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Method And Device For Cleaning Substrates App 20220308464 - LIU; Chung-Hsuan ;   et al. | 2022-09-29 |
Semiconductor structure cutting process and structures formed thereby Grant 11,444,080 - Hung , et al. September 13, 2 | 2022-09-13 |
Air Spacer and Method of Forming Same App 20220285530 - Sie; Ming-Jhe ;   et al. | 2022-09-08 |
Photomask and method of fabricating a photomask Grant 11,435,660 - Lee , et al. September 6, 2 | 2022-09-06 |
Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors Grant 11,430,671 - Lin , et al. August 30, 2 | 2022-08-30 |
Photomask including fiducial mark and method of making semiconductor device using the photomask Grant 11,422,466 - Lee , et al. August 23, 2 | 2022-08-23 |
Method Of Manufacturing Photo Masks App 20220260926 - CHEN; Chien-Cheng ;   et al. | 2022-08-18 |
Particle Removing Assembly And Method Of Cleaning Mask For Lithography App 20220252993 - LIN; Chen-Yang ;   et al. | 2022-08-11 |
Air spacer and method of forming same Grant 11,349,014 - Sie , et al. May 31, 2 | 2022-05-31 |
Method of manufacturing photo masks Grant 11,327,405 - Chen , et al. May 10, 2 | 2022-05-10 |
Particle removing assembly and method of cleaning mask for lithography Grant 11,294,292 - Lin , et al. April 5, 2 | 2022-04-05 |
Ozone Wafer Cleaning Module Having An Ultraviolet Lamp Module With Rotatable Reflectors App 20220037171 - LIN; Chen-Yang ;   et al. | 2022-02-03 |
Air Spacer and Method of Forming Same App 20210408266 - Sie; Ming-Jhe ;   et al. | 2021-12-30 |
Euv Photo Masks And Manufacturing Method Thereof App 20210405519 - LEE; Hsin-Chang ;   et al. | 2021-12-30 |
Mask patterns and method of manufacture Grant 11,143,954 - Hsueh , et al. October 12, 2 | 2021-10-12 |
Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same Grant 11,137,684 - Lin , et al. October 5, 2 | 2021-10-05 |
Lithography Mask with a Black Border Regions and Method of Fabricating the Same App 20210294203 - Lin; Chin-Hsiang ;   et al. | 2021-09-23 |
Photomask Including Fiducial Mark And Method Of Making Semiconductor Device Using The Photomask App 20210286255 - LEE; Hsin-Chang ;   et al. | 2021-09-16 |
Method Of Manufacturing Extreme Ultraviolet Mask With Reduced Wafer Neighboring Effect App 20210247687 - HSUEH; Wen-Chang ;   et al. | 2021-08-12 |
Particle Removing Assembly And Method Of Cleaning Mask For Lithography App 20210200107 - LIN; Chen-Yang ;   et al. | 2021-07-01 |
Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask Grant 11,042,084 - Lee , et al. June 22, 2 | 2021-06-22 |
Lithography mask with a black border regions and method of fabricating the same Grant 11,029,593 - Lin , et al. June 8, 2 | 2021-06-08 |
Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same Grant 10,996,553 - Hsueh , et al. May 4, 2 | 2021-05-04 |
Method Of Manufacturing Photo Masks App 20210055646 - CHEN; Chien-Cheng ;   et al. | 2021-02-25 |
Semiconductor Structure Cutting Process and Structures Formed Thereby App 20210050350 - Hung; Chih-Chang ;   et al. | 2021-02-18 |
Semiconductor structure cutting process and structures formed thereby Grant 10,867,998 - Hung , et al. December 15, 2 | 2020-12-15 |
Lithography mask with a black border region and method of fabricating the same Grant 10,866,504 - Lin , et al. December 15, 2 | 2020-12-15 |
Semiconductor structure cutting process and structures formed thereby Grant 10,833,077 - Hung , et al. November 10, 2 | 2020-11-10 |
Method of manufacturing photo masks Grant 10,816,892 - Chen , et al. October 27, 2 | 2020-10-27 |
Lithography Mask With Both Transmission-type And Reflective-type Overlay Marks And Method Of Fabricating The Same App 20200124958 - Lin; Yun-Yue ;   et al. | 2020-04-23 |
Lithography Mask with a Black Border Regions and Method of Fabricating the Same App 20200050098 - Lin; Chin-Hsiang ;   et al. | 2020-02-13 |
Mask Patterns and Method of Manufacture App 20190391480 - Hsueh; Wen-Chang ;   et al. | 2019-12-26 |
Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same Grant 10,514,597 - Lin , et al. Dec | 2019-12-24 |
Semiconductor Structure Cutting Process and Structures Formed Thereby App 20190267374 - Hung; Chih-Chang ;   et al. | 2019-08-29 |
Photomask Including Fiducial Mark, Method Of Patterning The Photomask And Method Of Making Semiconductor Device Using The Photom App 20190258156 - LEE; Hsin-Chang ;   et al. | 2019-08-22 |
Lithography Mask With A Black Border Region And Method Of Fabricating The Same App 20190196322 - Lin; Chin-Hsiang ;   et al. | 2019-06-27 |
Photomask And Method Of Fabricating A Photomask App 20190155140 - LEE; Hsin-Chang ;   et al. | 2019-05-23 |
Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask Grant 10,295,899 - Lee , et al. | 2019-05-21 |
Method Of Manufacturing Photo Masks App 20190148110 - CHEN; Chien-Cheng ;   et al. | 2019-05-16 |
Extreme Ultraviolet Mask With Reduced Wafer Neighboring Effect And Method Of Manufacturing The Same App 20190146325 - HSUEH; Wen-Chang ;   et al. | 2019-05-16 |
Photomask Including Fiducial Mark, Method Of Patterning The Photomask And Method Of Making Semiconductor Device Using The Photomask App 20180364560 - LEE; Hsin-Chang ;   et al. | 2018-12-20 |
Lithography mask Grant 9,995,999 - Lin , et al. June 12, 2 | 2018-06-12 |
Lithography Mask With Both Transmission-type And Reflective-type Overlay Marks And Method Of Fabricating The Same App 20180149959 - Lin; Yun-Yue ;   et al. | 2018-05-31 |
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof Grant 9,869,928 - Huang , et al. January 16, 2 | 2018-01-16 |
Method of making an extreme ultraviolet pellicle Grant 9,664,999 - Shih , et al. May 30, 2 | 2017-05-30 |
Mask and method for forming the same Grant 9,651,857 - Lin , et al. May 16, 2 | 2017-05-16 |
System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle Grant 9,558,944 - Hsu , et al. January 31, 2 | 2017-01-31 |
Assist feature for a photolithographic process Grant 9,557,649 - Huang , et al. January 31, 2 | 2017-01-31 |
Method and system for inspection of a patterned structure Grant 9,530,200 - Hsueh , et al. December 27, 2 | 2016-12-27 |
Method Of Making An Extreme Ultraviolet Pellicle App 20160363857 - Shih; Chih-Tsung ;   et al. | 2016-12-15 |
Lithography Mask App 20160299419 - Lin; Yun-Yue ;   et al. | 2016-10-13 |
Method of making an extreme ultraviolet pellicle Grant 9,442,368 - Shih , et al. September 13, 2 | 2016-09-13 |
Structure and method of photomask with reduction of electron-beam scatterring Grant 9,429,835 - Hsueh , et al. August 30, 2 | 2016-08-30 |
Extreme Ultraviolet Light (EUV) Photomasks, and Fabrication Methods Thereof App 20160223900 - Huang; Tao-Min ;   et al. | 2016-08-04 |
Assist Feature for a Photolithographic Process App 20160195812 - HUANG; TAO-MIN ;   et al. | 2016-07-07 |
Method of calibrating or exposing a lithography tool Grant 9,373,552 - Lin , et al. June 21, 2 | 2016-06-21 |
Lithography mask Grant 9,366,953 - Lin , et al. June 14, 2 | 2016-06-14 |
Pellicle structure and method for forming the same Grant 9,360,749 - Lin , et al. June 7, 2 | 2016-06-07 |
Reticle and method of fabricating the same Grant 9,341,940 - Hsueh , et al. May 17, 2 | 2016-05-17 |
Lithography system and method for patterning photoresist layer on EUV mask Grant 9,341,937 - Lin , et al. May 17, 2 | 2016-05-17 |
Method Of Making An Extreme Ultraviolet Pellicle App 20160109798 - Shih; Chih-Tsung ;   et al. | 2016-04-21 |
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof Grant 9,310,675 - Huang , et al. April 12, 2 | 2016-04-12 |
Composite dummy gate with conformal polysilicon layer for FinFET device Grant 9,287,179 - Huang , et al. March 15, 2 | 2016-03-15 |
Assist feature for a photolithographic process Grant 9,285,673 - Huang , et al. March 15, 2 | 2016-03-15 |
Pellicle mounting system and method Grant 9,256,142 - Lee-Chih , et al. February 9, 2 | 2016-02-09 |
Method of making an extreme ultraviolet pellicle Grant 9,256,123 - Shih , et al. February 9, 2 | 2016-02-09 |
Photomask and method for forming the same Grant 9,244,341 - Lee , et al. January 26, 2 | 2016-01-26 |
