Chin; Chih-Cheng
Patent Applications and Registrations
Patent applications and USPTO patent grants for Chin; Chih-Cheng.The latest application filed is for "holographic reticle and patterning method".
- Chin; Chih-Cheng - Taipei TW
- Chin; Chih-Cheng - Hsin-Chu TW
- Chin; Chih-Cheng - Taipei County TW
- Chin; Chih-Cheng - Junghe TW
- Chin; Chih-Cheng - Junghe City TW
- Chin, Chih-Cheng - Chunghe City TW
- Chin, Chih Cheng - Chung Ho City TW
| Patent | Date |
|---|---|
| Holographic reticle and patterning method Grant 7,722,997 - Chang , et al. May 25, 2 | 2010-05-25 |
| Method and apparatus for compensated illumination for advanced lithography Grant 7,697,114 - Chang , et al. April 13, 2 | 2010-04-13 |
| Method for compensating critical dimension variations in photomasks Grant 7,651,824 - Chen , et al. January 26, 2 | 2010-01-26 |
| System and method for examining mask pattern fidelity Grant 7,383,530 - Wang , et al. June 3, 2 | 2008-06-03 |
| Holographic Reticle and Patterning Method App 20080113279 - Chang; Shih-Ming ; et al. | 2008-05-15 |
| Etching bias reduction Grant 7,316,872 - Chang , et al. January 8, 2 | 2008-01-08 |
| Holographic reticle and patterning method Grant 7,312,021 - Chang , et al. December 25, 2 | 2007-12-25 |
| Method And Apparatus For Compensated Illumination For Advanced Lithography App 20070291244 - CHANG; Shih-Ming ; et al. | 2007-12-20 |
| System and method for examining mask pattern fidelity App 20070250805 - Wang; Wen-Chuan ; et al. | 2007-10-25 |
| Etching bias reduction App 20070087571 - Chang; Shih-Ming ; et al. | 2007-04-19 |
| Defect repair method employing non-defective pattern overlay and photoexposure Grant 7,005,219 - Chin , et al. February 28, 2 | 2006-02-28 |
| Pattern compensation for stitching Grant 6,982,135 - Chang , et al. January 3, 2 | 2006-01-03 |
| Holographic reticle and patterning method App 20050147895 - Chang, Shih-Ming ; et al. | 2005-07-07 |
| Multiple-exposure defect elimination App 20040265704 - Chang, Shih-Ming ; et al. | 2004-12-30 |
| Defect repair method employing non-defective pattern overlay and photoexposure App 20040224238 - Chin, Chih-Cheng ; et al. | 2004-11-11 |
| System and method for examining mask pattern fidelity App 20040225488 - Wang, Wen-Chuan ; et al. | 2004-11-11 |
| Pattern compensation for stitching App 20040191643 - Chang, Chung-Hsing ; et al. | 2004-09-30 |
| Dual-focused ion beams for semiconductor image scanning and mask repair Grant 6,653,029 - Lin , et al. November 25, 2 | 2003-11-25 |
| Dual-focused ion beams for semiconductor image scanning and mask repair App 20030031961 - Lin, Chuan-Yuan ; et al. | 2003-02-13 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 