Chen; Jang Fung

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chen; Jang Fung.The latest application filed is for "wire grid polarizer manufacturing method".

Company Profile

4.94.89

Chen; Jang Fung - Cupertino CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Wire grid polarizer manufacturing method Grant 10,983,389 - Markle , et al. April 20, 2	2021-04-20
Freeform distortion correction Grant 10,935,892 - Coskun , et al. March 2, 2	2021-03-02
Micro LED array illumination source Grant 10,908,507 - Chen , et al. February 2, 2	2021-02-02
Method of pattern placement correction Grant 10,497,658 - Coskun , et al. De	2019-12-03
Apparatus and methods for on-the-fly digital exposure image data modification Grant 10,379,450 - Johnston , et al. A	2019-08-13
Wire Grid Polarizer Manufacturing Method App 20190049789 - MARKLE; David ; et al.	2019-02-14
Method Of Pattern Placement Correction App 20190019769 - COSKUN; Tamer ; et al.	2019-01-17
Wire Grid Polarizer Manufacturing Methods Using Frequency Doubling Interference Lithography App 20180335694 - CHEN; Jang Fung ; et al.	2018-11-22
Freeform Distortion Correction App 20180329310 - COSKUN; Tamer ; et al.	2018-11-15
Method of pattern placement correction Grant 10,115,687 - Coskun , et al. October 30, 2	2018-10-30
Method Of Pattern Placement Correction App 20180226369 - COSKUN; Tamer ; et al.	2018-08-09
Micro Led Array As Illumination System App 20180188655 - Chen; Jang Fung ; et al.	2018-07-05
Apparatus And Methods For On -the-fly Digital Exposure Image Data Modification App 20180129142 - JOHNSTON; Benjamin M. ; et al.	2018-05-10
Apparatus and methods for on-the-fly digital exposure image data modification Grant 9,927,723 - Johnston , et al. March 27, 2	2018-03-27
Illumination system with monitoring optical output power Grant 9,907,152 - Kaskey , et al. February 27, 2	2018-02-27
Focus Centering Method For Digital Lithography App 20180024448 - TUNG; Yeishin ; et al.	2018-01-25
Micro Led Array As Illumination Source App 20180017876 - CHEN; Jang Fung ; et al.	2018-01-18
Frustrated Cube Assembly App 20180017781 - MARKLE; David ; et al.	2018-01-18
Optical projection array exposure system Grant 9,733,573 - Markle , et al. August 15, 2	2017-08-15
Optical imaging writer system Grant 9,519,226 - Chen , et al. December 13, 2	2016-12-13
System and method for manufacturing multiple light emitting diodes in parallel Grant 9,507,271 - Chen , et al. November 29, 2	2016-11-29
Apparatus And Methods For On-the-fly Digital Exposure Image Data Modification App 20160282728 - JOHNSTON; Benjamin M. ; et al.	2016-09-29
Pixel blending for multiple charged-particle beam lithography Grant 9,405,203 - Chen , et al. August 2, 2	2016-08-02
Illumination System With Monitoring Optical Output Power App 20160219684 - KASKEY; Jeffrey ; et al.	2016-07-28
Method of improved hierarchical XML databases Grant 9,361,400 - Zhao , et al. June 7, 2	2016-06-07
Optical Projection Array Exposure System App 20160124316 - MARKLE; David ; et al.	2016-05-05
Optical projection array exposure system Grant 9,250,509 - Markle , et al. February 2, 2	2016-02-02
System and method for manufacturing three dimensional integrated circuits Grant 9,025,136 - Chen , et al. May 5, 2	2015-05-05
Method, Program Product And Apparatus For Performing Double Exposure Lithography App 20150095858 - CHEN; Jang Fung ; et al.	2015-04-02
Method and system for handling substrates Grant 8,914,143 - Kaskey , et al. December 16, 2	2014-12-16
Method, program product and apparatus for performing double exposure lithography Grant 8,910,091 - Chen , et al. December 9, 2	2014-12-09
Optical Imaging Writer System App 20140192336 - CHEN; Jang Fung ; et al.	2014-07-10
Pixel Blending For Multiple Charged-Particle Beam Lithography App 20140192334 - CHEN; Jang Fung ; et al.	2014-07-10
Optical imaging writer system Grant 8,670,106 - Chen , et al. March 11, 2	2014-03-11
Method and apparatus for performing model-based OPC for pattern decomposed features Grant 8,644,589 - Hsu , et al. February 4, 2	2014-02-04
Method and apparatus for performing dark field double dipole lithography (DDL) Grant 8,632,930 - Hsu , et al. January 21, 2	2014-01-21
Optical Projection Array Exposure System App 20130321786 - MARKLE; David ; et al.	2013-12-05
Illumination System App 20130207544 - Kaskey; Jeffrey ; et al.	2013-08-15
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography Grant 8,495,529 - van Den Broeke , et al. July 23, 2	2013-07-23
Method and Apparatus for Performing Model-Based OPC for Pattern Decomposed Features App 20130182940 - Hsu; Duan-Fu Stephen ; et al.	2013-07-18
Method and apparatus for performing model-based OPC for pattern decomposed features Grant 8,391,605 - Hsu , et al. March 5, 2	2013-03-05
Method, Program Product and Apparatus for Performing Double Exposure Lithography App 20130055171 - Chen; Jang Fung ; et al.	2013-02-28
Optical Imaging Writer System App 20120307225 - Chen; Jang Fung ; et al.	2012-12-06
Optical Imaging Writer System App 20120264066 - Chen; Jang Fung ; et al.	2012-10-18
Optical imaging writer system Grant 8,253,923 - Chen , et al. August 28, 2	2012-08-28
Method and Apparatus for Performing Model-Based OPC for Pattern Decomposed Features App 20120122023 - Hsu; Duan-Fu Stephen ; et al.	2012-05-17
Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process Grant 8,132,130 - Chen , et al. March 6, 2	2012-03-06
Method, program product and apparatus for performing double exposure lithography Grant 8,122,391 - Chen , et al. February 21, 2	2012-02-21
Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process Grant 8,120,753 - Berger , et al. February 21, 2	2012-02-21
Method and apparatus for performing model-based OPC for pattern decomposed features Grant 8,111,921 - Hsu , et al. February 7, 2	2012-02-07
System and Method for Manufacturing Three Dimensional Integrated Circuits App 20120026478 - Chen; Jang Fung ; et al.	2012-02-02
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 8,039,180 - Laidig , et al. October 18, 2	2011-10-18
Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration Grant 8,040,573 - Shi , et al. October 18, 2	2011-10-18
Method and Apparatus for Performing Dark Field Double Dipole Lithography (DDL) App 20110236808 - Hsu; Duan-Fu Stephen ; et al.	2011-09-29
CPL mask and a method and program product for generating the same Grant 7,998,355 - Van Den Broeke , et al. August 16, 2	2011-08-16
Method and apparatus for performing model-based layout conversion for use with dipole illumination Grant 7,985,515 - Hsu , et al. July 26, 2	2011-07-26
Method and apparatus for performing dark field double dipole lithography (DDL) Grant 7,981,576 - Hsu , et al. July 19, 2	2011-07-19
Scattering Bar OPC Application Method for Sub-Half Wavelength Lithography Patterning App 20110143268 - Laidig; Thomas ; et al.	2011-06-16
CPL mask and a method and program product for generating the same Grant 7,892,703 - Chen , et al. February 22, 2	2011-02-22
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 7,892,707 - Laidig , et al. February 22, 2	2011-02-22
Method and Apparatus for Performing Dark Field Double Dipole Lithography (DDL) App 20110014552 - Hsu; Duan-Fu Stephen ; et al.	2011-01-20
Method and apparatus for performing dark field double dipole lithography (DDL) Grant 7,824,826 - Hsu , et al. November 2, 2	2010-11-02
Method of two dimensional feature model calibration and optimization Grant 7,820,341 - Laidig , et al. October 26, 2	2010-10-26
Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool Grant 7,818,151 - Coskun , et al. October 19, 2	2010-10-19
Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings Grant 7,804,646 - Chen , et al. September 28, 2	2010-09-28
Method, Program Product And Apparatus For Performing Double Exposure Lithography App 20100221669 - Chen; Jang Fung ; et al.	2010-09-02
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Grant 7,774,736 - Broeke , et al. August 10, 2	2010-08-10
Method And Apparatus For Performing Model-based Layout Conversion For Use With Dipole Illumination App 20100167183 - HSU; Duan-Fu Stephen ; et al.	2010-07-01
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs Grant 7,735,052 - Shi , et al. June 8, 2	2010-06-08
Orientation dependent shielding for use with dipole illumination techniques Grant 7,725,872 - Hsu , et al. May 25, 2	2010-05-25
System and method for generating pattern data used to control a pattern generator Grant 7,713,667 - Latypov , et al. May 11, 2	2010-05-11
Method, program product and apparatus for performing double exposure lithography Grant 7,681,171 - Chen , et al. March 16, 2	2010-03-16
Method, Program Product And Apparatus For Model Based Scattering Bar Placement For Enhanced Depth Of Focus In Quarter-wavelength Lithography App 20100047699 - BROEKE; Douglas Van Den ; et al.	2010-02-25
Method of achieving CD linearity control for full-chip CPL manufacturing Grant 7,667,216 - Van Den Broeke , et al. February 23, 2	2010-02-23
Method and apparatus for performing model-based layout conversion for use with dipole illumination Grant 7,666,554 - Hsu , et al. February 23, 2	2010-02-23
Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems Grant 7,652,758 - Park , et al. January 26, 2	2010-01-26
Method, program product and apparatus for optimizing illumination for full-chip layer Grant 7,639,864 - Socha , et al. December 29, 2	2009-12-29
Method Of Improved Hierarchical Xml Databases App 20090313288 - Zhao; Leo Lilin ; et al.	2009-12-17
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography Grant 7,620,930 - Van Den Broeke , et al. November 17, 2	2009-11-17
Method for performing pattern pitch-split decomposition utilizing anchoring features Grant 7,617,476 - Hsu , et al. November 10, 2	2009-11-10
Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology Grant 7,614,034 - Van Den Broeke , et al. November 3, 2	2009-11-03
Method for improved manufacturability and patterning of sub-wavelength contact hole mask Grant 7,604,909 - Hsu , et al. October 20, 2	2009-10-20
Method of optical proximity correction design for contact hole mask Grant 7,594,199 - Socha , et al. September 22, 2	2009-09-22
Scattering Bar Opc Application Method For Sub-half Wavelength Lithography Patterning Field Of The Invention App 20090233186 - Laidig; Thomas ; et al.	2009-09-17
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography Grant 7,550,235 - Shi , et al. June 23, 2	2009-06-23
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography Grant 7,549,140 - Van Den Broeke , et al. June 16, 2	2009-06-16
Method Of Compact Display Combined With Property-table-view For A Complex Relational Data Structure App 20090138500 - YUAN; Zhiqiang ; et al.	2009-05-28
Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM Grant 7,523,438 - Hsu , et al. April 21, 2	2009-04-21
Method for performing transmission tuning of a mask pattern to improve process latitude Grant 7,514,183 - Hsu , et al. April 7, 2	2009-04-07
Feature optimization using interference mapping lithography Grant 7,506,299 - Socha , et al. March 17, 2	2009-03-17
Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation Grant 7,494,753 - Chen , et al. February 24, 2	2009-02-24
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 7,485,396 - Laidig , et al. February 3, 2	2009-02-03
Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model Grant 7,440,082 - Shi , et al. October 21, 2	2008-10-21
Scattering bar OPC application method for sub-half wavelength lithography patterning App 20080206656 - Laidig; Thomas ; et al.	2008-08-28
Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process App 20080204690 - Berger; Gabriel ; et al.	2008-08-28
Method, program product and apparatus for generating assist features utilizing an image field map Grant 7,376,930 - Wampler , et al. May 20, 2	2008-05-20
Method for performing pattern pitch-split decomposition utilizing anchoring features App 20080092106 - Hsu; Duan-Fu Stephen ; et al.	2008-04-17
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 7,354,681 - Laidig , et al. April 8, 2	2008-04-08
Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration App 20080068668 - Shi; Xuelong ; et al.	2008-03-20
Method and apparatus for performing model-based OPC for pattern decomposed features App 20080069432 - Hsu; Duan-Fu Stephen ; et al.	2008-03-20
CPL mask and a method and program product for generating the same App 20080067143 - Broeke; Douglas Van den ; et al.	2008-03-20
Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model Grant 7,342,646 - Shi , et al. March 11, 2	2008-03-11
Optical proximity correction Grant RE40,084 - Petersen , et al. February 19, 2	2008-02-19
Method and apparatus for performing dark field double dipole lithography (DDL) App 20080020296 - Hsu; Duan-Fu Stephen ; et al.	2008-01-24
Method for improved manufacturability and patterning of sub-wavelength contact hole mask App 20080014509 - Hsu; Chung-Wei ; et al.	2008-01-17
Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool App 20070260437 - Coskun; Tamer ; et al.	2007-11-08
Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model App 20070247610 - Shi; Xuelong ; et al.	2007-10-25
Orientation dependent shielding for use with dipole illumination techniques App 20070214448 - Hsu; Stephen Duan-Fu ; et al.	2007-09-13
Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings App 20070195394 - Chen; Ting ; et al.	2007-08-23
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Grant 7,247,574 - Broeke , et al. July 24, 2	2007-07-24
Orientation dependent shielding for use with dipole illumination techniques Grant 7,246,342 - Hsu , et al. July 17, 2	2007-07-17
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography App 20070162889 - Broeke; Douglas Van Den ; et al.	2007-07-12
Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model Grant 7,242,459 - Shi , et al. July 10, 2	2007-07-10
Method of achieving CD linearity control for full-chip CPL manufacturing App 20070148562 - Broeke; Doug Van Den ; et al.	2007-06-28
Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology App 20070122719 - Van Den Broeke; Douglas ; et al.	2007-05-31
Method of two dimensional feature model calibration and optimization App 20070117030 - Laidig; Thomas ; et al.	2007-05-24
Method of achieving CD linearity control for full-chip CPL manufacturing Grant 7,211,815 - Broeke , et al. May 1, 2	2007-05-01
CPL mask and a method and program product for generating the same App 20070065733 - Chen; Jang Fung ; et al.	2007-03-22
Method and apparatus for performing model-based layout conversion for use with dipole illumination App 20070042277 - Hsu; Duan-Fu Stephen ; et al.	2007-02-22
Method of two dimensional feature model calibration and optimization Grant 7,175,940 - Laidig , et al. February 13, 2	2007-02-13
Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process App 20070031740 - Chen; Jang Fung ; et al.	2007-02-08
Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems App 20070002311 - Park; SangBong ; et al.	2007-01-04
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs App 20060277522 - Shi; Xuelong ; et al.	2006-12-07
Method, program product and apparatus for performing double exposure lithography App 20060277521 - Chen; Jang Fung ; et al.	2006-12-07
Method and apparatus for performing model-based layout conversion for use with dipole illumination Grant 7,138,212 - Hsu , et al. November 21, 2	2006-11-21
Automatic optical proximity correction (OPC) rule generation Grant 7,124,395 - Shi , et al. October 17, 2	2006-10-17
Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems Grant 7,116,411 - Park , et al. October 3, 2	2006-10-03
Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation App 20060208205 - Chen; Jang Fung ; et al.	2006-09-21
Method, program product and apparatus for optimizing illumination for full-chip layer App 20060204090 - Socha; Robert J. ; et al.	2006-09-14
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs Grant 7,100,145 - Shi , et al. August 29, 2	2006-08-29
System and method for generating pattern data used to control a pattern generator App 20060115752 - Latypov; Azat M. ; et al.	2006-06-01
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography App 20060075377 - Broeke; Douglas Van Den ; et al.	2006-04-06
Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems App 20060044542 - Park; Sangbong ; et al.	2006-03-02
Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM Grant 6,951,701 - Hsu , et al. October 4, 2	2005-10-04
Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model App 20050210437 - Shi, Xuelong ; et al.	2005-09-22