Assist Feature for a Photolithographic Process App 20160011501 - HUANG; Tao-Min ;   et al. | 2016-01-14 |
Method And System For Inspection Of A Patterned Structure App 20150371377 - HSUEH; Wen-Chang ;   et al. | 2015-12-24 |
Method Of Calibrating Or Exposing A Lithography Tool App 20150364383 - Lin; Yu Chao ;   et al. | 2015-12-17 |
Reflective mask and method of making same Grant 9,213,232 - Hsu , et al. December 15, 2 | 2015-12-15 |
Reticle And Method Of Fabricating The Same App 20150331309 - HSUEH; Wen-Chang ;   et al. | 2015-11-19 |
Pellicle Structure And Method For Forming The Same App 20150309404 - LIN; Yun-Yue ;   et al. | 2015-10-29 |
Method Of Making An Extreme Ultraviolet Pellicle App 20150309405 - Shih; Chih-Tsung ;   et al. | 2015-10-29 |
Lithography System And Method For Patterning Photoresist Layer On Euv Mask App 20150309401 - LIN; Yun-Yue ;   et al. | 2015-10-29 |
System, Method And Reticle For Improved Pattern Quality In Extreme Ultraviolet (euv) Lithography And Method For Forming The Reticle App 20150255272 - HSU; Chia-Hao ;   et al. | 2015-09-10 |
Method of forming a pattern Grant 9,128,384 - Lin , et al. September 8, 2 | 2015-09-08 |
Structure and Method of Photomask with Reduction of Electron-Beam Scatterring App 20150227037 - Hsueh; Wen-Chang ;   et al. | 2015-08-13 |
Lithography Mask App 20150205194 - LIN; Yun-Yue ;   et al. | 2015-07-23 |
Mask And Method For Forming The Same App 20150177612 - Lin; Yun-Yue ;   et al. | 2015-06-25 |
Photomask and Method for Forming the Same App 20150168826 - Lee; Hsin-Chang ;   et al. | 2015-06-18 |
Systems and methods for lithography masks Grant 9,057,961 - Tu , et al. June 16, 2 | 2015-06-16 |
System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle Grant 9,046,776 - Hsu , et al. June 2, 2 | 2015-06-02 |
Reflective Mask And Method Of Making Same App 20150104736 - HSU; Pei-Cheng ;   et al. | 2015-04-16 |
Mask and method for forming the same Grant 8,974,988 - Lin , et al. March 10, 2 | 2015-03-10 |
Photomask and method for forming the same Grant 8,962,222 - Lee , et al. February 24, 2 | 2015-02-24 |
Method of making a lithography mask Grant 8,916,482 - Lee , et al. December 23, 2 | 2014-12-23 |
Structure and method for MOSFETS with high-K and metal gate structure Grant 8,912,610 - Lin , et al. December 16, 2 | 2014-12-16 |
Systems and Methods for Lithography Masks App 20140335446 - Tu; Chih-Chiang ;   et al. | 2014-11-13 |
Reflective mask and method of making same Grant 8,877,409 - Hsu , et al. November 4, 2 | 2014-11-04 |
Extreme Ultraviolet Light (EUV) Photomasks, and Fabrication Methods Thereof App 20140272681 - Huang; Tao-Min ;   et al. | 2014-09-18 |
Pellicle Mounting System And Method App 20140253898 - Lee-Chih; Yeh ;   et al. | 2014-09-11 |
System, Method And Reticle For Improved Pattern Quality In Extreme Ultraviolet (euv) Lithography And Method For Forming The Reticle App 20140218714 - HSU; Chia-Hao ;   et al. | 2014-08-07 |
Systems and methods for lithography masks Grant 8,785,083 - Tu , et al. July 22, 2 | 2014-07-22 |
Phase shift mask for extreme ultraviolet lithography and method of fabricating same Grant 8,765,330 - Shih , et al. July 1, 2 | 2014-07-01 |
Method Of Forming A Pattern App 20140134759 - Lin; Yu Chao ;   et al. | 2014-05-15 |
Mask and method for forming the mask Grant 8,709,682 - Chen , et al. April 29, 2 | 2014-04-29 |
Method of fabricating a lithography mask Grant 8,679,707 - Lee , et al. March 25, 2 | 2014-03-25 |
System and method for combined intraoverlay metrology and defect inspection Grant 8,656,318 - Lee , et al. February 18, 2 | 2014-02-18 |
Sports training device Grant 8,651,979 - Chen February 18, 2 | 2014-02-18 |
Phase Shift Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same App 20140038086 - Shih; Chih-Tsung ;   et al. | 2014-02-06 |
Method of Fabricating a Lithography Mask App 20140038088 - Lee; Hsin-Chang ;   et al. | 2014-02-06 |
Photomask and photomask substrate with reduced light scattering properties Grant 8,624,345 - Wu , et al. January 7, 2 | 2014-01-07 |
