Choi; Yoo-Jeong

Patent Applications and Registrations

Patent applications and USPTO patent grants for Choi; Yoo-Jeong.The latest application filed is for "monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition".

Company Profile

3.20.20

Choi; Yoo-Jeong - Uiwang-si KR
Choi; Yoo-Jeong - Suwon-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition Grant 10,345,706 - Song , et al. July 9, 2	2019-07-09
Monomer, organic layer composition, organic layer, and method of forming patterns Grant 10,332,751 - Choi , et al.	2019-06-25
Organic layer composition, organic layer, and method of forming patterns Grant 10,066,057 - Park , et al. September 4, 2	2018-09-04
Hardmask composition and method of forming patterns using the hardmask composition Grant 10,018,914 - Nam , et al. July 10, 2	2018-07-10
Polymer, organic layer composition, organic layer, and method of forming patterns Grant 9,971,243 - Park , et al. May 15, 2	2018-05-15
Monomer For A Hardmask Composition, Hardmask Composition Comprising The Monomer, And Method For Forming A Pattern Using The Hardmask Composition App 20170327640 - KIM; Yun-Jun ; et al.	2017-11-16
Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition Grant 9,725,389 - Kim , et al. August 8, 2	2017-08-08
Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition Grant 9,671,688 - Shin , et al. June 6, 2	2017-06-06
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns Grant 9,665,003 - Choi , et al. May 30, 2	2017-05-30
Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition Grant 9,556,094 - Kim , et al. January 31, 2	2017-01-31
Polymer, Organic Layer Composition, Organic Layer, And Method Of Forming Patterns App 20160363864 - PARK; Yu-Shin ; et al.	2016-12-15
Organic Layer Composition, Organic Layer, And Method Of Forming Patterns App 20160297932 - PARK; Yu-Shin ; et al.	2016-10-13
Monomer, Organic Layer Composition, Organic Layer, And Method Of Forming Patterns App 20160237306 - Choi; Yoo-Jeong ; et al.	2016-08-18
Hardmask composition and method of forming patterns using the hardmask composition Grant 9,371,444 - Choi , et al. June 21, 2	2016-06-21
Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition Grant 9,359,276 - Choi , et al. June 7, 2	2016-06-07
Hardmask Composition And Method Of Forming Patterns Using The Hardmask Composition App 20150329718 - CHOI; Yoo-Jeong ; et al.	2015-11-19
Hardmask Composition And Method Of Forming Patterns Using The Hardmask Composition App 20150332931 - NAM; Youn-Hee ; et al.	2015-11-19
Monomer For Hardmask Composition, Hardmask Composition Including Said Monomer, And Method For Forming Pattern Using Said Hardmask Composition App 20150301446 - SHIN; Seung-Wook ; et al.	2015-10-22
Monomer, Hardmask Composition Including Monomer, And Method For Forming Pattern By Using Hardmask Composition App 20150274622 - Kim; Yun-Jun ; et al.	2015-10-01
Hardmask Composition, Method Of Forming Patterns Using The Hardmask Composition And Semiconductor Integrated Circuit Device Including The Patterns App 20150187566 - PARK; Yu-Shin ; et al.	2015-07-02
Hardmask composition including aromatic ring-containing compound, method of forming patterns, and semiconductor integrated circuit device including the patterns Grant 9,018,776 - Song , et al. April 28, 2	2015-04-28
Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns Grant 8,952,373 - Choi , et al. February 10, 2	2015-02-10
Monomer For Hardmask Composition, Hardmask Composition Including Monomer, And Pattern Forming Method Using Hardmask Composition App 20150008212 - Choi; Yoo-Jeong ; et al.	2015-01-08
Monomer For Hardmask Composition And Hardmask Composition Including The Monomer And Method Of Forming Patterns Using The Hardmask Composition App 20150001178 - SONG; Hyun-Ji ; et al.	2015-01-01
Hardmask Composition, Method Of Forming Patterns Using The Hardmask Composition And Semiconductor Integrated Circuit Device Including The Patterns App 20150004531 - CHOI; Yoo-Jeong ; et al.	2015-01-01
Monomer For A Hardmask Composition, Hardmask Composition Comprising The Monomer, And Method For Forming A Pattern Using The Hardmask Composition App 20140342273 - Kim; Yun-Jun ; et al.	2014-11-20
Hardmask Composition And Method Of Forming Patterns And Semiconductor Integrated Circuit Device Including The Patterns App 20140183701 - CHOI; Yoo-Jeong ; et al.	2014-07-03
Hardmask composition, method of forming a pattern using the same, and semiconductor integrated circuit device including the pattern Grant 8,741,539 - Oh , et al. June 3, 2	2014-06-03
Hardmask Composition And Method Of Forming Patterns And Semiconductor Integrated Circuit Device Including The Patterns App 20120153511 - SONG; Jee-Yun ; et al.	2012-06-21
Hardmask Composition, Method Of Forming A Pattern Using The Same, And Semiconductor Integrated Circuit Device Including The Pattern App 20120153424 - OH; Seung-Bae ; et al.	2012-06-21

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