Method for performing transmission tuning of a mask pattern to improve process latitude App 20050196682 - Hsu, Stephen D. ; et al.	2005-09-08
Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM App 20050186491 - Hsu, Michael ; et al.	2005-08-25
Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model App 20050179886 - Shi, Xuelong ; et al.	2005-08-18
Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique Grant 6,920,628 - Chen , et al. July 19, 2	2005-07-19
Method and apparatus for performing rule-based gate shrink utilizing dipole illumination Grant 6,915,505 - Hsu , et al. July 5, 2	2005-07-05
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography App 20050142449 - Shi, Xuelong ; et al.	2005-06-30
Feature optimization using interference mapping lithography App 20050142470 - Socha, Robert John ; et al.	2005-06-30
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography App 20050125765 - Broeke, Doug Van Den ; et al.	2005-06-09
Orientation dependent shielding for use with dipole illumination techniques App 20050102648 - Hsu, Stephen Duan-Fu ; et al.	2005-05-12
Scattering bar OPC application method for sub-half wavelength lithography patterning App 20050074677 - Laidig, Thomas ; et al.	2005-04-07
Method of removing assist features utilized to improve process latitude Grant 6,875,545 - Eurlings , et al. April 5, 2	2005-04-05
Method, program product and apparatus for generating assist features utilizing an image field map App 20050053848 - Wampler, Kurt E. ; et al.	2005-03-10
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs App 20050034096 - Shi, Xuelong ; et al.	2005-02-10
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography Grant 6,851,103 - Van Den Broeke , et al. February 1, 2	2005-02-01
Hybrid phase-shift mask Grant 6,835,510 - Chen , et al. December 28, 2	2004-12-28
Method of optical proximity correction design for contact hole mask App 20040229133 - Socha, Robert John ; et al.	2004-11-18
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography App 20040209170 - Broeke, Douglas Van Den ; et al.	2004-10-21
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs Grant 6,792,591 - Shi , et al. September 14, 2	2004-09-14
Method and apparatus for performing model-based layout conversion for use with dipole illumination App 20040142251 - Hsu, Duan-Fu Stephen ; et al.	2004-07-22
Automatic optical proximity correction (OPC) rule generation App 20040139418 - Shi, Xuelong ; et al.	2004-07-15
Method of achieving CD linearity control for full-chip CPL manufacturing App 20040115539 - Broeke, Doug Van Den ; et al.	2004-06-17
Hybrid phase-shift mask App 20040067423 - Chen, Jang Fung ; et al.	2004-04-08
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography App 20040010770 - Broeke, Doug Van Den ; et al.	2004-01-15
Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique App 20040006757 - Chen, Jang Fung ; et al.	2004-01-08
Method and apparatus for performing rule-based gate shrink utilizing dipole illumination App 20040003368 - Hsu, Stephen D. ; et al.	2004-01-01
Hybrid phase-shift mask Grant 6,623,895 - Chen , et al. September 23, 2	2003-09-23
Method of removing assist features utilized to improve process latitude App 20030170565 - Eurlings, Markus Franciscus Antonius ; et al.	2003-09-11
Method of two dimensional feature model calibration and optimization App 20030082463 - Laidig, Thomas ; et al.	2003-05-01
Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM App 20030073013 - Hsu, Michael ; et al.	2003-04-17
Optical proximity correction Grant 6,541,167 - Petersen , et al. April 1, 2	2003-04-01
Method and apparatus for minimizing optical proximity effects Grant 6,519,760 - Shi , et al. February 11, 2	2003-02-11
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs App 20020157081 - Shi, Xuelong ; et al.	2002-10-24
Method and apparatus for minimizing optical proximity effects App 20020152451 - Shi, Xuelong ; et al.	2002-10-17
Hybrid phase-shift mask App 20020015899 - Chen, Jang Fung ; et al.	2002-02-07
Optical proximity correction App 20020001758 - Petersen, John S. ; et al.	2002-01-03
Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask Grant 5,821,014 - Chen , et al. October 13, 1	1998-10-13