loadpatents
Patent applications and USPTO patent grants for Chen; Jin-Yuan.The latest application filed is for "etch chamber with dual frequency biasing sources and a single frequency plasma generating source".
Patent | Date |
---|---|
Etch chamber with dual frequency biasing sources and a single frequency plasma generating source App 20070020937 - Chen; Jin-Yuan ;   et al. | 2007-01-25 |
Etch chamber with dual frequency biasing sources and a single frequency plasma generating source App 20060175015 - Chen; Jin-Yuan ;   et al. | 2006-08-10 |
Etch chamber with dual frequency biasing sources and a single frequency plasma generating source App 20040025791 - Chen, Jin-Yuan ;   et al. | 2004-02-12 |
Fixed matching network with increased match range capabilities App 20040027209 - Chen, Jin-Yuan ;   et al. | 2004-02-12 |
Process chamber having a voltage distribution electrode App 20030006009 - Todorov, Valentin N. ;   et al. | 2003-01-09 |
Method of eliminating notching when anisotropically etching small linewidth openings in silicon on insulator App 20030003748 - Khan, Anisul ;   et al. | 2003-01-02 |
Pulsed RF power delivery for plasma processing Grant 6,472,822 - Chen , et al. October 29, 2 | 2002-10-29 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.