Cho; Hung-Wen

Patent Applications and Registrations

Patent applications and USPTO patent grants for Cho; Hung-Wen.The latest application filed is for "layout modification method for exposure manufacturing process".

Company Profile

14.8.9

Cho; Hung-Wen - Hsinchu TW
CHO; Hung-Wen - Hsinchu City TW
Cho; Hung-Wen - Hsin-Chu TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and apparatus for collecting information used in image-error compensation Grant 11,150,561 - Cho , et al. October 19, 2	2021-10-19
Layout Modification Method For Exposure Manufacturing Process App 20210296303 - CHO; Hung-Wen ; et al.	2021-09-23
Layout modification method for exposure manufacturing process Grant 11,024,623 - Cho , et al. June 1, 2	2021-06-01
Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning Grant 10,871,713 - Cho , et al. December 22, 2	2020-12-22
Layout Modification Method For Exposure Manufacturing Process App 20200350306 - CHO; Hung-Wen ; et al.	2020-11-05
Method And Apparatus For Collecting Information Used In Image-error Compensation App 20200348586 - CHO; Hung-Wen ; et al.	2020-11-05
Method Of Controlling Reticle Masking Blade Positioning To Minimize Impact On Critical Dimension Uniformity And Device For Contr App 20200264515 - CHO; Hung-Wen ; et al.	2020-08-20
Layout modification method for exposure manufacturing process Grant 10,720,419 - Cho , et al.	2020-07-21
Method and apparatus for collecting information used in image-error compensation Grant 10,712,651 - Cho , et al.	2020-07-14
Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning Grant 10,642,158 - Cho , et al.	2020-05-05
Layout Modification Method For Exposure Manufacturing Process App 20190348409 - CHO; Hung-Wen ; et al.	2019-11-14
Layout modification method for exposure manufacturing process Grant 10,366,973 - Cho , et al. July 30, 2	2019-07-30
Method Of Controlling Reticle Masking Blade Positioning To Minimize Impact On Critical Dimension Uniformity And Device For Contr App 20190163046 - CHO; Hung-Wen ; et al.	2019-05-30
Method And Apparatus For Collecting Information Used In Image-error Compensation App 20190137866 - CHO; Hung-Wen ; et al.	2019-05-09
Layout Modification Method For Exposure Manufacturing Process App 20190131290 - CHO; Hung-Wen ; et al.	2019-05-02
Assistant pattern for measuring critical dimension of main pattern in semiconductor manufacturing Grant 10,276,375 - Cho , et al.	2019-04-30
Assistant Pattern for Measuring Critical Dimension of Main Pattern In Semiconductor Manufacturing App 20180144936 - Cho; Hung-Wen ; et al.	2018-05-24

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