CHEN; JENG-HORNG

Patent Applications and Registrations

Patent applications and USPTO patent grants for CHEN; JENG-HORNG.The latest application filed is for "pellicle assembly and method for advanced lithography".

Company Profile

28.137.131

CHEN; JENG-HORNG - Hsin-Chu TW
Chen; Jeng-Horng - Hsinchu City TW
Chen; Jeng-Horng - Hsinchu TW
CHEN; JENG-HORNG - Hsin-Chu City TW
Chen; Jeng-Horng - Taipei TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Pellicle Assembly and Method for Advanced Lithography App 20220229360 - CHEN; AMO ; et al.	2022-07-21
Lithography system with an embedded cleaning module Grant 11,378,894 - Chien , et al. July 5, 2	2022-07-05
Mask Cleaning App 20220179326 - Chang; Shu-Hao ; et al.	2022-06-09
Pellicle assembly and method for advanced lithography Grant 11,294,274 - Chen , et al. April 5, 2	2022-04-05
Mask cleaning Grant 11,256,179 - Chang , et al. February 22, 2	2022-02-22
Method to mitigate defect printability for ID pattern Grant 11,086,227 - Lu , et al. August 10, 2	2021-08-10
Mask with multilayer structure and manufacturing method by using the same Grant 11,073,755 - Shih , et al. July 27, 2	2021-07-27
High durability extreme ultraviolet photomask Grant 11,003,069 - Yu , et al. May 11, 2	2021-05-11
System and method for performing lithography process in semiconductor device fabrication Grant 10,976,672 - Wu , et al. April 13, 2	2021-04-13
Extreme ultraviolet lithography system, device, and method for printing low pattern density features Grant 10,976,655 - Lu , et al. April 13, 2	2021-04-13
Mask with Multilayer Structure and Manufacturing Method by Using the Same App 20200379335 - Shih; Chih-Tsung ; et al.	2020-12-03
Pellicle for EUV mask and fabrication thereof Grant 10,831,094 - Shih , et al. November 10, 2	2020-11-10
Material composition and methods thereof Grant 10,825,684 - Chang , et al. November 3, 2	2020-11-03
Extreme Ultraviolet Lithography System, Device, and Method for Printing Low Pattern Density Features App 20200319545 - Lu; Yen-Cheng ; et al.	2020-10-08
Method to Mitigate Defect Printability for ID Pattern App 20200310250 - Lu; Yen-Cheng ; et al.	2020-10-01
High Durability Extreme Ultraviolet Photomask App 20200264503 - Yu; Chia-Hao ; et al.	2020-08-20
Mask with multilayer structure and manufacturing method by using the same Grant 10,747,097 - Shih , et al. A	2020-08-18
Extreme ultraviolet lithography system, device, and method for printing low pattern density features Grant 10,691,014 - Lu , et al.	2020-06-23
Semiconductor integrated circuit fabrication with pattern-reversing process Grant 10,685,846 - Chien , et al.	2020-06-16
Method to mitigate defect printability for ID pattern Grant 10,684,552 - Lu , et al.	2020-06-16
Pellicle Assembly and Method for Advanced Lithography App 20200150527 - CHEN; AMO ; et al.	2020-05-14
High durability extreme ultraviolet photomask Grant 10,642,148 - Yu , et al.	2020-05-05
Lithography System With An Embedded Cleaning Module App 20200064747 - Chien; Shang-Chieh ; et al.	2020-02-27
Mask Cleaning App 20200050118 - Chang; Shu-Hao ; et al.	2020-02-13
Pellicle for EUV Mask and Fabrication Thereof App 20200050100 - Shih; Chih-Tsung ; et al.	2020-02-13
Pellicle assembly and method for advanced lithography Grant 10,534,256 - Chen , et al. Ja	2020-01-14
Pellicle for EUV mask and fabrication thereof Grant 10,520,806 - Shih , et al. Dec	2019-12-31
EUV lithography system and method with optimized throughput and stability Grant 10,520,823 - Lu , et al. Dec	2019-12-31
