Chor; Eng Fong

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chor; Eng Fong.The latest application filed is for "end of range (eor) secondary defect engineering using chemical vapor deposition (cvd) substitutional carbon doping".

Company Profile

0.6.3

Chor; Eng Fong - Singapore SG

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
End of range (EOR) secondary defect engineering using chemical vapor deposition (CVD) substitutional carbon doping Grant 7,400,018 - Tan , et al. July 15, 2	2008-07-15
End Of Range (eor) Secondary Defect Engineering Using Chemical Vapor Deposition (cvd) Substitutional Carbon Doping App 20060270168 - Tan; Chung Foong ; et al.	2006-11-30
End of range (EOR) secondary defect engineering using substitutional carbon doping Grant 7,109,099 - Tan , et al. September 19, 2	2006-09-19
Shallow amorphizing implant for gettering of deep secondary end of range defects Grant 7,071,069 - Tan , et al. July 4, 2	2006-07-04
Shallow amorphizing implant for gettering of deep secondary end of range defects App 20050136623 - Tan, Chung Foong ; et al.	2005-06-23
End of range (EOR) secondary defect engineering using substitutional carbon doping App 20050085055 - Tan, Chung Foong ; et al.	2005-04-21
Embedded polysilicon gate MOSFET Grant 6,252,277 - Chan , et al. June 26, 2	2001-06-26
Production of reversed flash memory device Grant 6,096,604 - Cha , et al. August 1, 2	2000-08-01
Method and apparatus to image metallic patches embedded in a non-metal surface Grant 6,064,201 - Cha , et al. May 16, 2	2000-05-16

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