Chapman; Henry N.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chapman; Henry N..The latest application filed is for "facility and method for molecular structure determination".

Company Profile

0.9.7

Chapman; Henry N. - Hamburg DE
Chapman; Henry N. - Livermore CA
Chapman; Henry N. - Sunol CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Facility and method for molecular structure determination Grant 9,170,217 - Chapman October 27, 2	2015-10-27
Facility And Method For Molecular Structure Determination App 20130101086 - Chapman; Henry N.	2013-04-25
Area X-ray or UV camera system for high-intensity beams Grant 7,672,430 - Chapman , et al. March 2, 2	2010-03-02
Figure correction of multilayer coated optics Grant 7,662,263 - Chapman , et al. February 16, 2	2010-02-16
Area x-ray or UV camera system for high-intensity beams App 20090116619 - Chapman; Henry N. ; et al.	2009-05-07
Tamper to delay motion and decrease ionization of a sample during short pulse x-ray imaging Grant 7,236,565 - London , et al. June 26, 2	2007-06-26
High-efficiency spectral purity filter for EUV lithography Grant 7,050,237 - Chapman May 23, 2	2006-05-23
High-efficiency Spectral Purity Filter For Euv Lithography App 20060087738 - Chapman; Henry N.	2006-04-27
Tamper to delay motion and decrease ionization of a sample during short pulse x-ray imaging App 20050276370 - London, Richard A. ; et al.	2005-12-15
Method to repair localized amplitude defects in a EUV lithography mask blank Grant 6,967,168 - Stearns , et al. November 22, 2	2005-11-22
Etched-multilayer phase shifting masks for EUV lithography Grant 6,875,543 - Chapman , et al. April 5, 2	2005-04-05
Etched-multilayer phase shifting masks for EUV lithography App 20040062998 - Chapman, Henry N. ; et al.	2004-04-01
Figure correction of multilayer coated optics App 20040061868 - Chapman, Henry N. ; et al.	2004-04-01
Method to repair localized amplitude defects in a EUV lithography mask blank App 20030006214 - Stearns, Daniel G. ; et al.	2003-01-09
Deformable mirror for short wavelength applications Grant 5,986,795 - Chapman , et al. November 16, 1	1999-11-16
Reflective optical imaging system with balanced distortion Grant 5,973,826 - Chapman , et al. October 26, 1	1999-10-26

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