Lithography patterning with a gas phase resist Grant 10,514,610 - Chang , et al. Dec	2019-12-24
Mask cleaning Grant 10,459,352 - Chang , et al. Oc	2019-10-29
Lithography system with an embedded cleaning module Grant 10,459,353 - Chien , et al. Oc	2019-10-29
System And Method For Performing Lithography Process In Semiconductor Device Fabrication App 20190250522 - WU; Jui-Ching ; et al.	2019-08-15
EUV pellicle fabrication methods and structures thereof Grant 10,274,819 - Hsu , et al.	2019-04-30
Method for integrated circuit patterning Grant 10,276,372 - Shih , et al.	2019-04-30
System and method for performing lithography process in semiconductor device fabrication Grant 10,274,838 - Wu , et al.	2019-04-30
Extreme Ultraviolet Lithography System, Device, and Method for Printing Low Pattern Density Features App 20190121228 - Lu; Yen-Cheng ; et al.	2019-04-25
EUV Lithography System and Method with Optimized Throughput and Stability App 20190121241 - Lu; Yen-Cheng ; et al.	2019-04-25
Mask with Multilayer Structure and Manufacturing Method by Using the Same App 20190113835 - Shih; Chih-Tsung ; et al.	2019-04-18
Mask with multilayer structure and manufacturing method by using the same Grant 10,168,611 - Shih , et al. J	2019-01-01
High Durability Extreme Ultraviolet Photomask App 20180373138 - YU; CHIA-HAO ; et al.	2018-12-27
Extreme ultraviolet lithography system, device, and method for printing low pattern density features Grant 10,162,257 - Lu , et al. Dec	2018-12-25
EUV lithography system and method with optimized throughput and stability Grant 10,156,790 - Lu , et al. Dec	2018-12-18
Pellicle For Euv Mask And Fabrication Thereof App 20180341174 - Shih; Chih-Tsung ; et al.	2018-11-29
Lithography Patterning with a Gas Phase Resist App 20180314167 - Chang; Shu-Hao ; et al.	2018-11-01
Method to Mitigate Defect Printability for ID Pattern App 20180253008 - Lu; Yen-Cheng ; et al.	2018-09-06
Particle removal system and method thereof Grant 10,067,418 - Chang , et al. September 4, 2	2018-09-04
High durability extreme ultraviolet photomask Grant 10,061,191 - Yu , et al. August 28, 2	2018-08-28
Pellicle for EUV mask and fabrication thereof Grant 10,031,411 - Shih , et al. July 24, 2	2018-07-24
Lithography patterning with a gas phase resist Grant 10,018,920 - Chang , et al. July 10, 2	2018-07-10
Extreme ultraviolet lithography process and mask Grant 10,007,174 - Shih , et al. June 26, 2	2018-06-26
Extreme Ultraviolet Lithography System, Device, And Method For Printing Low Pattern Density Features App 20180173089 - Lu; Yen-Cheng ; et al.	2018-06-21
Extreme ultraviolet lithography process and mask Grant 9,996,013 - Lu , et al. June 12, 2	2018-06-12
Method to mitigate defect printability for ID pattern Grant 9,964,850 - Lu , et al. May 8, 2	2018-05-08
Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process Grant 9,886,543 - Chung , et al. February 6, 2	2018-02-06
Pellicle Assembly and Method for Advanced Lithography App 20170351170 - CHEN; AMO ; et al.	2017-12-07
High Durability Extreme Ultraviolet Photomask App 20170351169 - YU; CHIA-HAO ; et al.	2017-12-07
Mask With Multilayer Structure And Manufacturing Method By Using The Same App 20170343892 - Shih; Chih-Tsung ; et al.	2017-11-30
Extreme ultraviolet lithography process and mask Grant 9,829,785 - Lu , et al. November 28, 2	2017-11-28
Method for Integrated Circuit Patterning App 20170338103 - Shih; Chih-Tsung ; et al.	2017-11-23
EUV focus monitoring systems and methods Grant 9,823,585 - Shih , et al. November 21, 2	2017-11-21
