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Patent applications and USPTO patent grants for CHOI; Bo Hyeok.The latest application filed is for "cmp slurry composition for polishing polycrystalline silicon and polishing method using same".
Patent | Date |
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Cmp Slurry Composition For Polishing Polycrystalline Silicon And Polishing Method Using Same App 20220119679 - LEE; Jae Woo ;   et al. | 2022-04-21 |
Chemical Mechanical Polishing Slurry Composition For Polishing Multiple Films And Polishing Method Using The Same App 20210009859 - KIM; Ji Hye ;   et al. | 2021-01-14 |
Method for preparing slurry composition and slurry composition prepared thereby Grant 10,428,240 - Kwon , et al. October 1, 2 | 2019-10-01 |
Method of fabricating integrated circuit device by using slurry composition Grant 9,991,127 - Park , et al. June 5, 2 | 2018-06-05 |
Method Of Fabricating Integrated Circuit Device By Using Slurry Composition App 20170207100 - Park; Sang-hyun ;   et al. | 2017-07-20 |
Method For Preparing Slurry Composition And Slurry Composition Prepared Thereby App 20170051180 - KWON; Jang Kuk ;   et al. | 2017-02-23 |
Slurry Compositions And Methods Of Fabricating Semiconductor Devices Using The Same App 20160141182 - Kim; Sangkyun ;   et al. | 2016-05-19 |
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