Cho; Seon-Mee

Patent Applications and Registrations

Patent applications and USPTO patent grants for Cho; Seon-Mee.The latest application filed is for "multilayer passivation or etch stop tft".

Company Profile

1.40.40

Cho; Seon-Mee - Santa Clara CA
Cho; Seon-Mee - San Jose CA
Cho; Seon-Mee - Beaverton OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multilayer passivation or etch stop TFT Grant 9,935,183 - Yim , et al. April 3, 2	2018-04-03
Transmission line RF applicator for plasma chamber Grant 9,818,580 - Kudela , et al. November 14, 2	2017-11-14
Multilayer Passivation Or Etch Stop Tft App 20170162678 - YIM; Dong-Kil ; et al.	2017-06-08
Multilayer passivation or etch stop TFT Grant 9,590,113 - Yim , et al. March 7, 2	2017-03-07
Gas Delivery And Distribution For Uniform Process In Linear-type Large-area Plasma Reactor App 20160208380 - WHITE; John M. ; et al.	2016-07-21
Method to grow in-situ crystalline IGZO using co-sputtering targets Grant 9,337,030 - Cho , et al. May 10, 2	2016-05-10
Methods for depositing a silicon containing layer with argon gas dilution Grant 9,287,137 - Wang , et al. March 15, 2	2016-03-15
Pin hole evaluation method of dielectric films for metal oxide semiconductor TFT Grant 9,245,809 - Yim , et al. January 26, 2	2016-01-26
Multilayer Passivation Or Etch Stop Tft App 20160013320 - YIM; Dong-kil ; et al.	2016-01-14
Methods for forming crystalline IGZO through annealing Grant 9,202,690 - Lee , et al. December 1, 2	2015-12-01
Transmission Line RF Applicator for Plasma Chamber App 20150340204 - Kudela; Jozef ; et al.	2015-11-26
Novel Method to Grow In-Situ Crystalline IGZO App 20150279670 - Cho; Seon-Mee ; et al.	2015-10-01
CAAC IGZO Deposited at Room Temperature App 20150279674 - Cho; Seon-Mee ; et al.	2015-10-01
IGZO with Intra-Layer Variations and Methods for Forming the Same App 20150187574 - Le; Minh Huu ; et al.	2015-07-02
Methods for Forming Crystalline IGZO Through Processing Condition Optimization App 20150179446 - Lee; Sang ; et al.	2015-06-25
Methods for Forming Crystalline IGZO Through Power Supply Mode Optimization App 20150179444 - Lee; Sang ; et al.	2015-06-25
Methods for Forming Crystalline IGZO Through Annealing App 20150179448 - Lee; Sang ; et al.	2015-06-25
Transmission line RF applicator for plasma chamber Grant 9,048,518 - Kudela , et al. June 2, 2	2015-06-02
SiO.sub.x process chemistry development using microwave plasma CVD Grant 8,906,813 - Won , et al. December 9, 2	2014-12-09
Thin film deposition using microwave plasma Grant 8,883,269 - Won , et al. November 11, 2	2014-11-11
Pin Hole Evaluation Method Of Dielectric Films For Metal Oxide Semiconductor Tft App 20140273312 - YIM; Dong-Kil ; et al.	2014-09-18
Method to improve mechanical strength of low-K dielectric film using modulated UV exposure Grant 8,715,788 - Bandyopadhyay , et al. May 6, 2	2014-05-06
Method for conformal plasma immersed ion implantation assisted by atomic layer deposition Grant 8,709,924 - Hanawa , et al. April 29, 2	2014-04-29
Siox Process Chemistry Development Using Microwave Plasma Cvd App 20130302999 - WON; Tae Kyung ; et al.	2013-11-14
Transmission line RF applicator for plasma chamber App 20130221833 - Kudela; Jozef ; et al.	2013-08-29
Methods For Depositing A Silicon Containing Layer With Argon Gas Dilution App 20130087783 - Wang; Qunhua ; et al.	2013-04-11
Gas Delivery And Distribution For Uniform Process In Linear-type Large-area Plasma Reactor App 20130068161 - White; John M. ; et al.	2013-03-21
Transmission Line RF Applicator for Plasma Chamber App 20120326592 - Kudela; Jozef ; et al.	2012-12-27
Processing Chamber With Cooled Gas Delivery Line App 20120279943 - Nominanda; Helinda ; et al.	2012-11-08
Thin Film Deposition Using Microwave Plasma App 20120171391 - WON; Tae Kyung ; et al.	2012-07-05
Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces Grant 8,168,519 - Li , et al. May 1, 2	2012-05-01
Method to improve mechanical strength of low-K dielectric film using modulated UV exposure Grant 8,043,667 - Bandyopadhyay , et al. October 25, 2	2011-10-25
Plasma Immersion Ion Implantation Method Using A Pure Or Nearly Pure Silicon Seasoning Layer On The Chamber Interior Surfaces App 20110207307 - Li; Shijian ; et al.	2011-08-25
Novel Method For Conformal Plasma Immersed Ion Implantation Assisted By Atomic Layer Deposition App 20110159673 - Hanawa; Hiroji ; et al.	2011-06-30
Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces Grant 7,968,439 - Li , et al. June 28, 2	2011-06-28
