Chou; Ying-Min

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chou; Ying-Min.The latest application filed is for "surface tension modification using silane with hydrophobic functional group for thin film deposition".

Company Profile

0.15.15

Chou; Ying-Min - Tainan TW
CHOU; Ying-Min - Tainan City TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Cyclic deposition etch chemical vapor deposition epitaxy to reduce EPI abnormality Grant 10,134,896 - Tsai , et al. November 20, 2	2018-11-20
Semiconductor device Grant 9,735,271 - Hsiao , et al. August 15, 2	2017-08-15
Surface tension modification using silane with hydrophobic functional group for thin film deposition Grant 9,698,263 - Chong , et al. July 4, 2	2017-07-04
Semiconductor devices utilizing partially doped stressor film portions Grant 9,634,119 - Hsiao , et al. April 25, 2	2017-04-25
Fin field effect transistor and method for fabricating the same Grant 9,553,191 - Liao , et al. January 24, 2	2017-01-24
Semiconductor device and manufacturing method thereof Grant 9,543,387 - Chang , et al. January 10, 2	2017-01-10
Semiconductor integrated circuit with dislocations Grant 9,406,797 - JangJian , et al. August 2, 2	2016-08-02
Surface Tension Modification Using Silane With Hydrophobic Functional Group For Thin Film Deposition App 20160190320 - CHONG; Lai-Wan ; et al.	2016-06-30
Semiconductor Device App 20160181427 - HSIAO; Wen Chu ; et al.	2016-06-23
Semiconductor device Grant 9,324,863 - Hsiao , et al. April 26, 2	2016-04-26
Surface tension modification using silane with hydrophobic functional group for thin film deposition Grant 9,214,393 - Chong , et al. December 15, 2	2015-12-15
Semiconductor Devices Utilizing Partially Doped Stressor Film Portions App 20150311314 - Hsiao; Wen Chu ; et al.	2015-10-29
Semiconductor Device And Manufacturing Method Thereof App 20150255578 - CHANG; SHIH-CHIEH ; et al.	2015-09-10
Semiconductor Integrated Circuit With Dislocations App 20150255602 - JangJian; Shiu-Ko ; et al.	2015-09-10
Epitaxy In Semiconductor Structure And Manufacturing Method Thereof App 20150236124 - CHANG; SHIH-CHIEH ; et al.	2015-08-20
Semiconductor devices utilizing partially doped stressor film portions and methods for forming the same Grant 9,064,892 - Hsiao , et al. June 23, 2	2015-06-23
Dual damascene metal gate Grant 8,927,406 - Wang , et al. January 6, 2	2015-01-06
Cyclic Deposition Etch Chemical Vapor Deposition Epitaxy To Reduce Epi Abnormality App 20140246710 - TSAI; Chun Hsiung ; et al.	2014-09-04
Semiconductor device App 20140239416 - HSIAO; Wen Chu ; et al.	2014-08-28
Dual Damascene Metal Gate App 20140191299 - Wang; Chun-Chieh ; et al.	2014-07-10
Method of manufacturing semiconductor device Grant 8,735,255 - Hsiao , et al. May 27, 2	2014-05-27
Method Of Manufacturing Semiconductor Device App 20130295739 - HSIAO; Wen Chu ; et al.	2013-11-07
Surface Tension Modification Using Silane With Hydrophobic Functional Group For Thin Film Deposition App 20130256663 - CHONG; Lai Wan ; et al.	2013-10-03
Semiconductor Devices Utilizing Partially Doped Stressor Film Portions And Methods For Forming The Same App 20130049101 - HSIAO; Wen Chu ; et al.	2013-02-28

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