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Patent applications and USPTO patent grants for Chapple-Sokol; Jonathan Daniel.The latest application filed is for "method and apparatus for making air gap insulation for semiconductor devices".
Patent | Date |
---|---|
Borderless contact to diffusion with respect to gate conductor and methods for fabricating Grant 6,498,096 - Bruce , et al. December 24, 2 | 2002-12-24 |
Method and apparatus for making air gap insulation for semiconductor devices App 20020145201 - Armbrust, Douglas Scott ;   et al. | 2002-10-10 |
Borderless contact to diffusion with respect to gate conductor and methods for fabricating App 20010019886 - Bruce, James Allan ;   et al. | 2001-09-06 |
Borderless contact to diffusion with respect to gate conductor and methods for fabricating Grant 6,215,190 - Bruce , et al. April 10, 2 | 2001-04-10 |
Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control Grant 5,665,608 - Chapple-Sokol , et al. September 9, 1 | 1997-09-09 |
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