Chiang; Rey-Hsing
Patent Applications and Registrations
Patent applications and USPTO patent grants for Chiang; Rey-Hsing.The latest application filed is for "cleaning method for improving wafer surface polluted by metal ions".
- Chiang; Rey-Hsing - Shanghai CN
| Patent | Date |
|---|---|
| Cleaning method for improving wafer surface polluted by metal ions App 20080115802 - Chiang; Rey-Hsing ; et al. | 2008-05-22 |
| Method for reducing particle contamination in a low pressure CVD apparatus App 20070031596 - Yang; Ch ; et al. | 2007-02-08 |
| Gasifier structure App 20050161867 - Chiang, Rey-Hsing ; et al. | 2005-07-28 |
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