Chen; Yulu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chen; Yulu.The latest application filed is for "photolithography system and method incorporating a photomask-pellicle apparatus with an angled pellicle".

Company Profile

7.7.6

Chen; Yulu - West Sand Lake NY
Chen; Yulu - Troy NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Extreme ultraviolet (EUV) lithography mask Grant 10,802,393 - Sun , et al. October 13, 2	2020-10-13
System and method for analyzing printed masks for lithography based on representative contours Grant 10,564,554 - Cao , et al. Feb	2020-02-18
Extreme ultraviolet mirrors and masks with improved reflectivity Grant 10,468,149 - Chen , et al. No	2019-11-05
Photolithography System And Method Incorporating A Photomask-pellicle Apparatus With An Angled Pellicle App 20190258157 - Chen; Yulu ; et al.	2019-08-22
System And Method For Analyzing Printed Masks For Lithography Based On Representative Contours App 20190219933 - Cao; Liang ; et al.	2019-07-18
Dummy assist features for pattern support Grant 10,332,745 - Sun , et al.	2019-06-25
Extreme Ultraviolet (euv) Lithography Mask App 20190113836 - SUN; Lei ; et al.	2019-04-18
Euv Patterning Using Photomask Substrate Topography App 20190056651 - Verduijn; Erik ; et al.	2019-02-21
Dummy Assist Features For Pattern Support App 20180337045 - Sun; Lei ; et al.	2018-11-22
Extreme Ultraviolet Mirrors And Masks With Improved Reflectivity App 20180226166 - Chen; Yulu ; et al.	2018-08-09
Sidewall spacer pattern formation method Grant 9,911,604 - Sun , et al. March 6, 2	2018-03-06
Method for producing self-aligned vias Grant 9,484,258 - Kim , et al. November 1, 2	2016-11-01
SAV using selective SAQP/SADP Grant 9,478,462 - Wang , et al. October 25, 2	2016-10-25

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