Chen; Philip S. H.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chen; Philip S. H..The latest application filed is for "chemical vapor deposition processes using ruthenium precursor and reducing gas".

Company Profile

8.24.42

Chen; Philip S. H. - Bethel CT
Chen; Philip S. H. - Billerica MA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Chemical Vapor Deposition Processes Using Ruthenium Precursor And Reducing Gas App 20220267895 - Chen; Philip S. H. ; et al.	2022-08-25
High Throughput Deposition Process App 20220238330 - CHEN; Philip S.H. ; et al.	2022-07-28
Chemical vapor deposition processes using ruthenium precursor and reducing gas Grant 11,371,138 - Chen , et al. June 28, 2	2022-06-28
Silicon Precursor Compounds And Method For Forming Silicon-containing Films App 20210395884 - CHO; Sungsil ; et al.	2021-12-23
Vapor Deposition Precursor Compounds And Process Of Use App 20210388008 - CHEN; Philip S.H. ; et al.	2021-12-16
CVD Mo deposition by using MoOCl.sub.4 Grant 11,107,675 - Baum , et al. August 31, 2	2021-08-31
Group Vi Metal Deposition Process App 20210062331 - CHEN; Philip S.H. ; et al.	2021-03-04
Alloys of Co to reduce stress Grant 10,793,947 - Chen , et al. October 6, 2	2020-10-06
Peald Processes Using Ruthenium Precursor App 20200157680 - CHEN; Philip S.H. ; et al.	2020-05-21
Chemical Vapor Deposition Processes Using Ruthenium Precursor And Reducing Gas App 20200149155 - CHEN; Philip S.H. ; et al.	2020-05-14
Method For Forming Molybdenum Films On A Substrate App 20200131628 - BAUM; Thomas H. ; et al.	2020-04-30
Methods For Depositing Tungsten Or Molybdenum Films App 20200115798 - WRIGHT, Jr.; Robert ; et al.	2020-04-16
Vapor Deposition Of Molybdenum Using A Bis(alkyl-arene) Molybdenum Precursor App 20190226086 - Wright, JR.; Robert ; et al.	2019-07-25
ALD processes for low leakage current and low equivalent oxide thickness BiTaO films Grant 10,186,570 - Hendrix , et al. Ja	2019-01-22
CVD Mo DEPOSITION BY USING MoOCl4 App 20180286668 - Baum; Thomas H. ; et al.	2018-10-04
Cobalt CVD Grant 9,997,362 - Baum , et al. June 12, 2	2018-06-12
Cobalt Deposition Selectivity On Copper And Dielectrics App 20180130706 - Chen; Philip S.H. ; et al.	2018-05-10
ALLOYS OF Co TO REDUCE STRESS App 20180044788 - Chen; Philip S.H. ; et al.	2018-02-15
CVD Mo DEPOSITION BY USING MoOCl4 App 20180019165 - Baum; Thomas H. ; et al.	2018-01-18
Cobalt Cvd App 20170032973 - Baum; Thomas H. ; et al.	2017-02-02
Tellurium compounds useful for deposition of tellurium containing materials Grant 9,537,095 - Stender , et al. January 3, 2	2017-01-03
Cobalt Precursors App 20160369402 - Baum; Thomas H. ; et al.	2016-12-22
Antimony and germanium complexes useful for CVD/ALD of metal thin films Grant 9,219,232 - Hunks , et al. December 22, 2	2015-12-22
ALD PROCESSES FOR LOW LEAKAGE CURRENT AND LOW EQUIVALENT OXIDE THICKNESS BiTaO FILMS App 20150364537 - Hendrix; Bryan C. ; et al.	2015-12-17
Antimony compounds useful for deposition of antimony-containing materials Grant 9,034,688 - Chen , et al. May 19, 2	2015-05-19
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials App 20140329357 - Stender; Matthias ; et al.	2014-11-06
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films App 20140220733 - Hunks; William ; et al.	2014-08-07
Tellurium compounds useful for deposition of tellurium containing materials Grant 8,796,068 - Stender , et al. August 5, 2	2014-08-05
Antimony Compounds Useful For Deposition Of Antimony-containing Materials App 20140206136 - Chen; Tianniu ; et al.	2014-07-24
Antimony and germanium complexes useful for CVD/ALD of metal thin films Grant 8,709,863 - Hunks , et al. April 29, 2	2014-04-29
Antimony compounds useful for deposition of antimony-containing materials Grant 8,674,127 - Chen , et al. March 18, 2	2014-03-18
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials App 20130288462 - Stender; Matthias ; et al.	2013-10-31
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films App 20130029456 - Hunks; William ; et al.	2013-01-31
High concentration nitrogen-containing germanium telluride based memory devices and processes of making Grant 8,330,136 - Zheng , et al. December 11, 2	2012-12-11
