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Patent applications and USPTO patent grants for Christov; Harry.The latest application filed is for "subnanometer-level light-based substrate cleaning mechanism".
Patent | Date |
---|---|
Subnanometer-level Light-based Substrate Cleaning Mechanism App 20210313173 - Randhawa; Rubinder S. ;   et al. | 2021-10-07 |
Subnanometer-level light-based substrate cleaning mechanism Grant 11,069,521 - Randhawa , et al. July 20, 2 | 2021-07-20 |
Sub-nanometer-level substrate cleaning mechanism Grant 10,985,039 - Randhawa , et al. April 20, 2 | 2021-04-20 |
Removal of process effluents Grant 10,892,172 - Randhawa , et al. January 12, 2 | 2021-01-12 |
Subnanometer-level Light-based Substrate Cleaning Mechanism App 20200219722 - Randhawa; Rubinder S. ;   et al. | 2020-07-09 |
Removal Of Process Effluents App 20190378729 - RANDHAWA; Rubinder S. ;   et al. | 2019-12-12 |
Sub-nanometer-level Substrate Cleaning Mechanism App 20190371629 - Randhawa; Rubinder S. ;   et al. | 2019-12-05 |
Method for precision cleaning and drying flat objects Grant 9,418,831 - Randhawa , et al. August 16, 2 | 2016-08-16 |
Single-chamber apparatus for precision cleaning and drying of flat objects Grant 9,275,849 - Randhawa , et al. March 1, 2 | 2016-03-01 |
Holding and rotary driving mechanism for flat objects Grant 9,202,725 - Randhawa , et al. December 1, 2 | 2015-12-01 |
Method for precision cleaning and drying flat objects App 20090032062 - Randhawa; Rubinder ;   et al. | 2009-02-05 |
Single-chamber apparatus for precision cleaning and drying of flat objects App 20090032070 - Randhawa; Rubinder ;   et al. | 2009-02-05 |
Holding and rotary driving mechanism for flat objects App 20080017225 - Randhawa; Rubinder S. ;   et al. | 2008-01-24 |
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