Chaudhary; Nirmal

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chaudhary; Nirmal.The latest application filed is for "approach to the manufacturing of monolithic 3-dimensional high-rise integrated-circuits with vertically-stacked double-sided fully-depleted silicon-on-insulator transistors".

Company Profile

2.11.6

Chaudhary; Nirmal - Leesburg VA US
Chaudhary; Nirmal - Austin TX US
Chaudhary; Nirmal - Boise ID
Chaudhary, Nirmal - Poughkeepsie NY
Chaudhary; Nirmal - Wappingers Falls NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Approach to the manufacturing of monolithic 3-dimensional high-rise integrated-circuits with vertically-stacked double-sided fully-depleted silicon-on-insulator transistors Grant 10,559,594 - Tarakji , et al. Feb	2020-02-11
Approach to the manufacturing of monolithic 3-dimensional high-rise integrated-circuits with vertically-stacked double-sided fully-depleted silicon-on-insulator transistors App 20180294284 - Tarakji; Ahmad ; et al.	2018-10-11
Transistor with dopant-bearing metal in source and drain Grant 8,390,080 - Li , et al. March 5, 2	2013-03-05
Electronic circuit, electronic circuit arrangement and method for producing an electronic circuit Grant 8,085,518 - Chaudhary , et al. December 27, 2	2011-12-27
Transistor with Dopant-Bearing Metal in Source and Drain App 20090026555 - Li; Hong-Jyh ; et al.	2009-01-29
Transistor with dopant-bearing metal in source and drain Grant 7,446,379 - Li , et al. November 4, 2	2008-11-04
Gate electrode for FinFET device Grant 7,094,650 - Chaudhary , et al. August 22, 2	2006-08-22
Gate Electrode For Finfet Device App 20060160312 - Chaudhary; Nirmal ; et al.	2006-07-20
Transistor with dopant-bearing metal in source and drain App 20050205896 - Li, Hong-Jyh ; et al.	2005-09-22
Transistor with dopant-bearing metal in source and drain Grant 6,921,691 - Li , et al. July 26, 2	2005-07-26
Self-aligned STI process using nitride hard mask App 20030045051 - Pohl, John ; et al.	2003-03-06
Low temperature carbon rich oxy-nitride for improved RIE selectivity Grant 6,486,015 - Chaudhary , et al. November 26, 2	2002-11-26
Methods for performing planarization and recess etches and apparatus therefor Grant 6,232,233 - Chaudhary May 15, 2	2001-05-15
Dry process for cleaning residues/polymers after metal etch Grant 6,184,134 - Chaudhary , et al. February 6, 2	2001-02-06

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