Antimony and germanium complexes useful for CVD/ALD of metal thin films Grant 8,268,665 - Hunks , et al. September 18, 2	2012-09-18
Amorphous Ge/te Deposition Process App 20120108038 - Chen; Philip S.H. ; et al.	2012-05-03
Apparatus and process for sensing fluoro species in semiconductor processing systems Grant 8,109,130 - Dimeo, Jr. , et al. February 7, 2	2012-02-07
Amorphous Ge/Te deposition process Grant 8,093,140 - Chen , et al. January 10, 2	2012-01-10
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films App 20110263100 - Hunks; William ; et al.	2011-10-27
High Concentration Nitrogen-containing Germanium Telluride Based Memory Devices And Processes Of Making App 20110260132 - Zheng; Jun-Fei ; et al.	2011-10-27
Antimony and germanium complexes useful for CVD/ALD of metal thin films Grant 8,008,117 - Hunks , et al. August 30, 2	2011-08-30
GeSbTe MATERIAL INCLUDING SUPERFLOW LAYER(S), AND USE OF Ge TO PREVENT INTERACTION OF Te FROM SbXTeY AND GeXTeY RESULTING IN HIGH Te CONTENT AND FILM CRYSTALLINITY App 20110180905 - Zheng; Jun-Fei ; et al.	2011-07-28
Antimony Compounds Useful For Deposition Of Antimony-containing Materials App 20110111556 - Chen; Tianniu ; et al.	2011-05-12
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films App 20100317150 - Hunks; William ; et al.	2010-12-16
Antimony and germanium complexes useful for CVD/ALD of metal thin films Grant 7,838,329 - Hunks , et al. November 23, 2	2010-11-23
Apparatus And Process For Sensing Fluoro Species In Semiconductor Processing Systems App 20090305427 - Dimeo, JR.; Frank ; et al.	2009-12-10
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films App 20090305458 - Hunks; William ; et al.	2009-12-10
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials App 20090215225 - Stender; Matthias ; et al.	2009-08-27
Amorphous Ge/te Deposition Process App 20090112009 - Chen; Philip S.H. ; et al.	2009-04-30
Apparatus and process for sensing fluoro species in semiconductor processing systems Grant 7,475,588 - Dimeo, Jr. , et al. January 13, 2	2009-01-13
Systems and Methods for Determination of Endpoint of Chamber Cleaning Processes App 20080251104 - Chen; Ing-Shin ; et al.	2008-10-16
Method And Apparatus For Monitoring Plasma Conditions In An Etching Plasma Processing Facility App 20080134757 - Chen; Ing-Shin ; et al.	2008-06-12
Gas sensor with attenuated drift characteristic Grant 7,370,511 - Chen , et al. May 13, 2	2008-05-13
Apparatus and process for sensing fluoro species in semiconductor processing systems Grant 7,296,460 - Dimeo, Jr. , et al. November 20, 2	2007-11-20
Nickel-coated free-standing silicon carbide structure for sensing fluoro or halogen species in semiconductor processing systems, and processes of making and using same Grant 7,296,458 - Dimeo, Jr. , et al. November 20, 2	2007-11-20
Apparatus and process for sensing target gas species in semiconductor processing systems Grant 7,228,724 - Chen , et al. June 12, 2	2007-06-12
Apparatus and process for sensing fluoro species in semiconductor processing systems Grant 7,080,545 - Dimeo, Jr. , et al. July 25, 2	2006-07-25
Apparatus and process for sensing fluoro species in semiconductor processing systems App 20050230258 - Dimeo, Frank JR. ; et al.	2005-10-20
Apparatus and process for sensing fluoro species in semiconductor processing systems App 20050205424 - Dimeo, Frank JR. ; et al.	2005-09-22
Apparatus and process for sensing fluoro species in semiconductor processing systems App 20050199496 - Dimeo, Frank JR. ; et al.	2005-09-15
Apparatus and process for sensing target gas species in semiconductor processing systems App 20040187557 - Chen, Philip S.H. ; et al.	2004-09-30
Apparatus and process for sensing fluoro species in semiconductor processing systems App 20040163445 - Dimeo, Frank JR. ; et al.	2004-08-26
Nickel-coated free-standing silicon carbide structure for sensing fluoro or halogen species in semiconductor processing systems, and processes of making and using same App 20040163444 - Dimeo, Frank JR. ; et al.	2004-08-26
Apparatus and process for sensing fluoro species in semiconductor processing systems App 20040074285 - Dimeo, Frank JR. ; et al.	2004-04-22

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