loadpatents
name:-0.018404006958008
name:-0.017144918441772
name:-0.0011889934539795
Charneski; Lawrence J. Patent Filings

Charneski; Lawrence J.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Charneski; Lawrence J..The latest application filed is for "nanorod sensor with single-plane electrodes".

Company Profile
0.17.12
  • Charneski; Lawrence J. - Vancouver WA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Nanorod sensor with single-plane electrodes
Grant 7,759,150 - Zhang , et al. July 20, 2
2010-07-20
Bipolar switching PCMO capacitor
Grant 7,696,550 - Li , et al. April 13, 2
2010-04-13
Nanorod sensor with single-plane electrodes
App 20080290431 - Zhang; Fengyan ;   et al.
2008-11-27
Bipolar switching PCMO capacitor
App 20070221975 - Li; Tingkai ;   et al.
2007-09-27
System and method for forming a bipolar switching PCMO film
Grant 7,235,407 - Li , et al. June 26, 2
2007-06-26
Method of buffer layer formation for RRAM thin film deposition
App 20070048990 - Zhuang; Wei-Wei ;   et al.
2007-03-01
Method of forming Pr.sub.xCa.sub.1-xMnO.sub.3 thin films having a PrMnO.sub.3/CaMnO.sub.3 super lattice structure using metalorganic chemical vapor deposition
Grant 7,098,101 - Li , et al. August 29, 2
2006-08-29
Grading PrxCa1-xMnO3 thin films by metalorganic chemical vapor deposition
App 20060068099 - Li; Tingkai ;   et al.
2006-03-30
System and method for forming a bipolar switching PCMO film
App 20050275064 - Li, Tingkai ;   et al.
2005-12-15
Low temperature MOCVD processes for fabrication of Pr.sub.X Ca.sub.1-x MnO.sub.3 thin films
Grant 6,972,239 - Li , et al. December 6, 2
2005-12-06
Precursor solution and method for controlling the composition of MOCVD deposited PCMO
App 20040170761 - Li, Tingkai ;   et al.
2004-09-02
Copper metal precursor
Grant 6,764,537 - Zhuang , et al. July 20, 2
2004-07-20
Substituted phenylethylene precursor synthesis method
Grant 6,669,870 - Zhuang , et al. December 30, 2
2003-12-30
Adhesion promotion method for CVD copper metallization in IC applications
Grant 6,645,860 - Charneski , et al. November 11, 2
2003-11-11
Copper metal precursor
App 20030203111 - Zhuang, Wei-Wei ;   et al.
2003-10-30
Method of depositing a high-adhesive copper thin film on a metal nitride substrate
Grant 6,596,344 - Zhuang , et al. July 22, 2
2003-07-22
Method of depositing a high-adhesive copper thin film on a metal nitride substrate
App 20020143202 - Zhuang, Wei-Wei ;   et al.
2002-10-03
Adhesion promotion method for CVD copper metallization in IC applications
App 20020086528 - Charneski, Lawrence J. ;   et al.
2002-07-04
Integrated circuit prepared by selectively cleaning copper substrates, in-situ, to remove copper oxides
App 20020047144 - Nguyen, Tue ;   et al.
2002-04-25
In-situ Method Of Cleaning A Metal-organic Chemical Vapor Deposition Chamber
App 20010009154 - NGUYEN, TUE ;   et al.
2001-07-26
Substituted phenylethylene precursor synthesis method
App 20010009274 - Zhuang, Wei-Wei ;   et al.
2001-07-26
Precursor with (methoxy) (methyl) silylolefin ligand to deposit copper and method same
Grant 6,090,960 - Senzaki , et al. July 18, 2
2000-07-18
Substituted ethylene precursor and synthesis method
Grant 5,994,571 - Zhuang , et al. November 30, 1
1999-11-30
Enhanced CVD copper adhesion by two-step deposition process
Grant 5,948,467 - Nguyen , et al. September 7, 1
1999-09-07
System and method of selectively cleaning copper substrate surfaces, in-situ, to remove copper oxides
Grant 5,939,334 - Nguyen , et al. August 17, 1
1999-08-17
Oxidized diffusion barrier surface for the adherence of copper and method for same
Grant 5,913,144 - Nguyen , et al. June 15, 1
1999-06-15
Copper adhesion to a diffusion barrier surface and method for same
Grant 5,909,637 - Charneski , et al. June 1, 1
1999-06-01
Differential copper deposition on integrated circuit surfaces and method for same
Grant 5,851,367 - Nguyen , et al. December 22, 1
1998-12-22
Precursor with (alkyloxy)(alkyl)-silylolefin ligand to deposit copper
Grant 5,767,301 - Senzaki , et al. June 16, 1
1998-06-16

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed