| Patent | Date |
|---|
Mask And Manufacturing Method For Liquid Crystal Display Using The Same
App 20160216602 - CHOI; Seong Woon ; et al. | 2016-07-28 |
Method of fabricating semiconductor device
Grant 8,689,150 - Jung , et al. April 1, 2 | 2014-04-01 |
Photoacid generator, chemically amplified resist composition including the same, and associated methods
Grant 8,536,347 - Kang , et al. September 17, 2 | 2013-09-17 |
Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effect
Grant 8,510,684 - Jeong , et al. August 13, 2 | 2013-08-13 |
Systems, methods and computer program products for forming photomasks with reduced likelihood of feature collapse, and photomasks so formed
Grant 8,484,584 - Lee , et al. July 9, 2 | 2013-07-09 |
Method of forming fine patterns using a block copolymer
Grant 8,399,174 - Kim , et al. March 19, 2 | 2013-03-19 |
Method of manufacturing semiconductor device by using uniform optical proximity correction
Grant 8,392,854 - Kim , et al. March 5, 2 | 2013-03-05 |
Method of forming line/space patterns
Grant 8,338,310 - Jung , et al. December 25, 2 | 2012-12-25 |
Methods of arranging mask patterns and associated apparatus
Grant 8,341,561 - Park , et al. December 25, 2 | 2012-12-25 |
Method of forming patterns of semiconductor device
Grant 8,263,487 - Yoon , et al. September 11, 2 | 2012-09-11 |
Method Of Fabricating Semiconductor Device
App 20120220058 - JUNG; Jee-eun ; et al. | 2012-08-30 |
Method Of Forming Layout Of Photomask
App 20120221982 - JEONG; MOON-GYU ; et al. | 2012-08-30 |
Systems, Methods And Computer Program Products For Forming Photomasks With Reduced Likelihood Of Feature Collapse, And Photomasks So Formed
App 20120210278 - Lee; Mi-kyeong ; et al. | 2012-08-16 |
Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the same
Grant 8,227,349 - Kim , et al. July 24, 2 | 2012-07-24 |
Method of forming fine patterns of a semiconductor device
Grant 8,173,358 - Kim , et al. May 8, 2 | 2012-05-08 |
Method Of Forming Fine Patterns Using A Block Copolymer
App 20120003587 - KIM; Kyoung Taek ; et al. | 2012-01-05 |
Method Of Manufacturing Semiconductor Device By Using Uniform Optical Proximity Correction
App 20110265048 - KIM; Sang-wook ; et al. | 2011-10-27 |
Method of forming fine patterns using a block copolymer
Grant 8,039,196 - Kim , et al. October 18, 2 | 2011-10-18 |
Photomask Using Separated Exposure Technique, Method Of Fabricating Photomask, And Apparatus For Fabricating Photomask By Using The Method
App 20110244376 - HAN; Hak-seung ; et al. | 2011-10-06 |
Method Of Manufacturing Semiconductor Device
App 20110244689 - Han; So-ra ; et al. | 2011-10-06 |
Method Of Performing Etch Proximity Correction, Method Of Forming Photomask Layout Using The Method, Computer-readable Recording Medium Storing Programmed Instructions For Executing The Method, And Mask Imaging System
App 20110224945 - Shim; Seong-bo ; et al. | 2011-09-15 |
Methods Of Arranging Mask Patterns And Associated Apparatus
App 20110119644 - Park; Dong-woon ; et al. | 2011-05-19 |
Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method
Grant 7,939,223 - Han , et al. May 10, 2 | 2011-05-10 |
Method Of Forming A Mask Pattern, Method Of Forming A Minute Pattern, And Method Of Manufacturing A Semiconductor Device Using The Same
App 20110053362 - KIM; Hyoung-Hee ; et al. | 2011-03-03 |
Method of generating layout of semiconductor device
App 20110029936 - Baek; Kyoung-yun ; et al. | 2011-02-03 |
Method Of Forming Line/space Patterns
App 20100297852 - Jung; Sung-gon ; et al. | 2010-11-25 |
Method of forming patterns of semiconductor device
App 20100248492 - Yoon; Dong-ki ; et al. | 2010-09-30 |
Methods for forming pattern using electron beam and cell masks used in electron beam lithography
Grant 7,736,838 - Kim , et al. June 15, 2 | 2010-06-15 |
Method Of Forming Fine Patterns Of A Semiconductor Device
App 20100093172 - KIM; Hyoung-hee ; et al. | 2010-04-15 |
Method of manufacturing EUVL alternating phase-shift mask
Grant 7,601,467 - Huh , et al. October 13, 2 | 2009-10-13 |
Photo-mask having exposure blocking region and methods of designing and fabricating the same
Grant 7,560,198 - Jang , et al. July 14, 2 | 2009-07-14 |
Photoacid generator, chemically amplified resist composition including the same, and associated methods
App 20090131684 - Kang; Yool ; et al. | 2009-05-21 |
Method of repairing phase shift mask
