Cho; Toshitsura

Patent Applications and Registrations

Patent applications and USPTO patent grants for Cho; Toshitsura.The latest application filed is for "method for purifying alkaline treatment fluid for semiconductor substrate and a purification apparatus".

Company Profile

0.9.7

Cho; Toshitsura - Kawasaki City JP
Cho; Toshitsura - Kawasaki JP
Cho; Toshitsura - Kanagawa JP
Cho; Toshitsura - Kawasaki-Shi JP
Cho; Toshitsura - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method For Purifying Alkaline Treatment Fluid For Semiconductor Substrate And A Purification Apparatus App 20130174868 - Muraoka; Hisashi ; et al.	2013-07-11
Electrode for electrolysis and method for producing aqueous solution of quaternary ammonium hydroxide using the same Grant 8,206,573 - Ohta , et al. June 26, 2	2012-06-26
Uniformly Dispersed Photocatalyst Coating Liquid, Method For Producing Same, And Photocatalytically Active Composite Material Obtained By Using Same App 20090317624 - Yoshioka; Ken ; et al.	2009-12-24
Electrode for Electrolysis and Method for Producing Aqueous Solution of Quaternary Ammonium Hydroxide Using the Same App 20080035491 - Ohta; Yoshiro ; et al.	2008-02-14
Abrasive slurry having high dispersion stability and manufacturing method for a substrate App 20070094936 - Cho; Toshitsura ; et al.	2007-05-03
Copper-based Metal Polishing Composition, Method For Manufacturing A Semiconductor Device, Polishing Composition, Aluminum-based Metal Polishing Composition, And Tungsten-based Metal Polishing Composition Grant 6,861,010 - Hirabayashi , et al. March 1, 2	2005-03-01
Abrasive slurry having high dispersion stability and manufacturing method for a substrate App 20040221516 - Cho, Toshitsura ; et al.	2004-11-11
Copper-based metal polishing composition, method for manufacturing a semiconductor device, polishing composition, aluminum-based metal polishing composition, and tungsten-based metal polishing composition App 20020160608 - Hirabayashi, Hideaki ; et al.	2002-10-31
Apparatus and process for supplying abrasives for use in the manufacture of semiconductors Grant 6,315,644 - Cho , et al. November 13, 2	2001-11-13
Process for recovering organoalkoxysilane from polyorganosiloxane Grant 5,783,609 - Cho , et al. July 21, 1	1998-07-21
Method of processing organic quaternary ammonium hydroxide-containing waste liquid Grant 5,545,309 - Shimizu , et al. August 13, 1	1996-08-13
Process for preparing dialkyl carbonates Grant 5,534,649 - Cho , et al. July 9, 1	1996-07-09
Method of processing organic quaternary ammonium hydroxide-containing waste liquid Grant 5,439,564 - Shimizu , et al. August 8, 1	1995-08-08
Method of producing granular synthetic silica Grant 4,806,329 - Cho , et al. February 21, 1	1989-02-21
Method for production of aqueous quaternary ammonium hydroxide solution Grant 4,634,509 - Shimizu , et al. January 6, 1	1987-01-06

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