Method for porogen removal and mechanical strength enhancement of low-k carbon doped silicon oxide using low thermal budget microwave curing Grant 7,892,985 - Cho , et al. February 22, 2	2011-02-22
In-situ dose monitoring using optical emission spectroscopy Grant 7,871,828 - Cho , et al. January 18, 2	2011-01-18
Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor Grant 7,691,755 - Li , et al. April 6, 2	2010-04-06
UV treatment of STI films for increasing tensile stress Grant 7,622,162 - van Schravendijk , et al. November 24, 2	2009-11-24
Method to improve mechanical strength of low-K dielectric film using modulated UV exposure Grant 7,611,757 - Bandyopadhyay , et al. November 3, 2	2009-11-03
Hydroxyl bond removal and film densification method for oxide films using microwave post treatment Grant 7,589,028 - Cho , et al. September 15, 2	2009-09-15
Novel Method For Conformal Plasma Immersed Ion Implantation Assisted By Atomic Layer Deposition App 20090203197 - HANAWA; HIROJI ; et al.	2009-08-13
Dosimetry Using Optical Emission Spectroscopy/residual Gas Analyzer In Conjunction With Ion Current App 20090195777 - Ramaswamy; Kartik ; et al.	2009-08-06
Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces App 20090197401 - Li; Shijian ; et al.	2009-08-06
Dosimetry using optical emission spectroscopy/residual gas analyzer in conjunction with ion current Grant 7,531,469 - Ramaswamy , et al. May 12, 2	2009-05-12
Metal-free catalysts for pulsed deposition layer process for conformal silica laminates Grant 7,491,653 - Papasouliotis , et al. February 17, 2	2009-02-17
Plasma Immersion Ion Implantation With Highly Uniform Chamber Seasoning Process For A Toroidal Source Reactor App 20080286982 - Li; Shijian ; et al.	2008-11-20
In-situ Dose Monitoring Using Optical Emission Spectroscopy App 20080188013 - Cho; Seon-Mee ; et al.	2008-08-07
Wet Photoresist Stripping Process And Apparatus App 20080149135 - Cho; Seon-Mee ; et al.	2008-06-26
Dry photoresist stripping process and apparatus App 20080153306 - Cho; Seon-Mee ; et al.	2008-06-26
Dosimetry Using Optical Emission Spectroscopy/residual Gas Analyzer In Conjuntion With Ion Current App 20080075834 - Ramaswamy; Kartik ; et al.	2008-03-27
Method and apparatus for UV exposure of low dielectric constant materials for porogen removal and improved mechanical properties Grant 7,265,061 - Cho , et al. September 4, 2	2007-09-04
Method to improve mechanical strength of low-k dielectric film using modulated UV exposure Grant 7,253,125 - Bandyopadhyay , et al. August 7, 2	2007-08-07
Localized energy pulse rapid thermal anneal dielectric film densification method Grant 7,163,899 - Cho , et al. January 16, 2	2007-01-16
CVD plasma assisted lower dielectric constant SICOH film Grant 7,153,787 - Cho , et al. December 26, 2	2006-12-26
Apparatus for reducing plasma charge damage for plasma processes Grant 7,036,453 - Ishikawa , et al. May 2, 2	2006-05-02
CVD plasma assisted lower dielectric constant SICOH film Grant 6,943,127 - Cho , et al. September 13, 2	2005-09-13
Silicon carbide deposited by high density plasma chemical-vapor deposition with bias Grant 6,926,926 - Cho , et al. August 9, 2	2005-08-09
CVD plasma assisted lower dielectric constant sicoh film App 20050153572 - Cho, Seon-Mee ; et al.	2005-07-14
Method for depositing a low-k material having a controlled thickness range App 20040161536 - Lang, Chi-I ; et al.	2004-08-19
Barrier layer deposition using HDP-CVD Grant 6,713,390 - M'Saad , et al. March 30, 2	2004-03-30
Apparatus for reducing plasma charge damage for plasma processes App 20040048492 - Ishikawa, Tetsuya ; et al.	2004-03-11
Method of reducing plasma charge damage for plasma processes Grant 6,660,662 - Ishikawa , et al. December 9, 2	2003-12-09
CVD plasma assisted lower dielectric constant sicoh film App 20030104708 - Cho, Seon-Mee ; et al.	2003-06-05
Silicon carbide deposited by high density plasma chemical-vapor deposition with bias App 20030049388 - Cho, Seon-Mee ; et al.	2003-03-13
Barrier layer deposition using HDP-CVD App 20030032282 - M'Saad, Hichem ; et al.	2003-02-13
Method of reducing plasma charge damage for plasma processes App 20030024901 - Ishikawa, Tetsuya ; et al.	2003-02-06
Cvd Plasma Assisted Lower Dielectric Constant Sicoh Film App 20030003768 - Cho, Seon-Mee ; et al.	2003-01-02
CVD plasma assisted lower dielectric constant sicoh film Grant 6,486,082 - Cho , et al. November 26, 2	2002-11-26
Barrier layer deposition using HDP-CVD Grant 6,399,489 - M'Saad , et al. June 4, 2	2002-06-04

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