EUV Lithography System and Method with Optimized Throughput and Stability App 20170277040 - Lu; Yen-Cheng ; et al.	2017-09-28
Material Composition And Methods Thereof App 20170271150 - CHANG; Shu-Hao ; et al.	2017-09-21
Mask with multilayer structure and manufacturing method by using the same Grant 9,766,536 - Shih , et al. September 19, 2	2017-09-19
Pellicle assembly and method for advanced lithography Grant 9,759,997 - Chen , et al. September 12, 2	2017-09-12
Lithography Patterning with a Gas Phase Resist App 20170256418 - CHANG; SHU-HAO ; et al.	2017-09-07
Via definition scheme Grant 9,748,133 - Lu , et al. August 29, 2	2017-08-29
Extreme ultraviolet lithography process and mask Grant 9,733,562 - Lu , et al. August 15, 2	2017-08-15
Method Providing For Asymmetric Pupil Configuration For An Extreme Ultraviolet Lithography Process App 20170228490 - Chung; Chia-Chun ; et al.	2017-08-10
Method of semiconductor integrated circuit fabrication Grant 9,728,408 - Lee , et al. August 8, 2	2017-08-08
Method to define multiple layer patterns with a single exposure by charged particle beam lithography Grant 9,726,983 - Lu , et al. August 8, 2	2017-08-08
EUV mask and manufacturing method by using the same Grant 9,709,884 - Shih , et al. July 18, 2	2017-07-18
Extreme ultraviolet lithography process and mask Grant 9,690,186 - Lu , et al. June 27, 2	2017-06-27
Pellicle Assembly and Method for Advanced Lithography App 20170176850 - Chen; Amo ; et al.	2017-06-22
Photomask for forming multiple layer patterns with a single exposure Grant 9,685,367 - Lu , et al. June 20, 2	2017-06-20
EUV lithography system and method with optimized throughput and stability Grant 9,678,431 - Lu , et al. June 13, 2	2017-06-13
Method of making an extreme ultraviolet pellicle Grant 9,664,999 - Shih , et al. May 30, 2	2017-05-30
Rotary EUV collector Grant 9,665,007 - Chien , et al. May 30, 2	2017-05-30
Method of fabricating a semiconductor integrated circuit using a directed self-assembly block copolymer Grant 9,640,397 - Wu , et al. May 2, 2	2017-05-02
Photomask For Forming Multiple Layer Patterns With A Single Exposure App 20170110366 - LU; Yen-Cheng ; et al.	2017-04-20
Extreme ultraviolet lithography collector contamination reduction Grant 9,625,824 - Lu , et al. April 18, 2	2017-04-18
Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity Grant 9,618,837 - Lu , et al. April 11, 2	2017-04-11
Structure and method for reflective-type mask Grant 9,612,523 - Shih , et al. April 4, 2	2017-04-04
Method of fabricating an integrated circuit with enhanced defect repairability Grant 9,612,531 - Lu , et al. April 4, 2	2017-04-04
System and method for photomask particle detection Grant 9,607,833 - Chien , et al. March 28, 2	2017-03-28
Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof Grant 9,588,419 - Lu , et al. March 7, 2	2017-03-07
Mask Cleaning App 20170060005 - Chang; Shu-Hao ; et al.	2017-03-02
Extreme Ultraviolet Lithography Process And Mask With Reduced Shadow Effect And Enhanced Intensity App 20170052441 - LU; YEN-CHENG ; et al.	2017-02-23
Method and system for reducing pole imbalance by adjusting exposure intensity Grant 9,575,412 - Lu , et al. February 21, 2	2017-02-21
Method To Define Multiple Layer Patterns With A Single Exposure By Charged Particle Beam Lithography App 20170045827 - Lu; Yen-Cheng ; et al.	2017-02-16
Method of patterning a material layer Grant 9,570,302 - Chang , et al. February 14, 2	2017-02-14
Assist feature for a photolithographic process Grant 9,557,649 - Huang , et al. January 31, 2	2017-01-31
