Choi; Baik-soon

Patent Applications and Registrations

Patent applications and USPTO patent grants for Choi; Baik-soon.The latest application filed is for "composition for removing silicone resins and method of thinning substrate by using the same".

Company Profile

1.12.16

Choi; Baik-soon - Anyang-si KR
Choi; Baik-Soon - Gyeonggi-do KR
Choi; Baik-soon - Kyungki-do KR
Choi; Baik-soon - Seoul KR
Choi, Baik-Soon - Anyang-city KR
Choi, Baik-Soon - Kyunggi-do KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition for removing silicone resins and method of thinning substrate by using the same Grant 10,894,935 - Kang , et al. January 19, 2	2021-01-19
Composition For Removing Silicone Resins And Method Of Thinning Substrate By Using The Same App 20180265819 - KANG; In-goo ; et al.	2018-09-20
Tin plating solution, tin plating equipment, and method for fabricating semiconductor device using the tin plating solution Grant 9,840,785 - Park , et al. December 12, 2	2017-12-12
Composition For Removing Silicone Resins And Method Of Thinning Substrate By Using The Same App 20170158888 - KANG; In-goo ; et al.	2017-06-08
Tin Plating Solution, Tin Plating Equipment, And Method For Fabricating Semiconductor Device Using The Tin Plating Solution App 20150308007 - Park; Myung-Beom ; et al.	2015-10-29
Methods of forming a photosensitive film Grant 8,227,182 - Lee , et al. July 24, 2	2012-07-24
Thinner composition and method of removing photoresist using the same Grant 7,863,231 - Ahn , et al. January 4, 2	2011-01-04
Methods of Forming a Photosensitive Film App 20100034962 - LEE; Ahn-Ho ; et al.	2010-02-11
Thinner Composition And Method Of Removing Photoresist Using The Same App 20080214422 - AHN; Seung-Hyun ; et al.	2008-09-04
Thinner composition and method of removing photoresist using the same Grant 7,387,988 - Ahn , et al. June 17, 2	2008-06-17
Composition for removing a film, method of removing a film using the same, and method of forming a pattern using the same App 20080026585 - Kim; Eun-Jeong ; et al.	2008-01-31
Method of manufacturing a semiconductor device using a cleaning composition App 20060014391 - Lee; Kyung-Jin ; et al.	2006-01-19
Thinner composition and method of removing photoresist using the same App 20050176607 - Ahn, Seung-Hyun ; et al.	2005-08-11
Method of reworking a conditioning disk Grant 6,740,169 - Cho , et al. May 25, 2	2004-05-25
Thinner composition and method of stripping a photoresist using the same Grant 6,682,876 - Ahn , et al. January 27, 2	2004-01-27
Chemical vapor deposition method for manufacturing semiconductor devices Grant 6,664,119 - Choi , et al. December 16, 2	2003-12-16
Method of cleaning conditioning disk App 20030205239 - Cho, Sung-Burn ; et al.	2003-11-06
Thinner composition and method of stripping a photoresist using the same App 20030157441 - Ahn, Seung-Hyun ; et al.	2003-08-21
Photoresist Stripper Compositions App 20030113673 - Ahn, Seung-Hyun ; et al.	2003-06-19
Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk App 20020127962 - Cho, Sung-Bum ; et al.	2002-09-12
Metallization process for manufacturing semiconductor devices and system used in same App 20020061650 - Choi, Baik-Soon ; et al.	2002-05-23
Inductive-coupled plasma apparatus employing shield and method for manufacturing the shield App 20010022157 - Shin, Eun-Hee ; et al.	2001-09-20
Chemical vapor deposition apparatus for manufacturing semiconductor devices, its driving method and method of optimizing recipe of cleaning process for process chamber App 20010019896 - Choi, Baik-Soon ; et al.	2001-09-06
Chemical vapor deposition apparatus for manufacturing semiconductor devices Grant 6,279,503 - Choi , et al. August 28, 2	2001-08-28
Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk App 20010009844 - Cho, Sung-bum ; et al.	2001-07-26
Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk Grant 6,213,856 - Cho , et al. April 10, 2	2001-04-10
Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning method Grant 6,146,492 - Cho , et al. November 14, 2	2000-11-14
Apparatus and method for particle sampling during semiconductor device manufacturing Grant 6,119,532 - Park , et al. September 19, 2	2000-09-19

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