| Patent | Date |
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Silicon implantation in substrates and provision of silicon precursor compositions therefor
Grant 11,062,906 - Tang , et al. July 13, 2 | 2021-07-13 |
Etching solution for tungsten and GST films
Grant 11,035,044 - Liu , et al. June 15, 2 | 2021-06-15 |
TiN hard mask and etch residue removal
Grant 10,711,227 - Liu , et al. | 2020-07-14 |
Etching compositions and methods for using same
Grant 10,400,167 - Liu , et al. Sep | 2019-09-03 |
Selectively removing titanium nitride hard mask and etch residue removal
Grant 10,332,784 - Casteel, Jr. , et al. | 2019-06-25 |
Stripping compositions having high WN/W etching selectivity
Grant 10,301,580 - Liu , et al. | 2019-05-28 |
Photoresist cleaning composition used in photolithography and a method for treating substrate therewith
Grant 10,072,237 - Chang , et al. September 11, 2 | 2018-09-11 |
TiN Hard Mask and Etch Residue Removal
App 20180251711 - Liu; Wen Dar ; et al. | 2018-09-06 |
Etching Solution For Tungsten And GST Films
App 20180209049 - Liu; Wen Dar ; et al. | 2018-07-26 |
Composition for treating surface of substrate, method and device
Grant 9,976,037 - Inaoka , et al. May 22, 2 | 2018-05-22 |
TiN hard mask and etch residual removal
Grant 9,976,111 - Liu , et al. May 22, 2 | 2018-05-22 |
Composition and process for selectively etching metal nitrides
Grant 9,831,088 - Chen , et al. November 28, 2 | 2017-11-28 |
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
Grant 9,783,558 - Wang , et al. October 10, 2 | 2017-10-10 |
Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment
Grant 9,731,368 - Chen , et al. August 15, 2 | 2017-08-15 |
Etching Compositions and Methods for Using Same
App 20170145311 - Liu; Wen Dar ; et al. | 2017-05-25 |
Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment
Grant 9,649,712 - Chen , et al. May 16, 2 | 2017-05-16 |
TiN Hard Mask And Etch Residual Removal
App 20170107460 - Liu; Wen Dar ; et al. | 2017-04-20 |
Photoresist Cleaning Composition Used in Photolithography and a Method for Treating Substrate Therewith
App 20170037344 - Chang; Randy Li-Kai ; et al. | 2017-02-09 |
Tellurium compounds useful for deposition of tellurium containing materials
Grant 9,537,095 - Stender , et al. January 3, 2 | 2017-01-03 |
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
Grant 9,534,285 - Xu , et al. January 3, 2 | 2017-01-03 |
Wet Based Formulations For The Selective Removal Of Noble Metals
App 20160362804 - CHEN; Tianniu ; et al. | 2016-12-15 |
Composition for titanium nitride hard mask and etch residue removal
Grant 9,472,420 - Casteel, Jr. , et al. October 18, 2 | 2016-10-18 |
Selectively Removing Titanium Nitride Hard Mask and Etch Residue Removal
App 20160293479 - Casteel, JR.; William Jack ; et al. | 2016-10-06 |
Composition for Treating Surface of Substrate, Method and Device
App 20160289455 - Inaoka; Seiji ; et al. | 2016-10-06 |
Silicon Implantation In Substrates And Provision Of Silicon Precursor Compositions Therefor
App 20160211137 - Tang; Ying ; et al. | 2016-07-21 |
Stripping Compositions Having High WN/W Etching Selectivity
App 20160186105 - Liu; Wen Dar ; et al. | 2016-06-30 |
Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment
Grant 9,221,114 - Chen , et al. December 29, 2 | 2015-12-29 |
Titanium nitride hard mask and etch residue removal
Grant 9,222,018 - Casteel, Jr. , et al. December 29, 2 | 2015-12-29 |
Antimony and germanium complexes useful for CVD/ALD of metal thin films
Grant 9,219,232 - Hunks , et al. December 22, 2 | 2015-12-22 |
Apparatus And Method For Stripping Solder Metals During The Recycling Of Waste Electrical And Electronic Equipment
App 20150322545 - CHEN; Tianniu ; et al. | 2015-11-12 |
Apparatus And Method For Stripping Solder Metals During The Recycling Of Waste Electrical And Electronic Equipment
