CHONG; Halbert

Patent Applications and Registrations

Patent applications and USPTO patent grants for CHONG; Halbert.The latest application filed is for "methods and apparatus for processing a substrate".

Company Profile

5.3.8

CHONG; Halbert - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods And Apparatus For Processing A Substrate App 20220310364 - CHONG; Halbert ; et al.	2022-09-29
Methods And Apparatus For Processing A Substrate App 20220310363 - CHONG; Halbert ; et al.	2022-09-29
Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability Grant 11,289,312 - Allen , et al. March 29, 2	2022-03-29
Extreme ultraviolet mask absorber materials Grant 11,249,390 - Liu , et al. February 15, 2	2022-02-15
Coating for chamber particle reduction Grant 11,251,024 - Tseng , et al. February 15, 2	2022-02-15
Methods And Apparatus For Processing A Substrate App 20210319989 - CHONG; Halbert ; et al.	2021-10-14
Coating For Chamber Particle Reduction App 20210043429 - TSENG; Hsin-wei ; et al.	2021-02-11
Physical Vapor Deposition (pvd) Chamber With In Situ Chamber Cleaning Capability App 20200395198 - ALLEN; ADOLPH M. ; et al.	2020-12-17
Method For Particle Removal From Wafers Through Plasma Modification In Pulsed PVD App 20200255938 - Chong; Halbert ; et al.	2020-08-13
Extreme Ultraviolet Mask Absorber Materials App 20200249557 - Kind Code	2020-08-06
Wet Cleaning Inside Of Gasline Of Semiconductor Process Equipment App 20190352775 - PENG; Gang ; et al.	2019-11-21

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