Grant 7,527,901 - Lee , et al. May 5, 2 | 2009-05-05 |
Photo mask and method of correcting the transmissivity of a photo mask
Grant 7,521,156 - Ahn , et al. April 21, 2 | 2009-04-21 |
Exposure apparatus and method of exposing a semiconductor substrate
App 20090059197 - Nam; Dong-seok ; et al. | 2009-03-05 |
Method of forming fine patterns using a block copolymer
App 20090042146 - Kim; Kyoung Taek ; et al. | 2009-02-12 |
Photomask and method of controlling transmittance and phase of light using the photomask
Grant 7,465,524 - Park , et al. December 16, 2 | 2008-12-16 |
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare
Grant 7,393,615 - Ki , et al. July 1, 2 | 2008-07-01 |
Methods, systems and computer program products for correcting photomask using aerial images and boundary regions
Grant 7,389,491 - Park , et al. June 17, 2 | 2008-06-17 |
System and method for measuring dimension of patterns formed on photomask
Grant 7,369,254 - Lee , et al. May 6, 2 | 2008-05-06 |
Photolithography Apparatus Having Mirror for Correcting Aberrations in Optical Illumination System and Mirror Having Aberration Correcting Part
App 20080062397 - Nam; Dong-seok ; et al. | 2008-03-13 |
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation
Grant 7,341,809 - Jeong , et al. March 11, 2 | 2008-03-11 |
Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method
App 20070231715 - Han; Hak-seung ; et al. | 2007-10-04 |
Methods for forming pattern using electron beam and cell masks used in electron beam lithography
App 20070166646 - Kim; Hee-Bom ; et al. | 2007-07-19 |
Systems and methods for fabricating photo masks
App 20070111112 - Huh; Sung-Min ; et al. | 2007-05-17 |
Method of inspecting defects in photomask having a plurality of dies with different transmittances
App 20060269118 - Lee; Myoung-Soo ; et al. | 2006-11-30 |
Method of manufacturing EUVL alternating phase-shift mask
App 20060240334 - Huh; Sung-min ; et al. | 2006-10-26 |
Methods, systems and computer program products for correcting photomask using aerial images and boundary regions
App 20060204862 - Park; Ji-Soong ; et al. | 2006-09-14 |
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation
App 20060204864 - Jeong; Tae-moon ; et al. | 2006-09-14 |
Phase shift masks
App 20060177745 - Huh; Sung-min ; et al. | 2006-08-10 |
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation
Grant 7,070,891 - Jeong , et al. July 4, 2 | 2006-07-04 |
Method for making an OPC mask and an OPC mask manufactured using the same
Grant 7,065,735 - Ki , et al. June 20, 2 | 2006-06-20 |
System and method for measuring dimension of patterns formed on photomask
App 20060066878 - Lee; Dong-Gun ; et al. | 2006-03-30 |
Photo-mask having exposure blocking region and methods of designing and fabricating the same
App 20060051684 - Jang; Il-Yong ; et al. | 2006-03-09 |
Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask
Grant 7,001,697 - Park , et al. February 21, 2 | 2006-02-21 |
Method of repairing phase shift mask
App 20060019178 - Lee; Jeong-Yun ; et al. | 2006-01-26 |
Photo mask and method of correcting the transmissivity of a photo mask
App 20060019174 - Ahn; Won-suk ; et al. | 2006-01-26 |
Photomask and method of controlling transmittance and phase of light using the photomask
App 20050158636 - Park, Jin-hong ; et al. | 2005-07-21 |
Optical critical dimension measurement equipment
App 20050140988 - Lee, Dong-gun ; et al. | 2005-06-30 |
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare
App 20050083518 - Ki, Won-Tai ; et al. | 2005-04-21 |
Photomask for off-axis illumination and method of fabricating the same
Grant 6,866,968 - Shin , et al. March 15, 2 | 2005-03-15 |
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare
Grant 6,835,507 - Ki , et al. December 28, 2 | 2004-12-28 |
Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask
App 20040067422 - Park, Jong-Rak ; et al. | 2004-04-08 |
Method for making an OPC mask and an OPC mask manufactured using the same
App 20030226130 - Ki, Won-Tai ; et al. | 2003-12-04 |
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation
App 20030175600 - Jeong, Tae-moon ; et al. | 2003-09-18 |
Photomask for off-axis illumination and method of fabricating the same
App 20030148193 - Shin, In-Kyun ; et al. | 2003-08-07 |
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare
App 20030068565 - Ki, Won-Tai ; et al. | 2003-04-10 |
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