loadpatents
Patent applications and USPTO patent grants for Chen; Chao-Peng.The latest application filed is for "copper plating method".
Patent | Date |
---|---|
Copper plating method Grant 9,797,047 - Chen , et al. October 24, 2 | 2017-10-24 |
Copper Plating Method App 20150345030 - Chen; Chao-Peng ;   et al. | 2015-12-03 |
Copper plating method Grant 9,103,012 - Chen , et al. August 11, 2 | 2015-08-11 |
Paddle for electroplating for selectively depositing greater thickness Grant 8,920,616 - Chen , et al. December 30, 2 | 2014-12-30 |
Paddle for electroplating for selectively depositing greater thickness Grant 08920616 - | 2014-12-30 |
Novel Plating Method App 20130334051 - Chen; Chao-Peng ;   et al. | 2013-12-19 |
Method to reduce void formation during trapezoidal write pole plating in perpendicular recording Grant 8,273,233 - Chen , et al. September 25, 2 | 2012-09-25 |
Copper plating method App 20120205344 - Chen; Chao-Peng ;   et al. | 2012-08-16 |
Single layer resist liftoff process for nano track width Grant 8,236,484 - Chang , et al. August 7, 2 | 2012-08-07 |
Rejuvenation method for ruthenium plating seed App 20110094888 - Chen; Chao-Peng ;   et al. | 2011-04-28 |
Novel method to reduce void formation during trapezoidal write pole plating in perpendicular recording App 20110011744 - Chen; Chao-Peng ;   et al. | 2011-01-20 |
CPP head with parasitic shunting reduction Grant 7,864,490 - Chang , et al. January 4, 2 | 2011-01-04 |
Ozone-assisted lithography process with image enhancement for CPP head manufacturing Grant 7,781,152 - Chen , et al. August 24, 2 | 2010-08-24 |
Method to print photoresist lines with negative sidewalls Grant 7,633,712 - Chen , et al. December 15, 2 | 2009-12-15 |
Method to reduce ferric ions in ferrous based plating baths Grant 7,431,815 - Chen , et al. October 7, 2 | 2008-10-07 |
Method to print photoresist lines with negative sidewalls App 20080213691 - Chen; Chao-Peng ;   et al. | 2008-09-04 |
Ozone-assisted bi-layer lift-off stencil for narrow track CPP-GMR heads Grant 7,378,226 - Chen , et al. May 27, 2 | 2008-05-27 |
Method to print photoresist lines with negative sidewalls Grant 7,368,227 - Chen , et al. May 6, 2 | 2008-05-06 |
CPP head with parasitic shunting reduction App 20080050615 - Chang; Jeiwei ;   et al. | 2008-02-28 |
CPP head with parasitic shunting reduction Grant 7,279,269 - Chang , et al. October 9, 2 | 2007-10-09 |
Method to print photoresist lines with negative sidewalls App 20070042299 - Chen; Chao-Peng ;   et al. | 2007-02-22 |
Method to form an embedded micro-pedestal in a conductive layer Grant 7,134,182 - Chang , et al. November 14, 2 | 2006-11-14 |
Method to reduce ferric ions in ferrous based plating baths App 20060249392 - Chen; Chao-Peng ;   et al. | 2006-11-09 |
Method to print photoresist lines with negative sidewalls Grant 7,132,221 - Chen , et al. November 7, 2 | 2006-11-07 |
Self-alignment scheme for enhancement of CPP-GMR Grant 7,118,680 - Chang , et al. October 10, 2 | 2006-10-10 |
Lead plating method for GMR head manufacture Grant 7,111,386 - Chen , et al. September 26, 2 | 2006-09-26 |
Lead plating method for GMR head manufacture App 20060048375 - Chen; Chao-Peng ;   et al. | 2006-03-09 |
Ozone-assisted lithography process with image enhancement for CPP head manufacturing App 20060024618 - Chen; Chao-Peng ;   et al. | 2006-02-02 |
Lead plating method for GMR head manufacture Grant 6,973,712 - Chen , et al. December 13, 2 | 2005-12-13 |
Ozone-assisted bi-layer lift-off stencil for narrow track CPP-GMR heads App 20050233258 - Chen, Chao-Peng ;   et al. | 2005-10-20 |
CPP head with parasitic shunting reduction App 20050130070 - Chang, Jeiwei ;   et al. | 2005-06-16 |
Method to form reduced dimension pattern with good edge roughness Grant 6,905,811 - Chen , et al. June 14, 2 | 2005-06-14 |
Self-alignment scheme for enhancement of CPP-GMR App 20050111143 - Chang, Jei-Wei ;   et al. | 2005-05-26 |
Process to fabricate narrow-track CPP read head App 20050102820 - Chang, Jei-Wei ;   et al. | 2005-05-19 |
Single layer resist liftoff process for nano track width App 20050106509 - Chang, Jei-Wei ;   et al. | 2005-05-19 |
Method to print photoresist lines with negative sidewalls App 20050058952 - Chen, Chao-Peng ;   et al. | 2005-03-17 |
Method to form reduced dimension pattern with good edge roughness App 20040214109 - Chen, Chao Peng ;   et al. | 2004-10-28 |
Lead plating method for GMR head manufacture App 20030167626 - Chen, Chao-Peng ;   et al. | 2003-09-11 |
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