Mask With Multilayer Structure And Manufacturing Method By Using The Same App 20170017147 - Shih; Chih-Tsung ; et al.	2017-01-19
Extreme ultraviolet lithography process to print low pattern density features Grant 9,535,334 - Lu , et al. January 3, 2	2017-01-03
Photomask with three states for forming multiple layer patterns with a single exposure Grant 9,535,316 - Lu , et al. January 3, 2	2017-01-03
Extreme ultraviolet lithography process and mask Grant 9,529,272 - Lu , et al. December 27, 2	2016-12-27
EUV mask with ITO absorber to suppress out of band radiation Grant 9,529,250 - Hsieh , et al. December 27, 2	2016-12-27
Extreme ultraviolet lithography process and mask Grant 9,529,249 - Shih , et al. December 27, 2	2016-12-27
Rotary Euv Collector App 20160370705 - Chien; Shang-Chieh ; et al.	2016-12-22
Method Of Making An Extreme Ultraviolet Pellicle App 20160363857 - Shih; Chih-Tsung ; et al.	2016-12-15
Via Definition Scheme App 20160329240 - Lu; Yen-Cheng ; et al.	2016-11-10
Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity Grant 9,488,905 - Lu , et al. November 8, 2	2016-11-08
Extreme Ultraviolet Lithography Collector Contamination Reduction App 20160320708 - LU; YEN-CHENG ; et al.	2016-11-03
Extreme Ultraviolet Lithography Process And Mask App 20160306272 - Lu; Yen-Cheng ; et al.	2016-10-20
EUV focus monitoring systems and methods App 20160291482 - Shih; Chih-Tsung ; et al.	2016-10-06
EUV Lithography System and Method with Optimized Throughput and Stability App 20160274465 - LU; YEN-CHENG ; et al.	2016-09-22
Extreme ultraviolet lithography process and mask Grant 9,448,491 - Lu , et al. September 20, 2	2016-09-20
Extreme ultraviolet lithography process and mask Grant 9,442,384 - Lu , et al. September 13, 2	2016-09-13
Mask for extreme ultraviolet lithography and method of fabricating same Grant 9,442,365 - Lu , et al. September 13, 2	2016-09-13
Method of making an extreme ultraviolet pellicle Grant 9,442,368 - Shih , et al. September 13, 2	2016-09-13
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes Grant 9,418,191 - Wang , et al. August 16, 2	2016-08-16
Method for integrated circuit patterning Grant 9,418,862 - Huang , et al. August 16, 2	2016-08-16
Euv Pellicle Fabrication Methods And Structures Thereof App 20160231647 - Hsu; Pei-Cheng ; et al.	2016-08-11
Via definition scheme Grant 9,412,647 - Lu , et al. August 9, 2	2016-08-09
System And Method For Photomask Particle Detection App 20160225610 - Chien; Shang-Chieh ; et al.	2016-08-04
Extreme Ultraviolet Lithography Process and Mask App 20160223899 - SHIH; CHIH-TSUNG ; et al.	2016-08-04
Method to define multiple layer patterns with a single exposure by charged particle beam lithography Grant 9,405,195 - Lu , et al. August 2, 2	2016-08-02
Assist Feature for a Photolithographic Process App 20160195812 - HUANG; TAO-MIN ; et al.	2016-07-07
Extreme ultraviolet lithography process and mask Grant 9,377,696 - Lu , et al. June 28, 2	2016-06-28
Method of Semiconductor Integrated Circuit Fabrication App 20160172196 - LEE; Chung-Ju ; et al.	2016-06-16
Extreme Ultraviolet Lithography Process and Mask with Reduced Shadow Effect and Enhanced Intensity App 20160161839 - LU; YEN-CHENG ; et al.	2016-06-09
Extreme ultraviolet lithography process and mask Grant 9,354,507 - Shih , et al. May 31, 2	2016-05-31
Pellicle For Euv Mask And Fabrication Thereof App 20160147137 - Shih; Chih-Tsung ; et al.	2016-05-26
