CHO; Byoung Ha

Patent Applications and Registrations

Patent applications and USPTO patent grants for CHO; Byoung Ha.The latest application filed is for "gas sprayer for substrate treatment device, and substrate".

Company Profile

3.3.14

CHO; Byoung Ha - Gwangju-si Gyeonggi-do
CHO; Byoung Ha - Daejeon KR
CHO; BYOUNG-HA - Seongnam-si KR
Cho; Byoung-Ha - Gyeonggi-dol KR
Cho; Byoung Ha - Daejeon-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Gas Sprayer For Substrate Treatment Device, And Substrate App 20190333743 - YOON; Ho Bin ; et al.	2019-10-31
Apparatus For Treating Substrate And Method For Treating Substrate App 20190161861 - KWAK; Jae Chan ; et al.	2019-05-30
Apparatus for treating substrate and method for treating substrate Grant 10,233,542 - Kwak , et al.	2019-03-19
Substrate Processing Apparatus App 20190035607 - KIM; Se Young ; et al.	2019-01-31
Capacitor Deposition Apparatus And Deposition Method Of Dielectric Film Using Same App 20180226468 - SEO; Dong Won ; et al.	2018-08-09
Apparatus And Method For Processing Substrate App 20180130674 - HAN; Tae Seong ; et al.	2018-05-10
Substrate Processing Apparatus App 20160153086 - KWAK; Jae Chan ; et al.	2016-06-02
Apparatus For Treating Substrate And Method For Treating Substrate App 20150337441 - KWAK; Jae Chan ; et al.	2015-11-26
Cleaning Method Of Process Chamber App 20140166049 - KANG; SUNG-CHUL ; et al.	2014-06-19
Thin Film Deposition System and Method for Depositing Thin Film App 20110143035 - CHO; Byoung Ha ; et al.	2011-06-16
Cleaning Method Of Process Chamber App 20110114130 - KANG; SUNG-CHUL ; et al.	2011-05-19
Method for manufacturing semiconductor device Grant 7,435,445 - Shin , et al. October 14, 2	2008-10-14
Method for manufacturing semiconductor device App 20060177579 - Shin; Cheol Ho ; et al.	2006-08-10
Method for atomic layer deposition (ALD) of silicon oxide film Grant 7,077,904 - Cho , et al. July 18, 2	2006-07-18
Method for atomic layer deposition (ALD) of silicon oxide film App 20060090694 - Cho; Byoung Ha ; et al.	2006-05-04
ALD apparatus and ALD method for manufacturing semiconductor device App 20040082171 - Shin, Cheol Ho ; et al.	2004-04-29
Method for atomic layer deposition (ALD) of silicon oxide film App 20030203113 - Cho, Byoung Ha ; et al.	2003-10-30

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