Charatan; Robert

Patent Applications and Registrations

Patent applications and USPTO patent grants for Charatan; Robert.The latest application filed is for "critical dimension reduction and roughness control".

Company Profile

0.18.11

Charatan; Robert - Portland OR US
Charatan; Robert - Dresdan DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Critical dimension reduction and roughness control Grant 8,614,149 - Lee , et al. December 24, 2	2013-12-24
System and method for critical dimension reduction and pitch reduction Grant 8,529,728 - Charatan September 10, 2	2013-09-10
Methods for controlling time scale of gas delivery into a processing chamber Grant 8,340,827 - Yun , et al. December 25, 2	2012-12-25
Critical Dimension Reduction And Roughness Control App 20120309201 - Lee; Sangheon ; et al.	2012-12-06
System And Method For Critical Dimension Reduction And Pitch Reduction App 20120279656 - Charatan; Robert	2012-11-08
Critical dimension reduction and roughness control Grant 8,268,118 - Lee , et al. September 18, 2	2012-09-18
Critical Dimension Reduction And Roughness Control App 20100148317 - LEE; Sangheon ; et al.	2010-06-17
Critical dimension reduction and roughness control Grant 7,695,632 - Lee , et al. April 13, 2	2010-04-13
System And Method For Critical Dimension Reduction And Pitch Reduction App 20100038032 - Charatan; Robert	2010-02-18
Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof Grant 7,479,457 - Paduraru , et al. January 20, 2	2009-01-20
Etch with photoresist mask Grant 7,442,649 - Kim , et al. October 28, 2	2008-10-28
System and method for critical dimension reduction and pitch reduction Grant 7,427,458 - Charatan September 23, 2	2008-09-23
Apparatus and method for generating activated hydrogen for plasma stripping App 20070243713 - Charatan; Robert	2007-10-18
Sacrificial layer for protection during trench etch Grant 7,205,226 - Schaefer , et al. April 17, 2	2007-04-17
Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof App 20070054496 - Paduraru; Cristian ; et al.	2007-03-08
System and method for critical dimension reduction and pitch reduction App 20070004217 - Charatan; Robert	2007-01-04
Critical dimension reduction and roughness control App 20060266478 - Lee; Sangheon ; et al.	2006-11-30
Etch with photoresist mask App 20060223327 - Kim; Jisoo ; et al.	2006-10-05
Method and apparatus for minimizing agglomerate particle size in a polishing fluid Grant 7,014,539 - Charatan March 21, 2	2006-03-21
Apparatus and associated method for conditioning in chemical mechanical planarization Grant 7,004,825 - Taylor , et al. February 28, 2	2006-02-28
Polishing pad conditioning system Grant 6,958,005 - Charatan October 25, 2	2005-10-25
Method of and platen for controlling removal rate characteristics in chemical mechanical planarization Grant 6,955,588 - Anderson, II , et al. October 18, 2	2005-10-18
Polishing Pad Conditioning System App 20050221731 - Charatan, Robert	2005-10-06
Multiple-conditioning member device for chemical mechanical planarization conditioning Grant 6,935,938 - Gotkis , et al. August 30, 2	2005-08-30
Relative lateral motion in linear CMP Grant 6,899,594 - Charatan , et al. May 31, 2	2005-05-31
Method and apparatus for an air bearing platen with raised topography Grant 6,752,898 - Anderson, II , et al. June 22, 2	2004-06-22
Polishing media for chemical mechanical planarization (CMP) App 20040058623 - Lin, Jibing ; et al.	2004-03-25

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