Euv Mask And Manufacturing Method By Using The Same App 20160147138 - Shih; Chih-Tsung ; et al.	2016-05-26
Electron beam data storage system and method for high volume manufacturing Grant 9,336,986 - Wang , et al. May 10, 2	2016-05-10
Euv Mask With Ito Absorber To Suppress Out Of Band Radiation App 20160124297 - Hsieh; Yi-Ling ; et al.	2016-05-05
Method Of Making An Extreme Ultraviolet Pellicle App 20160109798 - Shih; Chih-Tsung ; et al.	2016-04-21
Extreme ultraviolet lithography process and mask Grant 9,316,900 - Shih , et al. April 19, 2	2016-04-19
Method and system for E-beam lithography with multi-exposure Grant 9,305,799 - Chen , et al. April 5, 2	2016-04-05
Extreme ultraviolet lithography process and mask Grant 9,304,390 - Lu , et al. April 5, 2	2016-04-05
Assist feature for a photolithographic process Grant 9,285,673 - Huang , et al. March 15, 2	2016-03-15
Method of fabricating mask Grant 9,280,046 - Yen , et al. March 8, 2	2016-03-08
Method for Integrated Circuit Patterning App 20160064239 - Shih; Chih-Tsung ; et al.	2016-03-03
Method for Integrated Circuit Patterning App 20160064240 - Huang; Tsung-Min ; et al.	2016-03-03
System And Method For Performing Lithography Process In Semiconductor Device Fabrication App 20160054664 - Wu; Jui-Ching ; et al.	2016-02-25
Extreme Ultraviolet Lithography Process and Mask App 20160048071 - LU; YEN-CHENG ; et al.	2016-02-18
Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity Grant 9,261,774 - Lu , et al. February 16, 2	2016-02-16
Method of semiconductor integrated circuit fabrication Grant 9,257,282 - Shih , et al. February 9, 2	2016-02-09
Method of making an extreme ultraviolet pellicle Grant 9,256,123 - Shih , et al. February 9, 2	2016-02-09
Method to Mitigate Defect Printability for ID Pattern App 20160033866 - Lu; Yen-Cheng ; et al.	2016-02-04
Metal and via definition scheme Grant 9,252,048 - Lu , et al. February 2, 2	2016-02-02
Extreme ultraviolet lithography process and mask Grant 9,244,366 - Lu , et al. January 26, 2	2016-01-26
Assist Feature for a Photolithographic Process App 20160011501 - HUANG; Tao-Min ; et al.	2016-01-14
Method for integrated circuit patterning Grant 9,229,326 - Lu , et al. January 5, 2	2016-01-05
Extreme Ultraviolet Lithography Process and Mask App 20150346596 - Lu; Yen-Cheng ; et al.	2015-12-03
Method for mask fabrication and repair Grant 9,195,135 - Lu , et al. November 24, 2	2015-11-24
Extreme Ultraviolet Light (EUV) Photomasks and Fabrication Methods Thereof App 20150331307 - Lu; Yen-Cheng ; et al.	2015-11-19
Semiconductor Integrated Circuit Fabrication With Pattern-Reversing Process App 20150332922 - Chien; Ming-Chin ; et al.	2015-11-19
Particle Removal System And Method Thereof App 20150323862 - Chang; Shu-Hao ; et al.	2015-11-12
Extreme ultraviolet lithography process and mask Grant 9,182,659 - Lu , et al. November 10, 2	2015-11-10
Method for integrated circuit patterning Grant 9,184,054 - Huang , et al. November 10, 2	2015-11-10
Method of Semiconductor Integrated Circuit Fabrication App 20150318173 - Shih; Chih-Tsung ; et al.	2015-11-05
Method for Integrated Circuit Patterning App 20150311075 - Huang; Tsung-Min ; et al.	2015-10-29
Method Of Making An Extreme Ultraviolet Pellicle App 20150309405 - Shih; Chih-Tsung ; et al.	2015-10-29
Lithography layer with quenchers to prevent pattern collapse Grant 9,159,559 - Chien , et al. October 13, 2	2015-10-13
Method to Define Multiple Layer Patterns with a Single Exposure by Charged Particle Beam Lithography App 20150287596 - Lu; Yen-Cheng ; et al.	2015-10-08
Method and System for Reducing Pole Imbalance by Adjusting Exposure Intensity App 20150277234 - Lu; Yen-Cheng ; et al.	2015-10-01
Extreme ultraviolet lithography process and mask Grant 9,146,459 - Lu , et al. September 29, 2	2015-09-29
Method of Fabricating an Integrated Circuit with Enhanced Defect Repairability App 20150268561 - LU; YEN-CHENG ; et al.	2015-09-24
Method for Integrated Circuit Patterning App 20150262836 - LU; YEN-CHENG ; et al.	2015-09-17
Structure and Method for Reflective-Type Mask App 20150261082 - SHIH; CHIH-TSUNG ; et al.	2015-09-17
Method of Fabricating Semiconductor Integrated Circuit App 20150262815 - WU; CHIEH-HAN ; et al.	2015-09-17
Extreme ultraviolet (EUV) mask and method of fabricating the EUV mask Grant 9,134,604 - Shih , et al. September 15, 2	2015-09-15
Extreme ultraviolet lithography process and mask Grant 9,122,166 - Lu , et al. September 1, 2	2015-09-01
Method for Lithography Patterning App 20150241776 - Chien; Shang-Chieh ; et al.	2015-08-27
Extreme Ultraviolet Lithography Process And Mask App 20150227059 - LU; YEN-CHENG ; et al.	2015-08-13
Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof Grant 9,091,947 - Lu , et al. July 28, 2	2015-07-28
Extreme ultraviolet (EUV) mask, method of fabricating the EUV mask and method of inspecting the EUV mask Grant 9,081,288 - Shih , et al. July 14, 2	2015-07-14
Method to define multiple layer patterns with a single exposure by E-beam lithography Grant 9,081,312 - Lu , et al. July 14, 2	2015-07-14
Extreme Ultraviolet Lithography Process and Mask App 20150168845 - Lu; Yen-Cheng ; et al.	2015-06-18
Structure and method for reflective-type mask Grant 9,046,781 - Shih , et al. June 2, 2	2015-06-02
Extreme Ultraviolet Lithography Process and Mask with Reduced Shadow Effect and Enhanced Intensity App 20150147687 - Lu; Yen-Cheng ; et al.	2015-05-28
Extreme Ultraviolet Lithography Process And Mask App 20150147686 - Lu; Yen-Cheng ; et al.	2015-05-28
Extreme Ultraviolet Lithography Process and Mask App 20150138524 - Shih; Chih-Tsung ; et al.	2015-05-21
Extreme ultraviolet lithography process and mask Grant 9,034,569 - Lu , et al. May 19, 2	2015-05-19
Extreme Ultraviolet Lithography Process to Print Low Pattern Density Features App 20150116685 - Lu; Yen-Cheng ; et al.	2015-04-30
Extreme Ultraviolet Lithography Process and Mask App 20150104734 - Shih; Chih-Tsung ; et al.	2015-04-16
Extreme Ultraviolet Lithography Process and Mask App 20150098069 - Lu; Yen-Cheng ; et al.	2015-04-09
Extreme Ultraviolet Lithography Process And Mask App 20150085268 - LU; Yen-Cheng ; et al.	2015-03-26
Rotary Euv Collector App 20150085264 - Chien; Shang-Chieh ; et al.	2015-03-26
Method and apparatus for ultraviolet (UV) patterning with reduced outgassing Grant 8,988,652 - Chang , et al. March 24, 2	2015-03-24
Efficient scan for E-beam lithography Grant 8,987,689 - Chen , et al. March 24, 2	2015-03-24
Metal and Via Definition Scheme App 20150072519 - Lu; Yen-Cheng ; et al.	2015-03-12
Via Definition Scheme App 20150069622 - Lu; Yen-Cheng ; et al.	2015-03-12
Extreme Ultraviolet Lithography Process and Mask App 20150072271 - Lu; Yen-Cheng ; et al.	2015-03-12
Extreme Ultraviolet (Euv) Mask And Method Of Fabricating The Euv Mask App 20150064611 - Shih; Chih-Tsung ; et al.	2015-03-05
Extreme Ultraviolet (EUV) Mask, Method Of Fabricating The EUV Mask And Method Of Inspecting The EUV Mask App 20150037712 - Shih; Chih-Tsung ; et al.	2015-02-05
Smart subfield method for E-beam lithography Grant 8,945,803 - Chen , et al. February 3, 2	2015-02-03
