loadpatents
name:-0.009922981262207
name:-0.005958080291748
name:-0.00047898292541504
CHUN; Jong-Sik Patent Filings

CHUN; Jong-Sik

Patent Applications and Registrations

Patent applications and USPTO patent grants for CHUN; Jong-Sik.The latest application filed is for "dual gate oxide structure in semiconductor device and method thereof".

Company Profile
0.5.7
  • CHUN; Jong-Sik - Gyeonggi-do KR
  • Chun; Jong-Sik - Suwon KR
  • Chun, Jong-Sik - Suwon-si KR
  • Chun; Jong-sik - Byeonggi-do KR
  • Chun, Jong-Sik - Suwon-City KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Dual Gate Oxide Structure In Semiconductor Device And Method Thereof
App 20070246779 - CHUN; Jong-Sik ;   et al.
2007-10-25
Dual gate oxide structure in semiconductor device and method thereof
Grant 7,250,346 - Chun , et al. July 31, 2
2007-07-31
Method of forming a contact in a semiconductor device
Grant 6,905,960 - Park , et al. June 14, 2
2005-06-14
Dual gate oxide structure in semiconductor device and method thereof
App 20050085042 - Chun, Jong-Sik ;   et al.
2005-04-21
Metal film semiconductor device and a method for forming the same
App 20050035458 - Lee, Jong-Myeong ;   et al.
2005-02-17
Metal film semiconductor device and a method for forming the same
Grant 6,844,627 - Lee , et al. January 18, 2
2005-01-18
Method of manufacturing a semiconductor device using a two-step deposition process
Grant 6,806,135 - Lim , et al. October 19, 2
2004-10-19
Metal film semiconductor device and a method for forming the same
App 20040051175 - Lee, Jong-Myeong ;   et al.
2004-03-18
Method of forming a contact in a semiconductor device
App 20040053491 - Park, Hong-Mi ;   et al.
2004-03-18
Method for treating a surface of a reaction chamber
App 20040045503 - Lee, Jong-Myeong ;   et al.
2004-03-11
Methods for forming aluminum metal wirings
Grant 6,673,718 - Lee , et al. January 6, 2
2004-01-06
Method of manufacturing a semiconductor device using a two-step deposition process
App 20030124798 - Lim, Hyun-Seok ;   et al.
2003-07-03

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed