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Chen; Li-Mei Patent Filings

Chen; Li-Mei

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chen; Li-Mei.The latest application filed is for "system and method for calibrating an ambient light sensor".

Company Profile
0.9.9
  • Chen; Li-Mei - Shanghai CN
  • CHEN; LI-MEI - Shanghai City CN
  • Chen; Li-Mei - Winter Springs FL
  • Chen; Li-Mei - Hsinchu TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
System and method for calibrating an ambient light sensor
Grant 8,481,917 - Chen , et al. July 9, 2
2013-07-09
System And Method For Calibrating An Ambient Light Sensor
App 20100224771 - CHEN; LI-MEI ;   et al.
2010-09-09
Inhibitors of prostasin
Grant 7,666,981 - Chai , et al. February 23, 2
2010-02-23
Dielectric material compositions with high dielectric constant and low dielectric loss
Grant 7,053,019 - Chen , et al. May 30, 2
2006-05-30
Dielectric material compositions
Grant 6,897,174 - Chen , et al. May 24, 2
2005-05-24
Method of identifying and treating invasive carcinomas
Grant 6,864,093 - Chai , et al. March 8, 2
2005-03-08
Dielectric material compositions
App 20040089854 - Chen, Li-Mei ;   et al.
2004-05-13
Dielectric material compositions with high dielectric constant and low dielectric loss
App 20040089853 - Chen, Li-Mei ;   et al.
2004-05-13
Acidic polishing slurry for the chemical-mechanical polishing of SiO2 isolation layers
App 20040065864 - Vogt, Kristina ;   et al.
2004-04-08
Method of identifying and treating invasive carcinomas
Grant 6,706,483 - Chai , et al. March 16, 2
2004-03-16
Method of identifying and treating invasive carcinomas
Grant 6,689,614 - Chai , et al. February 10, 2
2004-02-10
Synthetic substrates for prostasin
App 20040018580 - Chai, Karl X. ;   et al.
2004-01-29
Polishing slurry for the chemical-mechanical polishing of silica films
App 20020170237 - Vogt, Kristina ;   et al.
2002-11-21
Acidic polishing slurry for the chemical-mechanical polishing of SiO2 isolation layers
App 20020129560 - Vogt, Kristina ;   et al.
2002-09-19
Process for the chemical-mechanical polishing of isolation layers produced using the STI technology, at elevated temperatures
App 20020127954 - Vogt, Kristina ;   et al.
2002-09-12
Sol materials
Grant 6,426,371 - Li , et al. July 30, 2
2002-07-30
Method of identifying and treating invasive carcinomas
App 20020039753 - Chai, Karl X. ;   et al.
2002-04-04

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