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name:-0.0076789855957031
name:-0.0004880428314209
Chen; J. Fung Patent Filings

Chen; J. Fung

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chen; J. Fung.The latest application filed is for "optical proximity correction method utilizing phase-edges as sub-resolution assist features".

Company Profile
0.8.5
  • Chen; J. Fung - Cupertino CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Optical proximity correction method utilizing phase-edges as sub-resolution assist features
Grant 7,399,559 - Broeke , et al. July 15, 2
2008-07-15
Optical proximity correction method utilizing phase-edges as sub-resolution assist features
Grant 7,026,081 - Van Den Broeke , et al. April 11, 2
2006-04-11
Optical proximity correction method utilizing phase-edges as sub-resolution assist features
App 20050271953 - Broeke, Douglas Van Den ;   et al.
2005-12-08
Method and apparatus for detecting aberrations in an optical system
Grant 6,788,400 - Chen September 7, 2
2004-09-07
Method and apparatus for detecting aberrations in a projection lens utilized for projection optics
Grant 6,753,954 - Chen June 22, 2
2004-06-22
Method and apparatus for detecting aberrations in a projection lens utilized for projection optics
App 20030098970 - Chen, J. Fung
2003-05-29
Optical proximity correction method utilizing phase-edges as sub-resolution assist features
App 20030064298 - Broeke, Douglas Van Den ;   et al.
2003-04-03
Method of patterning sub-0.25.lambda. line features with high transmission, "attenuated" phase shift masks
Grant 6,482,555 - Chen , et al. November 19, 2
2002-11-19
Method and apparatus for detecting aberrations in an optical system
App 20020088951 - Chen, J. Fung
2002-07-11
Method of patterning sub-0.25lambda line features with high transmission, "attenuated" phase shift masks
App 20020048708 - Chen, J. Fung ;   et al.
2002-04-25
System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features
Grant 6,335,130 - Chen , et al. January 1, 2
2002-01-01
Method of fine feature edge tuning with optically-halftoned mask
Grant 6,114,071 - Chen , et al. September 5, 2
2000-09-05
Photolithography mask using serifs and method thereof
Grant 5,707,765 - Chen January 13, 1
1998-01-13

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