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Patent applications and USPTO patent grants for CHEN; Fei-Fan.The latest application filed is for "wafer processing method".
Patent | Date |
---|---|
Wafer Processing Method App 20200357612 - HUANG; Chien Kuo ;   et al. | 2020-11-12 |
Process chamber and wafer processing method Grant 10,741,366 - Huang , et al. A | 2020-08-11 |
Process Chamber And Wafer Processing Method App 20180308665 - HUANG; Chien Kuo ;   et al. | 2018-10-25 |
Remote plasma system and method Grant 10,011,532 - Chen , et al. July 3, 2 | 2018-07-03 |
Gas diffuser unit, process chamber and wafer processing method Grant 10,008,367 - Huang , et al. June 26, 2 | 2018-06-26 |
Remote Plasma System and Method App 20150155185 - Chen; Fei-Fan ;   et al. | 2015-06-04 |
Remote plasma system and method Grant 8,944,003 - Chen , et al. February 3, 2 | 2015-02-03 |
Gas Diffuser Unit, Process Chamber And Wafer Processing Method App 20150002017 - HUANG; Chien Kuo ;   et al. | 2015-01-01 |
Plasma density control Grant 8,889,435 - Wu , et al. November 18, 2 | 2014-11-18 |
Remote Plasma System and Method App 20140141614 - Chen; Fei-Fan ;   et al. | 2014-05-22 |
Plasma Density Control App 20130084657 - Wu; Wen-Sheng ;   et al. | 2013-04-04 |
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