App 20150321279 - CHEN; Tianniu ; et al. | 2015-11-12 |
Apparatus And Method For Stripping Solder Metals During The Recycling Of Waste Electrical And Electronic Equipment
App 20150322540 - CHEN; Tianniu ; et al. | 2015-11-12 |
Composition And Method For Low Temperature Chemical Vapor Deposition Of Silicon-containing Films Including Silicon Carbonitride And Silicon Oxycarbonitride Films
App 20150315215 - Wang; Ziyun ; et al. | 2015-11-05 |
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
Grant 9,102,693 - Wang , et al. August 11, 2 | 2015-08-11 |
Lithographic tool in situ clean formulations
Grant 9,074,169 - Chen , et al. July 7, 2 | 2015-07-07 |
Composition for Titanium Nitride Hard Mask and Etch Residue Removal
App 20150175943 - Casteel, JR.; William Jack ; et al. | 2015-06-25 |
Formulations For Wet Etching Nipt During Silicide Fabrication
App 20150162213 - Chen; Tianniu ; et al. | 2015-06-11 |
Antimony compounds useful for deposition of antimony-containing materials
Grant 9,034,688 - Chen , et al. May 19, 2 | 2015-05-19 |
Removal Of Lead From Solid Materials
App 20150050199 - Korzenski; Michael B. ; et al. | 2015-02-19 |
Composition And Method For Low Temperature Chemical Vapor Deposition Of Silicon-containing Films Including Silicon Carbonitride And Silicon Oxycarbonitride Films
App 20140329011 - Wang; Ziyun ; et al. | 2014-11-06 |
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials
App 20140329357 - Stender; Matthias ; et al. | 2014-11-06 |
Low temperature deposition of phase change memory materials
Grant 8,877,549 - Roeder , et al. November 4, 2 | 2014-11-04 |
Precursor Compositions For Atomic Layer Deposition And Chemical Vapor Deposition Of Titanate, Lanthanate, And Tantalate Dielectric Films
App 20140295071 - Xu; Chongying ; et al. | 2014-10-02 |
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
Grant 8,802,882 - Wang , et al. August 12, 2 | 2014-08-12 |
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films
App 20140220733 - Hunks; William ; et al. | 2014-08-07 |
Tellurium compounds useful for deposition of tellurium containing materials
Grant 8,796,068 - Stender , et al. August 5, 2 | 2014-08-05 |
Antimony Compounds Useful For Deposition Of Antimony-containing Materials
App 20140206136 - Chen; Tianniu ; et al. | 2014-07-24 |
Low Temperature Deposition Of Phase Change Memory Materials
App 20140206134 - Roeder; Jeffrey F. ; et al. | 2014-07-24 |
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
Grant 8,784,936 - Xu , et al. July 22, 2 | 2014-07-22 |
Apparatus And Method For Stripping Solder Metals During The Recycling Of Waste Electrical And Electronic Equipment
App 20140191019 - Chen; Tianniu ; et al. | 2014-07-10 |
Antimony and germanium complexes useful for CVD/ALD of metal thin films
Grant 8,709,863 - Hunks , et al. April 29, 2 | 2014-04-29 |
Low temperature deposition of phase change memory materials
Grant 8,679,894 - Roeder , et al. March 25, 2 | 2014-03-25 |
Antimony compounds useful for deposition of antimony-containing materials
Grant 8,674,127 - Chen , et al. March 18, 2 | 2014-03-18 |
Composition And Process For Selectively Etching Metal Nitrides
App 20140038420 - Chen; Tianniu ; et al. | 2014-02-06 |
Methods Of Texturing Surfaces For Controlled Reflection
App 20130295712 - CHEN; Tianniu ; et al. | 2013-11-07 |
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials
App 20130288462 - Stender; Matthias ; et al. | 2013-10-31 |
Method For Preventing The Collapse Of High Aspect Ratio Structures During Drying
App 20130280123 - Chen; Tianniu ; et al. | 2013-10-24 |
Precursor compositions for ALD/CVD of group II ruthenate thin films
Grant 8,524,931 - Xu , et al. September 3, 2 | 2013-09-03 |
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films
App 20130029456 - Hunks; William ; et al. | 2013-01-31 |
Low Temperature Deposition Of Phase Change Memory Materials