Photomask And Method For Forming The Same App 20130337370 - Lee; Hsin-Chang ;   et al. | 2013-12-19 |
Systems and Methods for Lithography Masks App 20130323625 - Tu; Chih-Chiang ;   et al. | 2013-12-05 |
Reduce mask overlay error by removing film deposited on blank of mask Grant 8,589,828 - Lee , et al. November 19, 2 | 2013-11-19 |
System and Method for Combined Intraoverlay and Defect Inspection App 20130298088 - Lee; Hsin-Chang ;   et al. | 2013-11-07 |
Mask And Method For Forming The Same App 20130280644 - Lin; Yun-Yue ;   et al. | 2013-10-24 |
Reflective Mask And Method Of Making Same App 20130280643 - Hsu; Pei-Cheng ;   et al. | 2013-10-24 |
Method Of Making A Lithography Mask App 20130260573 - Lee; Hsin-Chang ;   et al. | 2013-10-03 |
Method Of Making A Lithography Mask App 20130260289 - Lin; Yun-Yue ;   et al. | 2013-10-03 |
Reduce Mask Overlay Error By Removing Film Deposited On Blank Of Mask App 20130219350 - Lee; Hsin-Chang ;   et al. | 2013-08-22 |
Mask And Method For Forming The Mask App 20130202992 - Chen; Chia-Jen ;   et al. | 2013-08-08 |
Composite Dummy Gate With Conformal Polysilicon Layer For Finfet Device App 20130187235 - Huang; Yuan-Sheng ;   et al. | 2013-07-25 |
Process of making natural tourmaline fiber and filter Grant 8,491,825 - Lin , et al. July 23, 2 | 2013-07-23 |
Structure and Method for MOSFETS with High-K and Metal Gate Structure App 20130119487 - Lin; Jr Jung ;   et al. | 2013-05-16 |
Photomask And Photomask Substrate With Reduced Light Scattering Properties App 20120237861 - Wu; Ken ;   et al. | 2012-09-20 |
Natural tourmaline anion fiber and filter and producing method Grant 8,231,968 - Lin , et al. July 31, 2 | 2012-07-31 |
Method for forming a robust mask with reduced light scattering Grant 8,198,118 - Wu , et al. June 12, 2 | 2012-06-12 |
Sports Training Device App 20120129633 - Chen; Chia-Jen | 2012-05-24 |
System and method for manufacturing a mask for semiconductor processing Grant 7,999,910 - Chen , et al. August 16, 2 | 2011-08-16 |
Compensation of reticle flatness on focus deviation in optical lithography Grant 7,924,405 - Yeh , et al. April 12, 2 | 2011-04-12 |
Multiple resist layer phase shift mask (PSM) blank and PSM formation method Grant 7,906,252 - Lee , et al. March 15, 2 | 2011-03-15 |
Natural Tourmaline Anion Fiber And Filter And Producing Method App 20100117251 - Lin; Ming-Fung ;   et al. | 2010-05-13 |
Aperture design for improving critical dimension accuracy and electron beam lithography throughput Grant 7,642,532 - Chen , et al. January 5, 2 | 2010-01-05 |
Compensation Of Reticle Flatness On Focus Deviation In Optical Lithography App 20090027643 - Yeh; Lee-Chih ;   et al. | 2009-01-29 |
Dimension monitoring method and system Grant 7,460,251 - Chang , et al. December 2, 2 | 2008-12-02 |
Method for forming a robust mask with reduced light scattering App 20080102379 - Wu; Ken ;   et al. | 2008-05-01 |
Natural tourmaline anion fiber and filter and producing method App 20070259178 - Lin; Ming-Fung ;   et al. | 2007-11-08 |
Multiple resist layer phase shift mask (PSM) blank and PSM formation method App 20070207391 - Lee; Hsin-Chang ;   et al. | 2007-09-06 |
New aperture design for improving critical dimension accuracy and electron beam lithography throughput App 20070172744 - Chen; Chia-Jen ;   et al. | 2007-07-26 |
Methods and structures for critical dimension and profile measurement Grant 7,208,331 - Shieh , et al. April 24, 2 | 2007-04-24 |
Dimension monitoring method and system App 20070075037 - Chang; Shih-Ming ;   et al. | 2007-04-05 |
Method for forming a hard mask for gate electrode patterning and corresponding device Grant 7,186,662 - Chen , et al. March 6, 2 | 2007-03-06 |
System and method for manufacturing a mask for semiconductor processing App 20060246357 - Chen; Chia-Jen ;   et al. | 2006-11-02 |
Method for forming a hard mask for gate electrode patterning and corresponding device App 20060081917 - Chen; Chien-Hao ;   et al. | 2006-04-20 |