Chiang ; et al. | 2021-02-25 |
Fin Field-effect Transistor Device And Method Of Forming The Same
App 20210036145 - Lin; Chun-Neng ; et al. | 2021-02-04 |
Semiconductor device and method of manufacture
Grant 10,867,864 - Wu , et al. December 15, 2 | 2020-12-15 |
Semiconductor Device With Profiled Work-function Metal Gate Electrode And Method Of Making
App 20200335404 - LEE; Da-Yuan ; et al. | 2020-10-22 |
Semiconductor device with profiled work-function metal gate electrode and method of making
Grant 10,699,966 - Lee , et al. | 2020-06-30 |
Semiconductor Device and Method of Manufacture
App 20200105602 - Wu; Chung-Chiang ; et al. | 2020-04-02 |
Pre-Deposition Treatment for FET Technology and Devices Formed Thereby
App 20200091006 - Tsai; Cheng-Yen ; et al. | 2020-03-19 |
Pre-Deposition Treatment for FET Technology and Devices Formed Thereby
App 20200083108 - Tsai; Cheng-Yen ; et al. | 2020-03-12 |
Pre-deposition treatment for FET technology and devices formed thereby
Grant 10,504,789 - Tsai , et al. Dec | 2019-12-10 |
Pre-Deposition Treatment for FET Technology and Devices Formed Thereby
App 20190371675 - Tsai; Cheng-Yen ; et al. | 2019-12-05 |
Metal Gate Structure with Device Gain and Yield Improvement
App 20170278941 - Chung; Hung-Chin ; et al. | 2017-09-28 |
Semiconductor Device With Profiled Work-function Metal Gate Electrode And Method Of Making
App 20170178973 - Lee; Da-Yuan ; et al. | 2017-06-22 |
Metal gate structure with multi-layer composition
Grant 9,679,984 - Chung , et al. June 13, 2 | 2017-06-13 |
Semiconductor device with metal gate structure comprising work-function metal layer and work-fuction adjustment layer
Grant 9,590,065 - Lee , et al. March 7, 2 | 2017-03-07 |
Semiconductor Device With Profiled Work-function Metal Gate Electrode And Method Of Making
App 20150155365 - Lee; Da-Yuan ; et al. | 2015-06-04 |
Metal Gate Structure with Device Gain and Yield Improvement
App 20140124875 - Chung; Hung-Chin ; et al. | 2014-05-08 |
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