App 20130005078 - Roeder; Jeffrey F. ; et al. | 2013-01-03 |
Low temperature deposition of phase change memory materials
Grant 8,288,198 - Roeder , et al. October 16, 2 | 2012-10-16 |
Antimony and germanium complexes useful for CVD/ALD of metal thin films
Grant 8,268,665 - Hunks , et al. September 18, 2 | 2012-09-18 |
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
Grant 8,206,784 - Xu , et al. June 26, 2 | 2012-06-26 |
Precursor Compositions For Atomic Layer Deposition And Chemical Vapor Deposition Of Titanate, Lanthanate, And Tantalate Dielectric Films
App 20120141675 - Xu; Chongying ; et al. | 2012-06-07 |
DOPED ZrO2 CAPACITOR MATERIALS AND STRUCTURES
App 20120127629 - Roeder; Jeffrey F. ; et al. | 2012-05-24 |
Amorphous Ge/te Deposition Process
App 20120108038 - Chen; Philip S.H. ; et al. | 2012-05-03 |
Precursors for CVD/ALD of metal-containing films
Grant 8,168,811 - Cameron , et al. May 1, 2 | 2012-05-01 |
Lithographic Tool In Situ Clean Formulations
App 20120015857 - Chen; Tianniu ; et al. | 2012-01-19 |
Amorphous Ge/Te deposition process
Grant 8,093,140 - Chen , et al. January 10, 2 | 2012-01-10 |
Super-dry reagent compositions for formation of ultra low k films
Grant 8,053,375 - Xu , et al. November 8, 2 | 2011-11-08 |
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films
App 20110263100 - Hunks; William ; et al. | 2011-10-27 |
Antimony and germanium complexes useful for CVD/ALD of metal thin films
Grant 8,008,117 - Hunks , et al. August 30, 2 | 2011-08-30 |
Copper precursors for CVD/ALD/digital CVD of copper metal films
Grant 7,964,746 - Chen , et al. June 21, 2 | 2011-06-21 |
Antimony Compounds Useful For Deposition Of Antimony-containing Materials
App 20110111556 - Chen; Tianniu ; et al. | 2011-05-12 |
Metal Aminotroponiminates, Bis-oxazolinates And Guanidinates
App 20110060165 - Cameron; Thomas M. ; et al. | 2011-03-10 |
Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta.sub.20.sub.5 thin films
Grant 7,858,816 - Chen , et al. December 28, 2 | 2010-12-28 |
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films
App 20100317150 - Hunks; William ; et al. | 2010-12-16 |
Composition And Method For Low Temperature Chemical Vapor Deposition Of Silicon-containing Films Including Silicon Carbonitride And Silicon Oxycarbonitride Films
App 20100314590 - WANG; Ziyun ; et al. | 2010-12-16 |
Antimony and germanium complexes useful for CVD/ALD of metal thin films
Grant 7,838,329 - Hunks , et al. November 23, 2 | 2010-11-23 |
Tantalum amide complexes for depositing tantalum-containing films, and method of making same
Grant 7,838,073 - Chen , et al. November 23, 2 | 2010-11-23 |
Novel Bismuth Precursors For Cvd/ald Of Thin Films
App 20100279011 - Chen; Tianniu ; et al. | 2010-11-04 |
TANTALUM AMIDO-COMPLEXES WITH CHELATE LIGANDS USEFUL FOR CVD AND ALD OF TaN AND Ta205 THIN FILMS
App 20100240918 - Chen; Tianniu ; et al. | 2010-09-23 |
Tantalum Amide Complexes For Depositing Tantalum-containing Films, And Method Of Making Same
App 20100215842 - CHEN; Tianniu ; et al. | 2010-08-26 |
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
Grant 7,781,605 - Wang , et al. August 24, 2 | 2010-08-24 |
Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films
Grant 7,750,173 - Chen , et al. July 6, 2 | 2010-07-06 |
Zirconium, Hafnium, Titanium, And Silicon Precursors For Ald/cvd
App 20100112211 - Xu; Chongying ; et al. | 2010-05-06 |
Tantalum amide complexes for depositing tantalum-containing films, and method of making same
Grant 7,709,384 - Chen , et al. May 4, 2 | 2010-05-04 |
Precursor Compositions For Ald/cvd Of Group Ii Ruthenate Thin Films
App 20100095865 - Xu; Chongying ; et al. | 2010-04-22 |
Composition And Method For Low Temperature Chemical Vapor Deposition Of Silicon-containing Films Including Silicon Carbonitride And Silicon Oxycarbonitride Films
