Chow; Ming-Fea
Patent Applications and Registrations
Patent applications and USPTO patent grants for Chow; Ming-Fea.The latest application filed is for "process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers".
- Chow; Ming-Fea - Poughquagh NY
- Chow; Ming-Fea - Poughguag NY
- Chow; Ming-Fea - Poughquag NY
| Patent | Date |
|---|---|
| Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers Grant 4,942,108 - Moreau , et al. July 17, 1 | 1990-07-17 |
| Thermally stable photoresists with high sensitivity Grant 4,939,070 - Brunsvold , et al. July 3, 1 | 1990-07-03 |
| Top imaged resists Grant 4,810,601 - Allen , et al. March 7, 1 | 1989-03-07 |
| Method of forming fine conductive lines, patterns and connectors Grant 4,702,792 - Chow , et al. October 27, 1 | 1987-10-27 |
| Method for dose calculation of photolithography projection printers through bleaching of photo-active compound in a photoresist Grant 4,474,864 - Chow , et al. October 2, 1 | 1984-10-02 |
| Process for forming resist masks utilizing O-quinone diazide and pyrene Grant 4,464,458 - Chow , et al. August 7, 1 | 1984-08-07 |
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