CHOI; Hyo Seok

Patent Applications and Registrations

Patent applications and USPTO patent grants for CHOI; Hyo Seok.The latest application filed is for "semiconductor device".

Company Profile

4.13.13

CHOI; Hyo Seok - Hwaseong-si KR
Choi; Hyo-Seok - Suwon-si KR
Choi; Hyo-Seok - Seoul KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor Device App 20220199790 - LEE; Heon Bok ; et al.	2022-06-23
Semiconductor device and method for fabricating the same Grant 11,296,196 - Lee , et al. April 5, 2	2022-04-05
Semiconductor device and method for fabricating the same Grant 11,063,036 - Choi , et al. July 13, 2	2021-07-13
Semiconductor devices with shaped portions of elevated source/drain regions Grant 10,840,374 - Shin , et al. November 17, 2	2020-11-17
Semiconductor Device And Method For Fabricating The Same App 20200176575 - Lee; Heon Bok ; et al.	2020-06-04
Semiconductor devices including contact structures that partially overlap silicide layers Grant 10,403,717 - Lee , et al. Sep	2019-09-03
Semiconductor devices having reduced contact resistance Grant 10,332,984 - Choi , et al.	2019-06-25
Semiconductor Devices With Shaped Portions Of Elevated Source/drain Regions App 20180331218 - Shin; Chung-Hwan ; et al.	2018-11-15
Semiconductor devices with shaped portions of elevated source/drain regions Grant 10,043,902 - Shin , et al. August 7, 2	2018-08-07
Semiconductor Device And Method For Fabricating The Same App 20180151556 - CHOI; Hyo Seok ; et al.	2018-05-31
Semiconductor Devices Having Reduced Contact Resistance App 20180090583 - Choi; Hyo Seok ; et al.	2018-03-29
Semiconductor Devices Including Contact Structures That Partially Overlap Silicide Layers App 20170352728 - Lee; Do-Sun ; et al.	2017-12-07
Semiconductor devices including contact structures that partially overlap silicide layers Grant 9,768,255 - Lee , et al. September 19, 2	2017-09-19
Semiconductor Devices Including Contact Structures That Partially Overlap Silicide Layers App 20160308004 - LEE; Do-Sun ; et al.	2016-10-20
Semiconductor Devices With Shaped Portions Of Elevated Source/drain Regions App 20160233334 - Shin; Chung-Hwan ; et al.	2016-08-11
Methods of forming semiconductor devices with metal silicide using pre-amorphization implants Grant 9,240,323 - Shin , et al. January 19, 2	2016-01-19
Methods Of Forming Semiconductor Devices With Metal Silicide Using Pre-amorphization Implants And Devices So Formed App 20130316535 - Shin; Chung-Hwan ; et al.	2013-11-28
Method for manufacturing semiconductor device Grant 5,740,065 - Jang , et al. April 14, 1	1998-04-14

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