Extreme Ultraviolet Light (euv) Photomasks And Fabrication Methods Thereof App 20150024305 - Lu; Yen-Cheng ; et al.	2015-01-22
Electron Beam Data Storage System and Method for High Volume Manufacturing App 20150008343 - WANG; HUNG-CHUN ; et al.	2015-01-08
Method and System for E-Beam Lithography with Multi-Exposure App 20140367588 - Chen; Pei-Shiang ; et al.	2014-12-18
System And Method For Performing Lithography Process In Semiconductor Device Fabrication App 20140347644 - Wu; Jui-Ching ; et al.	2014-11-27
Photomask With Three States For Forming Multiple Layer Patterns With A Single Exposure App 20140342564 - Lu; Yen-Cheng ; et al.	2014-11-20
Method to Define Multiple Layer Patterns With a Single Exposure by E-Beam Lithography App 20140342272 - Lu; Yen-Cheng ; et al.	2014-11-20
Data process for E-beam lithography Grant 8,877,410 - Chen , et al. November 4, 2	2014-11-04
Electron beam data storage system and method for high volume manufacturing Grant 8,841,049 - Wang , et al. September 23, 2	2014-09-23
Method For Mask Fabrication And Repair App 20140272680 - Lu; Yen-Cheng ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140268092 - LU; YEN-CHENG ; et al.	2014-09-18
Method Of Fabricating Mask App 20140272683 - Yen; Anthony ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140272721 - LU; YEN-CHENG ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140272679 - Lu; Yen-Cheng ; et al.	2014-09-18
Lithography System with an Embedded Cleaning Module App 20140268074 - Chien; Shang-Chieh ; et al.	2014-09-18
Structure and Method for Reflective-Type Mask App 20140272678 - Shih; Chih-Tsung ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140272682 - Shih; Chih-Tsung ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140268086 - LU; YEN-CHENG ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140268091 - LU; YEN-CHENG ; et al.	2014-09-18
Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same App 20140272686 - LU; YEN-CHENG ; et al.	2014-09-18
Method and system for E-beam lithography with multi-exposure Grant 8,835,082 - Chen , et al. September 16, 2	2014-09-16
Method and Structure to Improve Process Window for Lithography App 20140256146 - Chien; Shang-Chieh ; et al.	2014-09-11
Method to define multiple layer patterns using a single exposure Grant 8,791,024 - Lu , et al. July 29, 2	2014-07-29
Method And Apparatus For Ultraviolet (uv) Patterning With Reduced Outgassing App 20140111781 - CHANG; Shu-Hao ; et al.	2014-04-24
Smart Subfield Method For E-Beam Lithographny App 20140099582 - Chen; Pei-Shiang ; et al.	2014-04-10
Apparatus for charged particle lithography system Grant 8,677,511 - Wang , et al. March 18, 2	2014-03-18
Method and System for E-Beam Lithography with Multi-Exposure App 20140038107 - Chen; Pei-Shiang ; et al.	2014-02-06
Providing Elecron Beam Proximity Effect Correction By Simulating Write Operations Of Polygonal Shapes App 20140033144 - Wang; Hung-Chun ; et al.	2014-01-30
Data Process for E-Beam Lithography App 20140023972 - Chen; Cheng-Hung ; et al.	2014-01-23
Smart subfield method for E-beam lithography Grant 8,609,308 - Chen , et al. December 17, 2	2013-12-17
Efficient Scan For E-beam Lithography App 20130320243 - Chen; Cheng-Hung ; et al.	2013-12-05
Smart Subfield Method For E-beam Lithography App 20130323648 - Chen; Pei-Shiang ; et al.	2013-12-05
Geometric pattern data quality verification for maskless lithography Grant 8,601,407 - Wang , et al. December 3, 2	2013-12-03