App 20100068894 - Wang; Ziyun ; et al. | 2010-03-18 |
Precursor Compositions For Atomic Layer Deposition And Chemical Vapor Deposition Of Titanate, Lanthanate, And Tantalate Dielectric Films
App 20100062150 - Xu; Chongying ; et al. | 2010-03-11 |
Precursors For Cvd/ald Of Metal-containing Films
App 20100018439 - Cameron; Thomas M. ; et al. | 2010-01-28 |
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
Grant 7,638,074 - Xu , et al. December 29, 2 | 2009-12-29 |
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films
App 20090305458 - Hunks; William ; et al. | 2009-12-10 |
Bicyclic Guanidinates And Bridging Diamides As Cvd/ald Precursors
App 20090275164 - Chen; Tianniu ; et al. | 2009-11-05 |
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
Grant 7,601,860 - Wang , et al. October 13, 2 | 2009-10-13 |
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials
App 20090215225 - Stender; Matthias ; et al. | 2009-08-27 |
Cobalt Precursors Useful For Forming Cobalt-containing Films On Substrates
App 20090208637 - Chen; Tianniu ; et al. | 2009-08-20 |
Copper (i) Amidinates And Guanidinates, Mixed Ligand Copper Complexes, And Compositions For Chemical Vapor Deposition, Atomic Layer Deposition, And Rapid Vapor Deposition Of Copper
App 20090162550 - Chen; Tianniu ; et al. | 2009-06-25 |
Low Temperature Deposition Of Phase Change Memory Materials
App 20090124039 - Roeder; Jeffrey F. ; et al. | 2009-05-14 |
Amorphous Ge/te Deposition Process
App 20090112009 - Chen; Philip S.H. ; et al. | 2009-04-30 |
Metal And Metalloid Silylamides, Ketimates, Tetraalkylguanidinates And Dianionic Guanidinates Useful For Cvd/ald Of Thin Films
App 20090087561 - CHEN; Tianniu ; et al. | 2009-04-02 |
Precursor Compositions For Atomic Layer Deposition And Chemical Vapor Deposition Of Titanate, Lanthanate, And Tantalate Dielectric Films
App 20090074965 - Xu; Chongying ; et al. | 2009-03-19 |
TANTALUM AMIDO-COMPLEXES WITH CHELATE LIGANDS USEFUL FOR CVD AND ALD OF TaN AND Ta205 THIN FILMS
App 20090032952 - Chen; Tianniu ; et al. | 2009-02-05 |
Tantalum Amide Complexes For Depositing Tantalum-containing Films, And Method Of Making Same
App 20090004858 - Chen; Tianniu ; et al. | 2009-01-01 |
Copper Precursors For Cvd/ald/digital Cvd Of Copper Metal Films
App 20080242880 - Chen; Tianniu ; et al. | 2008-10-02 |
Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films
Grant 7,423,166 - Chen , et al. September 9, 2 | 2008-09-09 |
Tantalum amide complexes for depositing tantalum-containing films, and method of making same
Grant 7,371,878 - Chen , et al. May 13, 2 | 2008-05-13 |
Tantalum Amide Complexes For Depositing Tantalum-containing Films, And Method Of Making Same
App 20070117385 - CHEN; TIANNIU ; et al. | 2007-05-24 |
Tantalum amide complexes for depositing tantalum-containing films, and method of making same
Grant 7,198,815 - Chen , et al. April 3, 2 | 2007-04-03 |
Precursor compositions for forming tantalum-containing films, and tantalum-containing barrier films and copper-metallized semiconductor device structures
App 20060102895 - Hendrix; Bryan C. ; et al. | 2006-05-18 |
Tantalum amide complexes for depositing tantalum-containing films, and method of making same
App 20060013943 - Chen; Tianniu ; et al. | 2006-01-19 |
Tantalum amide complexes for depositing tantalum-containing films, and method of making same
Grant 6,960,675 - Chen , et al. November 1, 2 | 2005-11-01 |
Tantalum amide complexes for depositing tantalum-containing films, and method of making same
App 20050079290 - Chen, Tianniu ; et al. | 2005-04-14 |
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
App 20050080286 - Wang, Ziyun ; et al. | 2005-04-14 |
Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films
App 20040039219 - Chen, Tianniu ; et al. | 2004-02-26 |
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