Choi; Dong Chang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Choi; Dong Chang.The latest application filed is for "photomask and method for manufacturing column spacer for color filter using the same".

Company Profile

1.14.11

Choi; Dong Chang - Daejeon KR
Choi; Dong-chang - Busan N/A KR
Choi; Dong-Chang - Daejeon Metropolitan City KR
Choi; Dong-Chang - Metropolitan City KR
Choi; Dong-Chang - Taejeon KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photomask and method for manufacturing column spacer for color filter using the same Grant 10,642,150 - Seo , et al.	2020-05-05
Photomask And Method For Manufacturing Column Spacer For Color Filter Using The Same App 20170285459 - SEO; Dae Han ; et al.	2017-10-05
Photosensitive resin composition for black matrix Grant 8,822,127 - Choi , et al. September 2, 2	2014-09-02
Colored dispersion, photoresist composition and black matrix Grant 8,822,132 - Choi , et al. September 2, 2	2014-09-02
Method for manufacturing color filter and color filter manufactured by using the same Grant 8,597,861 - Kim , et al. December 3, 2	2013-12-03
Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same Grant 8,535,874 - Kim , et al. September 17, 2	2013-09-17
Mold for gravity casting and gravity casting method using the mold Grant 8,448,692 - Chu , et al. May 28, 2	2013-05-28
Mold For Gravity Casting And Gravity Casting Method Using The Mold App 20120285649 - Chu; Dong Ho ; et al.	2012-11-15
Mold for gravity casting and gravity casting method using the mold Grant 8,267,151 - Chu , et al. September 18, 2	2012-09-18
Mold For Gravity Casting And Gravity Casting Method Using The Mold App 20120145350 - Chu; Dong Ho ; et al.	2012-06-14
Black Matrix Composition With High Light-shielding And Improved Adhesion Properties App 20110151379 - Choi; Dong Chang ; et al.	2011-06-23
Photosensitive Resin Composition For Black Matrix App 20110101268 - Choi; Dong Chang ; et al.	2011-05-05
Fluorene-based Polymer Containing Urethane Groups, Preparation Method Thereof And Negative-type Photosensitive Resin Composition Comprising The Same App 20100201925 - Kim; Han Soo ; et al.	2010-08-12
Colored Dispersion, Photoresist Composition And Black Matrix App 20100104981 - Choi; Dong Chang ; et al.	2010-04-29
Photo-sensitive Resin Composition For Black Matrix, Black Matrix Produced By The Composition And Liquid Crystal Display Including The Black Matrix App 20100085518 - Choi; Kyung-Soo ; et al.	2010-04-08
Ink composition, color filter manufactured by using the same, and display device comprising the same App 20090284698 - Kim; Mi-Kyoung ; et al.	2009-11-19
Photosensitive composition comprising triazine-based photoactive compound containing oxime ester Grant 7,556,910 - Kim , et al. July 7, 2	2009-07-07
Photosensitive composition comprising triazine-based photoactive compound containing oxime ester App 20070128548 - Kim; Sung Hyun ; et al.	2007-06-07
Patterning method using coatings containing ionic components App 20070048448 - Kim; Dae Hyun ; et al.	2007-03-01
Triazene-based compound comprising functionalized alkylthio groups, and photopolymerization initiator Grant 6,797,739 - Kim , et al. September 28, 2	2004-09-28

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