Electron Beam Data Storage System and Method for High Volume Manufacturing App 20130316289 - Wang; Hung-Chun ; et al.	2013-11-28
Apparatus For Charged Particle Lithography System App 20130293899 - Wang; Shih-Chi ; et al.	2013-11-07
Data process for E-beam lithography Grant 8,563,224 - Chen , et al. October 22, 2	2013-10-22
Device and method for providing wavelength reduction with a photomask Grant 8,563,198 - Lin , et al. October 22, 2	2013-10-22
Electron beam data storage system and method for high volume manufacturing Grant 8,507,159 - Wang , et al. August 13, 2	2013-08-13
Striping methodology for maskless lithography Grant 8,473,877 - Wang , et al. June 25, 2	2013-06-25
Method for high volume e-beam lithography Grant 8,468,473 - Wang , et al. June 18, 2	2013-06-18
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes Grant 8,464,186 - Wang , et al. June 11, 2	2013-06-11
Striping Methodology For Maskless Lithography App 20130061187 - Wang; Hung-Chun ; et al.	2013-03-07
Geometric Pattern Data Quality Verification For Maskless Lithography App 20130055173 - Wang; Hung-Chun ; et al.	2013-02-28
System and method for generating direct-write pattern Grant 8,378,319 - Krecinic , et al. February 19, 2	2013-02-19
Electron Beam Data Storage System And Method For High Volume Manufacturing App 20120237877 - Wang; Hung-Chun ; et al.	2012-09-20
Systems And Methods Providing Electron Beam Proximity Effect Correction App 20120192126 - Wang; Hung-Chun ; et al.	2012-07-26
High-volume manufacturing massive e-beam maskless lithography system Grant 8,143,602 - Chen , et al. March 27, 2	2012-03-27
Device And Method For Providing Wavelength Reduction With A Photomask App 20110244378 - Lin; Burn Jeng ; et al.	2011-10-06
System And Method For Generating Direct-write Pattern App 20110226970 - Krecinic; Faruk ; et al.	2011-09-22
System and method for direct writing to a wafer Grant 7,851,774 - Lin , et al. December 14, 2	2010-12-14
High-volume Manufacturing Massive E-beam Maskless Lithography System App 20100248158 - Chen; Jeng-Horng ; et al.	2010-09-30
Level adjustment systems and adjustable pin chuck thereof Grant 7,659,964 - Lin , et al. February 9, 2	2010-02-09
System and Method for Direct Writing to a Wafer App 20090268184 - Lin; Burn Jeng ; et al.	2009-10-29
Level adjustment systems and adjustable pin chuck thereof App 20070236857 - Lin; Burn-Jeng ; et al.	2007-10-11
Photoresist intensive patterning and processing Grant 7,078,351 - Chiu , et al. July 18, 2	2006-07-18
Photomask with wavelength reduction material and pellicle App 20060083997 - Lin; Burn Jeng ; et al.	2006-04-20
Pattern compensation for stitching Grant 6,982,135 - Chang , et al. January 3, 2	2006-01-03
Device and method for providing wavelength reduction with a photomask App 20050100798 - Lin, Burn Jeng ; et al.	2005-05-12
Pattern compensation for stitching App 20040191643 - Chang, Chung-Hsing ; et al.	2004-09-30
Method of etching a silicon containing layer using multilayer masks Grant 6,777,340 - Chiu , et al. August 17, 2	2004-08-17
Photoresist intensive patterning and processing App 20040157444 - Chiu, Yuan-Hung ; et al.	2004-08-12
Method for monitoring alignment mark shielding Grant 6,277,658 - Jeng , et al. August 21, 2	2001-08-21
Segmented box-in-box for improving back end overlay measurement Grant 6,118,185 - Chen , et al. September 12, 2	2000-09-12
Alignment method for used in chemical mechanical polishing process Grant 5,933,744 - Chen , et al. August 3, 1	1999-08-03

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